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IEEE

35th IEEE International Symposium on Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT)

Location: Austin, Texas , United States

Conference dates: 10/19/2022 - 10/21/2022

Research H-index
3

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 636 12 23 3
Engineering and Technology 416 8 10 2

Call for Papers

DFT is an annual Symposium providing an open forum for presentations in the field of defect and fault tolerance in VLSI and nanotechnology systems inclusive of emerging technologies. One of the unique features of this symposium is to combine new academic research with state-of-the-art industrial data, necessary ingredients for significant advances in this field. All aspects of design, manufacturing, test, reliability, and availability that are affected by defects during manufacturing and by faults during system operation are of interest. Topics include (but are not limited to) the following:

Yield Analysis and Modeling
Defect/fault analysis and models; statistical yield modeling; diagnosis; critical area and other metrics.
Testing Techniques
Built-in self-test; delay fault modeling and diagnosis; testing for analog and mixed circuits; online testing; signal and clock integrity.
Design For Testability in IC Design
FPGA, SoC, NoC, ASIC, low power design and microprocessors.
Error Detection, Correction, and Recovery
Self-testing and self-checking solutions; error-control coding; fault masking and avoidance; recovery schemes, space/time redundancy; hw/sw techniques; architectural and system-level techniques.
Dependability Analysis and Validation
Fault injection techniques and frameworks; dependability and characterization.
Repair, Restructuring and Reconfiguration
Repairable logic; reconfigurable circuit design; DFT for on-line operation; self-healing; reliable FPGA-based systems.
Radiation effects
SEEs on nanotechnologies; modeling of radiation environments; radiation experiments; radiation hardening techniques.
Defect and Fault Tolerance
Reliable circuit/system synthesis; fault tolerant processes and design; design space exploration for dependable systems, transient/soft faults.
Aging and Lifetime Reliability
Aging characterization and modeling; design and run-time reliability, thermal, and variability management and recovery.
Dependable Applications and Case Studies
Methodologies and case studies for IoTs, automotive, railway, avionics and space, autonomous systems, industrial control, etc.
Emerging Technologies
Techniques for 2.5D/3D ICs, quantum computing architectures, memristors, spintronics, microfluidics, etc.
Design for Security
Fault attacks, fault tolerance-based countermeasures, scan-based attacks and countermeasures, hardware trojans, security vs. reliability trade-offs, interaction between VLSI test, trust, and reliability.

Overview

This ranking presents a comprehensive evaluation of scientific conferences in the field of Engineering and Technology, meticulously compiled by Research.com—recognized as one of the leading platforms for science research across all major academic disciplines since 2014. Research.com has established a strong reputation for providing trusted and authoritative data on scientific contributions, with a particular focus on Engineering and Technology.

The placement of each conference in this ranking is determined by a unique bibliometric score developed by Research.com. This score incorporates both the estimated h-index and the number of leading scientists who have participated in the conference during the last three years. Such a multifaceted approach ensures a robust and objective assessment of each conference's impact and prestige within the academic community.

The current ranking includes Impact Score values collected as of 2024-11-27. The evaluation process involved an in-depth examination of more than 2,262 conferences, rigorously selected through a detailed review of over 26,934 scientific documents. These publications, released within the last three years, represent the work of 9,385 leading and highly respected scientists in the field of Engineering and Technology. This extensive analytical effort highlights the depth and complexity of the research underpinning this ranking.

For a more thorough understanding of the criteria and procedures utilized in the computation of ranking scores, please visit our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at Defect and Fault Tolerance in VLSI and Nanotechnology Systems (based on the number of publications) are:

  • Fabrizio Lombardi (57 papers) absent at the last edition,
  • Israel Koren (44 papers) absent at the last edition,
  • Glenn H. Chapman (37 papers) absent at the last edition,
  • Cecilia Metra (36 papers) absent at the last edition,
  • Cristiana Bolchini (34 papers) absent at the last edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at Defect and Fault Tolerance in VLSI and Nanotechnology Systems (based on the number of publications) are:

  • Northeastern University (84 papers) absent at the last edition,
  • Polytechnic University of Turin (50 papers) absent at the last edition,
  • Polytechnic University of Milan (49 papers) absent at the last edition,
  • University of Massachusetts Amherst (38 papers) absent at the last edition,
  • Simon Fraser University (37 papers) absent at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 0.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 0.00% were posted by at least one author from the top 10 institutions publishing at the conference. Another 0.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 100.00% of all publications and 0.00% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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Best Scientists who published in this Conference