The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Neal R. Armstrong sits on this spectrum.
This scientist: 362 publications — 72nd percentile
72% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Neal R. Armstrong sits on this spectrum.
This scientist: 78 D-Index — 77th percentile
77% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Neal R. Armstrong is affiliated with the University of Arizona in the United States. Their research primarily centers on engineering and materials science, with a focus on electrical and electronic engineering as well as materials chemistry. These fields underpin Armstrong's exploration into advanced materials and their practical applications.
The main topics Armstrong addresses include perovskite materials and applications, chalcogenide semiconductor thin films, and quantum dots synthesis and properties. Additionally, the scientist's work covers electronic and structural properties of oxides, conducting polymers and their applications, electrochemical analysis, and advanced battery technologies research.
Armstrong has contributed to several recent papers, documenting developments in material interfaces, surface passivation techniques, and quantum dot behavior. Notable publications include:
The scientist publishes frequently in venues such as ACS Energy Letters, The Journal of Physical Chemistry C, Chemistry of Materials, arXiv (Cornell University), and Joule. These journals reflect the breadth and interdisciplinary nature of Armstrong's work in chemistry, physics, and engineering.
Collaboration is a significant aspect of Armstrong's research activities. Frequent co-authors include Erin L. Ratcliff, Michel De Keersmaecker, R. Clayton Shallcross, Joseph J. Berry, and Margherita Taddei. These partnerships have contributed to an active and sustained research output.
Carrie Donley;Darren Dunphy;David Paine;Chet Carter
Caleb C. Boyd;Caleb C. Boyd;Caleb C. Boyd;R. Clayton Shallcross;Taylor Moot;Ross Kerner
Dana M. Alloway;Michael Hofmann;Michael Hofmann;Darrin L. Smith;Nadine E. Gruhn
Erin L. Ratcliff;Jens Meyer;K. Xerxes Steirer;Andres Garcia
Peter J. Hotchkiss;Simon C. Jones;Sergio A. Paniagua;Asha Sharma
G. E. Jabbour;B. Kippelen;N. R. Armstrong;N. Peyghambarian
Erin L. Ratcliff;Brian Zacher;Neal R. Armstrong
S. E. Shaheen;G. E. Jabbour;M. M. Morrell;Y. Kawabe
K. Xerxes Steirer;K. Xerxes Steirer;Paul F. Ndione;N. Edwin Widjonarko;Matthew T. Lloyd
J. Blochwitz;T. Fritz;M. Pfeiffer;K. Leo
J. Cui;A. Wang;N. L. Edleman;J. Ni
He Yan;Paul Lee;Neal R. Armstrong;Amy Graham
Albert W. C. Lin;Neal R. Armstrong;Theodore. Kuwana
Sergio A. Paniagua;Peter J. Hotchkiss;Simon C. Jones;Seth R. Marder
Sergio A. Paniagua;Anthony J. Giordano;O'Neil L. Smith;Stephen Barlow
T. A. Hopkins;K. Meerholz;S. Shaheen;M. L. Anderson
Neal R Armstrong;Chet Carter;Carrie Donley;Adam Simmonds
Curt N. Sayers;Neal R. Armstrong
J. D. Anderson;E. M. McDonald;P. A. Lee;M. L. Anderson
Neal R. Armstrong;Weining Wang;Dana M. Alloway;Diogenes Placencia
Bernard Kippelen;Seunghyup Yoo;Joshua A. Haddock;Benoit Domercq
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