The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Lars P. H. Jeurgens sits on this spectrum.
This scientist: 184 publications — 25th percentile
25% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Lars P. H. Jeurgens sits on this spectrum.
This scientist: 44 D-Index — 7th percentile
7% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Lars P. H. Jeurgens is affiliated with the Swiss Federal Laboratories for Materials Science and Technology in Switzerland. Their research activity primarily spans the fields of engineering and materials science, with a particular concentration in electrical and electronic engineering, materials chemistry, and mechanical engineering.
Their scientific contributions focus on topics including metal and thin film mechanics, advanced battery materials and technologies, advancements in battery materials, aluminum alloys composites properties, microstructure and mechanical properties, copper interconnects and reliability, and semiconductor materials and devices.
The scientist's recent publications include the following papers:
They frequently publish in venues such as SSRN Electronic Journal, Zenodo (CERN European Organization for Nuclear Research), Surface and Interface Analysis, Acta Materialia, and Applied Surface Science. Their collaboration network includes regular coauthorship with Claudia Cancellieri, Giacomo Lorenzin, Vladyslav Turlo, Maksym V. Kovalenko, and Kostiantyn V. Kravchyk.
Unknown
L. P. H. Jeurgens;W. G. Sloof;F. D. Tichelaar;E. J. Mittemeijer;E. J. Mittemeijer
L. P. H. Jeurgens;W. G. Sloof;F. D. Tichelaar;E. J. Mittemeijer;E. J. Mittemeijer
L.P.H Jeurgens;W.G Sloof;F.D Tichelaar;E.J Mittemeijer;E.J Mittemeijer
Unknown
T. J. Nijdam;L. P. H. Jeurgens;W. G. Sloof
L. P. H. Jeurgens;W. G. Sloof;F. D. Tichelaar;E. J. Mittemeijer;E. J. Mittemeijer
Z. M. Wang;J. Y. Wang;L. P. H. Jeurgens;E. J. Mittemeijer
Romain Dubey;Romain Dubey;Jordi Sastre;Claudia Cancellieri;Faruk Okur;Faruk Okur
Lars P. H. Jeurgens;Zumin Wang;Eric J. Mittemeijer;Eric J. Mittemeijer
Lars Dörner;Lars Dörner;Claudia Cancellieri;Bastian Rheingans;Marc Walter;Marc Walter
T.J Nijdam;L.P.H Jeurgens;W.G Sloof
F. Reichel;L. P. H. Jeurgens;G. Richter;E. J. Mittemeijer;E. J. Mittemeijer
F. Reichel;L. P. H. Jeurgens;E. J. Mittemeijer;E. J. Mittemeijer
Peter Gerstel;Rudolf C. Hoffmann;Peter Lipowsky;Lars P. H. Jeurgens
P.C Snijders;L.P.H Jeurgens;W.G Sloof
Curran Kalha;Nathalie K Fernando;Prajna Bhatt;Fredrik O L Johansson
F. Moszner;C. Cancellieri;M. Chiodi;S. Yoon
T. J. Nijdam;L. P. H. Jeurgens;J. H. Chen;W. G. Sloof
P. C. Snijders;L. P. H. Jeurgens;W. G. Sloof
A. Lyapin;L. P. H. Jeurgens;E. J. Mittemeijer;E. J. Mittemeijer
Z. M. Wang;J. Y. Wang;L. P. H. Jeurgens;F. Phillipp
Zumin Wang;Lin Gu;Lars P. H. Jeurgens;Fritz Phillipp
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