World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
51
Citations
9616
World Ranking
13916
National Ranking
3605

Robert F. Hicks publications per year

1981: 2 publications 1982: 0 publications 1983: 0 publications 1984: 5 publications 1985: 3 publications 1986: 0 publications 1987: 1 publications 1988: 8 publications 1989: 4 publications 1990: 7 publications 1991: 4 publications 1992: 8 publications 1993: 6 publications 1994: 3 publications 1995: 4 publications 1996: 3 publications 1997: 7 publications 1998: 19 publications 1999: 9 publications 2000: 13 publications 2001: 7 publications 2002: 11 publications 2003: 8 publications 2004: 9 publications 2005: 15 publications 2006: 5 publications 2007: 7 publications 2008: 7 publications 2009: 8 publications 2010: 7 publications 2011: 5 publications 2012: 4 publications 2013: 6 publications 2014: 6 publications 2015: 0 publications 2016: 2 publications 2017: 1 publications 2018: 2 publications 2019: 1 publications 2020: 3 publications 2021: 3 publications 2022: 5 publications 2023: 16 publications 2024: 0 publications 2025: 1 publications
1981 2025

245 publications in total across all disciplines

Robert F. Hicks publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Robert F. Hicks sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 199 publications — 32nd percentile

32% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Robert F. Hicks D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Robert F. Hicks sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 51 D-Index — 23rd percentile

23% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Robert F. Hicks is affiliated with the University of California, Los Angeles in the United States. Their research primarily focuses on materials science, with a concentration in materials chemistry. Their work encompasses several subfields, including materials chemistry, electronic, optical and magnetic materials, biomedical engineering, polymers and plastics, and automotive engineering.

The research topics that Robert F. Hicks has engaged in include:

  • ZnO doping and properties
  • Copper interconnects and reliability
  • Copper-based nanomaterials and applications
  • Carbon nanotubes in composites
  • Advanced sensor and energy harvesting materials
  • Conducting polymers and applications
  • Advanced battery technologies research

Regarding their publication record, recent papers include the following:

  • "Atmospheric pressure plasma reduction of copper oxide to copper metal," 2021, published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Fabrication and Characterization of Solid Composite Yarns from Carbon Nanotubes and Poly(dicyclopentadiene)," 2020, published in Nanomaterials
  • "Diagnosing Team Climate," 2022, published in Physician leadership journal
  • "THE COACH'S CORNER: The Voice in Your Head," 2022, published in Physician leadership journal
  • "Power System Characterization and Flight Testing of a >55lb Hybrid-Electric Multirotor," 2022, published in Proceedings of the Vertical Flight Society 78th Annual Forum

Robert F. Hicks has frequently published in the following venues:

  • Physician leadership journal
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Nanomaterials
  • Proceedings of the Vertical Flight Society 78th Annual Forum
  • Contemporary Clinical Trials Communications

Their frequent coauthors include:

  • Joyce Lee
  • Thomas S. Williams
  • Wenbo Xin
  • Joseph Severino
  • A. Venkert

Best Publications

  • The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

    A. Schutze;J.Y. Jeong;S.E. Babayan;Jaeyoung Park

  • Structure sensitivity of methane oxidation over platinum and palladium

    Robert F. Hicks;Haihua Qi;Michael L. Young;Raymond G. Lee

  • Etching materials with an atmospheric-pressure plasma jet

    J Y Jeong;S E Babayan;V J Tu;J Park

  • Effect of catalyst structure on methane oxidation over palladium on alumina

    Robert F. Hicks;Haihua Qi;Michael L. Young;Raymond G. Lee

  • Deposition of silicon dioxide films with an atmospheric-pressure plasma jet

    S E Babayan;J Y Jeong;V J Tu;J Park

  • An atmospheric pressure plasma source

    Jaeyoung Park;I. Henins;H. W. Herrmann;G. S. Selwyn

  • An XPS study of metal-support interactions on Pd/SiO2 and Pd/La2O3

    Theo H. Fleisch;Robert F. Hicks;Alexis T. Bell

  • Deposition of Silicon Dioxide Films with a Non-Equilibrium Atmospheric-Pressure Plasma Jet

    S E Babayan;J Y Jeong;A Schütze;V J Tu

  • Reaction Chemistry in the Afterglow of an Oxygen-Helium, Atmospheric-Pressure Plasma.

    James Y. Jeong;Jaeyoung Park;Ivars Henins;Steve E. Babayan

  • EFFECTS OF METAL-SUPPORT INTERACTIONS ON THE SYNTHESIS OF METHANOL OVER PALLADIUM

    Yu.A. Ryndin;R.F. Hicks;A.T. Bell;Yu.I. Yermakov

  • Remote plasma deposition of thin films

    Steven Babayan;Robert Hicks

  • Low-temperature compatible wide-pressure-range plasma flow device

    Steven E. Babayan;Robert F. Hicks

  • Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma

    M Moravej;X Yang;M Barankin;J Penelon

  • The oxidative coupling of methane over alkali, alkaline earth, and rare earth oxides

    Jeffrey M. DeBoy;Robert F. Hicks

  • Effects of metal-support interactions on the chemisorption of H2 and CO on Pd/SiO2 and Pd/La2O3

    Robert F. Hicks;Qi-Jie Yen;Alexis T. Bell

  • Low temperature organometallic deposition of metals

    Robert F. Hicks;Herbert D. Kaesz;Dagiang Xu

  • ETCHING POLYIMIDE WITH A NONEQUILIBRIUM ATMOSPHERIC-PRESSURE PLASMA JET

    J. Y. Jeong;S. E. Babayan;A. Schütze;V. J. Tu

  • Comparison of an atmospheric pressure, radio-frequency discharge operating in the α and γ modes

    X Yang;M Moravej;G R Nowling;S E Babayan

  • Effects of metal-support interactions on the hydrogenation of CO over Pd/SiO2 and Pd/La2O3

    Robert F. Hicks;Alexis T. Bell

  • Characterization of (methylcyclopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metal

    Ziling Xue;M. Jane Strouse;David K. Shuh;Carolyn B. Knobler

  • Remote atmospheric-pressure plasma activation of the surfaces of polyethylene terephthalate and polyethylene naphthalate.

    E. Gonzalez;M. D. Barankin;P. C. Guschl;R. F. Hicks

Frequent Co-Authors

Alexis T. Bell
Alexis T. Bell University of California, Berkeley
Mark S. Goorsky
Mark S. Goorsky University of California, Los Angeles
Kang L. Wang
Kang L. Wang University of California, Los Angeles
Krishnan Raghavachari
Krishnan Raghavachari Indiana University
Zi-Ling Xue
Zi-Ling Xue University of Tennessee at Knoxville
Mantu K. Hudait
Mantu K. Hudait Virginia Tech
Diana L. Huffaker
Diana L. Huffaker The University of Texas at Arlington
Jane P. Chang
Jane P. Chang University of California, Los Angeles
R. Stanley Williams
R. Stanley Williams Texas A&M University
Carolyn B. Knobler
Carolyn B. Knobler University of California, Los Angeles

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