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Seizo Morita

Seizo Morita

Seizo Morita publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Seizo Morita sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

The last bar groups every scientist with 1,163 publications or more.

Seizo Morita D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Seizo Morita sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

The last bar groups every scientist with 165 D-Index or more.

Overview

Seizo Morita is affiliated with Osaka University in Japan. Their academic profile reflects involvement in scientific research that is tied to this institution.

No specific data is available regarding recent papers, co-authors, or main publication venues associated with their work. Likewise, detailed information about their main fields of study, subfields, or primary research topics has not been provided.

There is also no record of book publications or awards attributed to Seizo Morita in the available data. This absence of detailed bibliometric and career accomplishments limits a comprehensive view of the contributions made to the scientific community.

Despite the limited public data, Seizo Morita's connection to Osaka University suggests engagement in an academic or research capacity within that institution.

Best Publications

  • Chemical identification of individual surface atoms by atomic force microscopy

    Yoshiaki Sugimoto;Pablo Pou;Masayuki Abe;Masayuki Abe;Pavel Jelinek

  • Atom inlays performed at room temperature using atomic force microscopy

    Yoshiaki Sugimoto;Masayuki Abe;Shinji Hirayama;Noriaki Oyabu

  • Defect Motion on an InP(110) Surface Observed with Noncontact Atomic Force Microscopy

    Yasuhiro Sugawara;Masahiro Ohta;Hitoshi Ueyama;Seizo Morita

  • Complex Patterning by Vertical Interchange Atom Manipulation Using Atomic Force Microscopy

    Yoshiaki Sugimoto;Pablo Pou;Oscar Custance;Pavel Jelinek

  • Atomic force microscopy as a tool for atom manipulation

    Oscar Custance;Ruben Perez;Seizo Morita

  • Mechanical vertical manipulation of selected single atoms by soft nanoindentation using near contact atomic force microscopy.

    Noriaki Oyabu;Óscar Custance;Insook Yi;Yasuhiro Sugawara

  • Evidence of subsurface oxygen vacancy ordering on reduced CeO2(111).

    Stefan Torbrügge;Michael Reichling;Atsushi Ishiyama;Seizo Morita

  • New insights on atomic-resolution frequency-modulation Kelvin-probe force-microscopy imaging of semiconductors.

    Sascha Sadewasser;Pavel Jelinek;Chung-Kai Fang;Oscar Custance

  • Role of a covalent bonding interaction in noncontact-mode atomic-force microscopy on Si(111)7×7

    T. Uchihashi;Y. Sugawara;T. Tsukamoto;M. Ohta

  • Single Atomic Contact Adhesion and Dissipation in Dynamic Force Microscopy

    Noriaki Oyabu;Pablo Pou;Yoshiaki Sugimoto;Pavel Jelinek;Pavel Jelinek

  • Spatially quantized friction with a lattice periodicity

    Seizo Morita;Satoru Fujisawa;Yasuhiro Sugawara

  • Mechanism for Room-Temperature Single-Atom Lateral Manipulations on Semiconductors using Dynamic Force Microscopy

    Yoshiaki Sugimoto;Pavel Jelinek;Pablo Pou;Masayuki Abe;Masayuki Abe

  • Room-temperature reproducible spatial force spectroscopy using atom-tracking technique

    M. Abe;Y. Sugimoto;O. Custance;S. Morita

  • Noncontact Atomic Force Microscopy: Volume 2

    Seizo Morita;Franz J. Giessibl;Roland Wiesendanger

  • Lateral manipulation of single atoms at semiconductor surfaces using atomic force microscopy

    Noriaki Oyabu;Yoshiaki Sugimoto;Masayuki Abe;Óscar Custance

  • STABLE OPERATION MODE FOR DYNAMIC NONCONTACT ATOMIC FORCE MICROSCOPY

    H. Ueyama;Y. Sugawara;S. Morita

  • Atomic-scale friction observed with a two-dimensional frictional-force microscope.

    Satoru Fujisawa;Eigo Kishi;Yasuhiro Sugawara;Seizo Morita

  • Real topography, atomic relaxations, and short-range chemical interactions in atomic force microscopy: The case of the α − Sn ∕ Si ( 111 ) − ( 3 × 3 ) R 30 ° surface

    Yoshiaki Sugimoto;Pablo Pou;Óscar Custance;Pavel Jelinek

  • Scanning probe microscope having cantilever and detecting sample characteristics by means of reflected sample examination light

    Takao Okada;Akira Yagi;Yasuhiro Sugawara;Seizo Morita

  • The elimination of the ‘artifact’ in the electrostatic force measurement using a novel noncontact atomic force microscope/electrostatic force microscope

    Kenji Okamoto;Yasuhiro Sugawara;Seizo Morita

Frequent Co-Authors

Pavel Jelínek
Pavel Jelínek Czech Academy of Sciences
Tsuyoshi Kawai
Tsuyoshi Kawai Nara Institute of Science and Technology
Anvar A. Zakhidov
Anvar A. Zakhidov The University of Texas at Dallas
Katsumi Yoshino
Katsumi Yoshino Osaka University
Masaru Tsukada
Masaru Tsukada Tohoku University
Akihiko Fujii
Akihiko Fujii Osaka Institute of Technology
Masashi Yoshimura
Masashi Yoshimura Osaka University
Masamichi Kobayashi
Masamichi Kobayashi Osaka University
Taro Hitosugi
Taro Hitosugi University of Tokyo
Takatomo Sasaki
Takatomo Sasaki Osaka University

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