World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
67
Citations
19175
World Ranking
1070
National Ranking
450

Materials Science

D-Index
62
Citations
18025
World Ranking
6374
National Ranking
1617

Jonathan A. Fan publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Jonathan A. Fan sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 184 publications — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Jonathan A. Fan D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Jonathan A. Fan sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 67 D-Index — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2016 - Fellow of Alfred P. Sloan Foundation

Overview

Jonathan A. Fan is affiliated with Stanford University in the United States. Their research spans multiple fields within engineering and materials science, with a strong focus on optics and photonics.

The primary fields of study in their work include:

  • Engineering
  • Materials Science

Within these fields, Jonathan A. Fan contributes notably to several subfields such as:

  • Biomedical Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Aerospace Engineering

They have worked extensively on topics related to optical and photonic technologies. These topics commonly addressed in their publications include:

  • Metamaterials and Metasurfaces Applications
  • Photonic Crystals and Applications
  • Plasmonic and Surface Plasmon Research
  • Advanced Antenna and Metasurface Technologies
  • Photonic and Optical Devices
  • Thermal Radiation and Cooling Technologies
  • Mechanical and Optical Resonators

Jonathan A. Fan has published in a number of academic venues with some of the more frequent ones being:

  • arXiv (Cornell University)
  • ACS Photonics
  • Laser & Photonics Review
  • OSA Optical Design and Fabrication 2021 (Flat Optics, Freeform, IODC, OFT)
  • Journal of the Optical Society of America B

Some recent representative papers authored or co-authored include:

  • Freeform metasurface design based on topology optimization, 2020, MRS Bulletin
  • Numerical Optimization Methods for Metasurfaces, 2020, Laser & Photonics Review
  • Robust Freeform Metasurface Design Based on Progressively Growing Generative Networks, 2020, ACS Photonics
  • Optical meta-waveguides for integrated photonics and beyond, 2021, Light Science & Applications
  • Roadmap for Optical Metasurfaces, 2024, ACS Photonics

The list of frequent co-authors reflects recurring collaborative relationships and includes:

  • Shang-Jie Yu
  • Mingkun Chen
  • Jiaqi Jiang
  • Chenkai Mao
  • You Zhou

Jonathan A. Fan received the Alfred P. Sloan Foundation Fellowship in 2016, indicating recognition within their scientific community.

Best Publications

  • Self-assembled plasmonic nanoparticle clusters

    Jonathan A. Fan;Chihhui Wu;Kui Bao;Jiming Bao

  • Stretchable batteries with self-similar serpentine interconnects and integrated wireless recharging systems.

    Sheng Xu;Yihui Zhang;Yihui Zhang;Jiung Cho;Juhwan Lee

  • Fractal design concepts for stretchable electronics

    Jonathan A. Fan;Woon Hong Yeo;Woon Hong Yeo;Yewang Su;Yewang Su;Yoshiaki Hattori

  • Deep neural networks for the evaluation and design of photonic devices

    Jiaqi Jiang;Mingkun Chen;Jonathan A. Fan

  • Fano Resonances in Plasmonic Nanoclusters: Geometrical and Chemical Tunability

    J. Britt Lassiter;Heidar Sobhani;Jonathan A. Fan;Janardan Kundu

  • Large-Angle, Multifunctional Metagratings Based on Freeform Multimode Geometries

    David Sell;Jianji Yang;Sage Doshay;Rui Yang

  • Spectrally selective chiral silicon metasurfaces based on infrared Fano resonances

    Chihhui Wu;Nihal Arju;Glen Kelp;Jonathan A. Fan

  • Metal oxide redox chemistry for chemical looping processes

    Liang Zeng;Zhuo Cheng;Jonathan A. Fan;Liang-Shih Fan

  • Fano-like interference in self-assembled plasmonic quadrumer clusters.

    Jonathan A. Fan;Kui Bao;Chihhui Wu;Jiming Bao

  • Global Optimization of Dielectric Metasurfaces Using a Physics-Driven Neural Network

    Jiaqi Jiang;Jonathan A. Fan

  • Optical meta-waveguides for integrated photonics and beyond.

    Yuan Meng;Yizhen Chen;Longhui Lu;Yimin Ding

  • Large-area MRI-compatible epidermal electronic interfaces for prosthetic control and cognitive monitoring.

    Limei Tian;Benjamin Zimmerman;Aadeel Akhtar;Ki Jun Yu

  • Free-Form Diffractive Metagrating Design Based on Generative Adversarial Networks

    Jiaqi Jiang;David Sell;Stephan Hoyer;Jason Hickey

  • Designer spoof surface plasmon structures collimate terahertz laser beams

    Nanfang Yu;Qi Jie Wang;Qi Jie Wang;Mikhail A. Kats;Jonathan A. Fan

  • Experimental and Theoretical Studies of Serpentine Microstructures Bonded To Prestrained Elastomers for Stretchable Electronics

    Yihui Zhang;Yihui Zhang;Shuodao Wang;Xuetong Li;Xuetong Li;Jonathan A. Fan

  • High-efficiency, large-area, topology-optimized metasurfaces

    Thaibao Phan;David Sell;Evan W. Wang;Sage Doshay

  • Materials and Designs for Wireless Epidermal Sensors of Hydration and Strain

    Xian Huang;Yuhao Liu;Huanyu Cheng;Woo Jung Shin

  • Review of numerical optimization techniques for meta-device design [Invited]

    Sawyer D. Campbell;David Sell;Ronald P. Jenkins;Eric B. Whiting

  • Multifunctional Skin-Like Electronics for Quantitative, Clinical Monitoring of Cutaneous Wound Healing

    Yoshiaki Hattori;Leo Falgout;Woosik Lee;Sung Young Jung

  • Roadmap for Optical Metasurfaces

    Unknown

  • Small-divergence semiconductor lasers by plasmonic collimation

    Nanfang Yu;Jonathan Fan;Qi Jie Wang;Christian Pflügl

  • Terahertz quantum cascade lasers with copper metal-metal waveguides operating up to 178 K

    Mikhail A. Belkin;Jonathan A. Fan;Sahand Hormoz;Federico Capasso

  • Spectrally selective chiral silicon metasurfaces based on infrared Fano resonances

    Chihhui Wu;Nihal Arju;Jonathan Fan;Igal Brener

Frequent Co-Authors

Federico Capasso
Federico Capasso Harvard University
John A. Rogers
John A. Rogers Northwestern University
Yihui Zhang
Yihui Zhang Tsinghua University
Yonggang Huang
Yonggang Huang Northwestern University
Liang-Shih Fan
Liang-Shih Fan The Ohio State University
Yewang Su
Yewang Su University of Chinese Academy of Sciences
Mikhail A. Belkin
Mikhail A. Belkin Technical University of Munich
Edmund H. Linfield
Edmund H. Linfield University of Leeds
Peter Nordlander
Peter Nordlander Rice University
Qi Jie Wang
Qi Jie Wang Nanyang Technological University

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