World's Best Scientists 2026 revealed!
Thaiyan Mahalingam

Thaiyan Mahalingam

D-Index & Metrics

Materials Science

D-Index
45
Citations
6163
World Ranking
11860
National Ranking
231

Thaiyan Mahalingam publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Thaiyan Mahalingam sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 249 publications — 46th percentile

46% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Thaiyan Mahalingam D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Thaiyan Mahalingam sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 45 D-Index — 10th percentile

10% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Thaiyan Mahalingam is affiliated with Alagappa University in India and focuses their research on interdisciplinary aspects of engineering, materials science, and physics. Their work spans various specialized subfields, including electrical and electronic engineering, electronic, optical and magnetic materials, as well as atomic and molecular physics and optics.

The main topics covered in their research include electrodeposition and electroless coatings, copper interconnects and reliability, and magnetic properties of thin films. These topics reflect a focus on materials synthesis and characterization, with an emphasis on properties relevant to electronic and magnetic applications.

Thaiyan Mahalingam has published in the Journal of Saudi Chemical Society, which is also one of their frequent venues for scholarly communication. Their recent paper is titled "Role of substrate on film thickness, structural, compositional and magnetic properties of CoNi alloy thin films by low temperature electrodeposition technique", published in 2020.

Frequent collaborators of Thaiyan Mahalingam include:

  • S. Thanikaikarasan
  • Tansir Ahamad
  • Saad M. Alshehri

The publication in 2020 has attracted citations in the field, highlighting engagement from other researchers focused on similar material and engineering challenges.

Best Publications

  • Thermal and ionic conductivity studies of plasticized PMMA/PVdF blend polymer electrolytes

    S Rajendran;O Mahendran;T Mahalingam

  • Electrodeposition of Sn, Se, SnSe and the material properties of SnSe films

    B. Subramanian;T. Mahalingam;C. Sanjeeviraja;M. Jayachandran

  • Growth and characterization of electrosynthesized iron selenide thin films

    S. Thanikaikarasan;T. Mahalingam;K. Sundaram;A. Kathalingam

  • Electrochemical deposition and characterization of cupric oxide thin films

    V. Dhanasekaran;T. Mahalingam;R. Chandramohan;Jin-Koo Rhee

  • Electrodeposition and characterization of transparent ZnO thin films

    T. Mahalingam;V.S. John;M. Raja;Y.K. Su

  • Structural and magnetic behavior of Ni/Mn co-doped ZnO nanoparticles prepared by co-precipitation method

    G. Vijayaprasath;R. Murugan;S. Asaithambi;P. Sakthivel

  • Electrochemical deposition of ZnTe thin films

    T Mahalingam;V S John;S Rajendran;P J Sebastian

  • Characterization of dilute magnetic semiconducting transition metal doped ZnO thin films by sol–gel spin coating method

    G. Vijayaprasath;R. Murugan;G. Ravi;T. Mahalingam

  • Photoelectrochemical solar cell studies on electroplated cuprous oxide thin films

    T. Mahalingam;T. Mahalingam;J. S. P. Chitra;J. P. Chu;Hosun Moon;Hosun Moon

  • Preparation and characterization of electrodeposited SnS thin films

    R. Mariappan;T. Mahalingam;V. Ponnuswamy

  • Influence of microwave power on the preparation of NiO nanoflakes for enhanced magnetic and supercapacitor applications.

    G. Anandha Babu;G. Ravi;T. Mahalingam;M. Kumaresavanji

  • Galvanostatic deposition and characterization of cuprous oxide thin films

    T Mahalingam;J.S.P Chitra;S Rajendran;M Jayachandran

  • Role of nickel doping on structural, optical, magnetic properties and antibacterial activity of ZnO nanoparticles

    G. Vijayaprasath;R. Murugan;S. Palanisamy;N.M. Prabhu

  • Enhancement of ferromagnetic property in rare earth neodymium doped ZnO nanoparticles

    G. Vijayaprasath;R. Murugan;T. Mahalingam;Y. Hayakawa

  • Low temperature wet chemical synthesis of good optical quality vertically aligned crystalline ZnO nanorods.

    T Mahalingam;Kyung Moon Lee;Kyung Ho Park;Soonil Lee

  • Comparative study of structural and magnetic properties of transition metal (Co, Ni) doped ZnO nanoparticles

    G. Vijayaprasath;R. Murugan;T. Mahalingam;G. Ravi

  • The effect of dopant on structural, thermal and morphological properties of DBSA-doped polypyrrole

    P. Jayamurgan;V. Ponnuswamy;S. Ashokan;T. Mahalingam

  • Electrochemical deposition and characterization of Ni-P alloy thin films

    T. Mahalingam;T. Mahalingam;M. Raja;S. Thanikaikarasan;C. Sanjeeviraja

  • Preparation and characterization of semiconducting Zn1−xCdxSe thin films

    R. Chandramohan;T. Mahalingam;J.P. Chu;P.J. Sebastian

  • Structural characterization and magnetic properties of Co co-doped Ni/ZnO nanoparticles

    G. Vijayaprasath;R. Murugan;S. Asaithambi;G. Anandha Babu

  • Physical properties of spray pyrolyzed Ag-doped SnS thin films for opto-electronic applications

    K. Santhosh Kumar;A. Gowri Manohari;S. Dhanapandian;T. Mahalingam

  • Preparation and microstructural studies of electrodeposited Cu2O thin films

    T Mahalingam;J.S.P Chitra;J.P Chu;P.J Sebastian

Frequent Co-Authors

Jinn P. Chu
Jinn P. Chu National Taiwan University of Science and Technology
Sebastian Pathiyamattom Joseph
Sebastian Pathiyamattom Joseph National Autonomous University of Mexico
S. Rajendran
S. Rajendran Alagappa University
Yasuhiro Hayakawa
Yasuhiro Hayakawa Shizuoka University
Sea-Fue Wang
Sea-Fue Wang National Taipei University of Technology
M. Jayachandran
M. Jayachandran Sethu Institute of Technology
Soonil Lee
Soonil Lee Ajou University
Ulrich Stimming
Ulrich Stimming Technical University of Munich
K. Karuppasamy
K. Karuppasamy Khalifa University
P. Ramasamy
P. Ramasamy Sri Sivasubramaniya Nadar College of Engineering

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