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SPIE

Advanced Etch Technology and Process Integration for Nanopatterning (SPIE Advanced Lithography + Patterning 2027) (AETPIN)

Location: San Jose McEnery Convention Center, San Jose, CA , United States

Conference dates: 2/21/2027 - 2/25/2027

Research H-index
3

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 79 11 12 1
Electronics and Electrical Engineering 913 4 10 2

Call for Papers

This SPIE conference, held within SPIE Advanced Lithography + Patterning 2027, is a long-running forum on plasma etch and process integration — atomic-layer etch, selective deposition, patterning for EUV and advanced nodes. Papers are presented in oral and poster sessions and published in the Proceedings of SPIE.

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Best Scientists who published in this Conference

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