World's Best Scientists 2026 revealed!
Ulrich Gösele

Ulrich Gösele

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Materials Science
Germany
2022

D-Index & Metrics

Materials Science

D-Index
126
Citations
72035
World Ranking
391
National Ranking
22

Ulrich Gösele publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Ulrich Gösele sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 726 publications — 96th percentile

96% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Ulrich Gösele D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Ulrich Gösele sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 126 D-Index — 97th percentile

97% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2022 - Research.com Materials Science in Germany Leader Award

Overview

Ulrich Gösele was affiliated with the Max Planck Society in Germany during their scientific career. The primary institution is known for its focus on fundamental research in natural sciences and engineering.

Details on specific research topics, publication venues, or collaborative work are not available. Similarly, information on major fields or subfields of study has not been provided.

There is no recorded information on recent papers, co-authors, or notable book publications related to Ulrich Gösele.

No awards or distinctions have been documented in the available data.

The scientist is noted as deceased.

Best Publications

  • Porous silicon formation: A quantum wire effect

    V. Lehmann;U. Gösele

  • Metal-Assisted Chemical Etching of Silicon: A Review

    Zhipeng Huang;Nadine Geyer;Peter Werner;Johannes de Boor

  • Hexagonal pore arrays with a 50-420 nm interpore distance formed by self-organization in anodic alumina

    A. P. Li;F. Müller;A. Birner;K. Nielsch

  • Self-organized formation of hexagonal pore arrays in anodic alumina

    O. Jessensky;F. Müller;U. Gösele

  • Fast fabrication of long-range ordered porous alumina membranes by hard anodization

    Woo Lee;Ran Ji;Ulrich Gösele;Kornelius Nielsch

  • Self-ordering Regimes of Porous Alumina: The 10% Porosity Rule

    Kornelius Nielsch;Jinsub Choi;Kathrin Schwirn;Ralf B. Wehrspohn

  • Uniform Nickel Deposition into Ordered Alumina Pores by Pulsed Electrodeposition

    K. Nielsch;F. Müller;A.-P. Li;U. Gösele

  • Low threshold, large To injection laser emission from (InGa)As quantum dots

    N. Kirstaedter;N.N. Ledentsov;M. Grundmann;D. Bimberg

  • Polymer nanotubes by wetting of ordered porous templates.

    Martin Steinhart;Joachim H. Wendorff;Andreas Greiner;Ralf B. Wehrspohn

  • Formation of nanotubes and hollow nanoparticles based on Kirkendall and diffusion processes: a review.

    Hong Jin Fan;Ulrich Gösele;Margit Zacharias

  • Silicon Nanowires: A Review on Aspects of their Growth and their Electrical Properties

    Volker Schmidt;Joerg V. Wittemann;Stephan Senz;Ulrich Gösele

  • Ultranarrow Luminescence Lines from Single Quantum Dots.

    M. Grundmann;J. Christen;N. N. Ledentsov;J. Bohrer

  • SEMICONDUCTOR WAFER BONDING

    U. Gosele;Q. Y. Tong

  • Nanowire-based one-dimensional electronics

    C. Thelander;P. Agarwal;S. Brongersma;J. Eymery

  • SemiConductor Wafer Bonding: Science and Technology

    Q.-Y Tong;U. Gösele

  • Growth kinetics of planar binary diffusion couples: ’’Thin‐film case’’ versus ’’bulk cases’’

    U. Gösele;King-Ning Tu

  • Monocrystalline spinel nanotube fabrication based on the Kirkendall effect

    Hong Jin fan;Mato Knez;Roland Scholz;Kornelius Nielsch

  • Growth, thermodynamics, and electrical properties of silicon nanowires.

    V. Schmidt;J. V. Wittemann;U. Gösele

  • Epitaxial growth of silicon nanowires using an aluminium catalyst

    Yewu Wang;Volker Schmidt;Stephan Senz;Ulrich Gösele

  • Hexagonally ordered 100 nm period nickel nanowire arrays

    K. Nielsch;R. B. Wehrspohn;J. Barthel;J. Kirschner

Frequent Co-Authors

Teh Y. Tan
Teh Y. Tan Duke University
Kornelius Nielsch
Kornelius Nielsch Leibniz Institute for Solid State and Materials Research
Ralf B. Wehrspohn
Ralf B. Wehrspohn Martin Luther University Halle-Wittenberg
Dietrich Hesse
Dietrich Hesse Max Planck Institute of Microstructure Physics
Peter Werner
Peter Werner Max Planck Society
Martin Steinhart
Martin Steinhart Osnabrück University
Marin Alexe
Marin Alexe University of Warwick
Roland Scholz
Roland Scholz Max Planck Society
Silke Christiansen
Silke Christiansen Fraunhofer Society
Mato Knez
Mato Knez CIC nanoGUNE

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