The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Klaus Hofmann sits on this spectrum.
This scientist: 170 publications — 21st percentile
21% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Klaus Hofmann sits on this spectrum.
This scientist: 46 D-Index — 12th percentile
12% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Klaus Hofmann was a researcher affiliated with the University of Pittsburgh in the United States. Their academic work spanned primarily the field of Engineering, with a strong focus on Electrical and Electronic Engineering, as well as Materials Chemistry. Their research also extended into subfields such as Mechanical Engineering, Artificial Intelligence, and Industrial and Manufacturing Engineering.
The scientific contributions of Hofmann were reflected in a range of publication topics including crystallization and solubility studies, X-ray diffraction in crystallography, advanced memory and neural computing, ferroelectric and negative capacitance devices, advancements in semiconductor devices and circuit design, manufacturing process and optimization, and neuroscience and neural engineering.
Hofmann's recent scholarly publications included:
Collaborations formed a significant part of Hofmann's research activities. Frequent coauthors included Jacqueline Ramler, Crispin Lichtenberg, Rolf Jakoby, Axel Bangert, and Ranjan Bose, each closely partnering on multiple research works.
Hofmann's research was disseminated frequently in several publication venues, reflecting the scope of their work. These included:
The scope of their work predominantly concentrated on engineering and material sciences, with practical emphasis on device and circuit engineering, as well as crystallography applications. Hofmann contributed to advancing knowledge in device synthesis, sensor integration, and memory device simulation through interdisciplinary approaches spanning chemistry, electronics, and AI-based methodologies.
Heidi E. Hamm;Dusanka Deretic;Anatol Arendt;Paul A. Hargrave
Klaus Hofmann;Sara W. Wood;Charles C. Brinton;Judith A. Montibeller
Klaus Hofmann;Gail Titus;Judith A. Montibeller;Frances M. Finn
Klaus. Hofmann;Robert A. Lucas;Sylvan M. Sax
Klaus Hofmann;Hans Bohn
Klaus Hofmann;Frances M. Finn;Marie Limetti;Judy Montibeller
Klaus Hofmann;William D. Peckham;Alfred Rheiner
Klaus Hofmann;Wilhelm Haas;Michael J. Smithers;Robert D. Wells
Klaus Hofmann;Donald B. Melville;Vincent du Vigneaud
Klaus Hofmann;Winfried Wingender;Frances M. Finn
Klaus Hofmann;Haruaki Yajima
Klaus Hofmann;Frances M. Finn;Yoshiaki Kiso
Klaus Hofmann;Yoshiaki Kiso
Frances M. Finn;Christopher C. Widnell;Klaus Hofmann
H E Hamm;D Deretic;K P Hofmann;A Schleicher
Klaus Hofmann;Robert A. Lucas
Klaus Hofmann;Erhard Stutz;Gertrude Spühler;Haruaki Yajima
Frances M. Finn;Gail Titus;Diane Horstman;Klaus Hofmann
Frances M. Finn;Klaus Hofmann
Klaus Hofmann;Frances M. Finn;Heinz-Jürgen Friesen;Cornelia Diaconescu
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