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D-Index & Metrics

Materials Science

D-Index
43
Citations
7841
World Ranking
12276
National Ranking
2824

Hoydoo You publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Hoydoo You sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 216 publications — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Hoydoo You D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Hoydoo You sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 43 D-Index — 5th percentile

5% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Hoydoo You is a researcher affiliated with Argonne National Laboratory in the United States. Their work spans multiple areas in physics and materials science, with a particular focus on materials chemistry, radiation, renewable energy, sustainability, electrical and electronic engineering, and structural biology.

The main fields of study that they contribute to include:

  • Physics and Astronomy
  • Materials Science

The subfields of their research encompass:

  • Materials Chemistry
  • Radiation
  • Renewable Energy, Sustainability and the Environment
  • Electrical and Electronic Engineering
  • Structural Biology

Hoydoo You's research topics cover several key areas such as:

  • Electrocatalysts for Energy Conversion
  • Advanced Electron Microscopy Techniques and Applications
  • Advanced X-ray Imaging Techniques
  • Electrochemical Analysis and Applications
  • Magnetic and transport properties of perovskites and related materials
  • Electronic and Structural Properties of Oxides
  • Fuel Cells and Related Materials

The scientist has published frequently in venues that include:

  • ECS Meeting Abstracts
  • arXiv (Cornell University)
  • Nano Letters
  • Nature Energy
  • npj Computational Materials

Among their recent papers are:

  • Dynamic stability of active sites in hydr(oxy)oxides for the oxygen evolution reaction, 2020, Nature Energy
  • Operando identification of site-dependent water oxidation activity on ruthenium dioxide single-crystal surfaces, 2020, Nature Catalysis
  • pH- and Cation-Dependent Water Oxidation on Rutile RuO2(110), 2021, The Journal of Physical Chemistry C
  • Local electronic structure of rutile RuO2, 2021, Physical Review Research
  • Kibble-Zurek mechanism of Ising domains, 2023, Nature Physics

They have collaborated extensively with frequent co-authors including:

  • Vladimír Komanický
  • Tomoya Kawaguchi
  • Vitalii Latyshev
  • Serhii Vorobiov
  • Wonsuk Cha

Best Publications

  • Dynamic stability of active sites in hydr(oxy)oxides for the oxygen evolution reaction

    Dong Young Chung;Pietro P. Lopes;Pedro Farinazzo Bergamo Dias Martins;Haiying He

  • Towards identifying the active sites on RuO2(110) in catalyzing oxygen evolution

    Reshma R. Rao;Manuel J. Kolb;Niels Bendtsen Halck;Anders Filsøe Pedersen

  • Observation of temperature-dependent site disorder in YBa2Cu3O7- delta below 150 degreesC.

    B. W. Veal;A. P. Paulikas;Hoydoo You;Hao Shi

  • Operando identification of site-dependent water oxidation activity on ruthenium dioxide single-crystal surfaces

    Reshma R. Rao;Manuel J. Kolb;Livia Giordano;Anders Filsøe Pedersen

  • Monodisperse Pt3Co Nanoparticles as a Catalyst for the Oxygen Reduction Reaction: Size-Dependent Activity

    Chao Wang;Dennis van der Vliet;Kee-Chul Chang;Hoydoo You

  • Time-dependent superconducting behavior of oxygen-deficient YBa2Cu3Ox: Possible annealing of oxygen vacancies at 300 K.

    BW Veal;H You;AP Paulikas;H Shi

  • Applications of surface X-ray scattering to electrochemistry problems

    Zoltán Nagy;Hoydoo You

  • X-ray reflectivity and scanning-tunneling-microscope study of kinetic roughening of sputter-deposited gold films during growth

    H You;RP Chiarello;HK Kim;KG Vandervoort

  • Effects of Li+, K+, and Ba2+ Cations on the ORR at Model and High Surface Area Pt and Au Surfaces in Alkaline Solutions

    D. Strmcnik;D. F. van der Vliet;K.-C. Chang;V. Komanicky

  • Unique activity of platinum adislands in the CO electrooxidation reaction.

    Dusan S. Strmcnik;Dusan V. Tripkovic;Dennis van der Vliet;Kee-Chul Chang

  • Substrate effects on the structure of epitaxial PbTiO3 thin films prepared on MgO, LaAlO3, and SrTiO3 by metalorganic chemical-vapor deposition

    Unknown

  • Anomalous Antiferromagnetism in Metallic RuO_{2} Determined by Resonant X-ray Scattering.

    Z. H. Zhu;J. Strempfer;R. R. Rao;C. A. Occhialini

  • Critical thickness of crystallization and discontinuous change in ferroelectric behavior with thickness in ferroelectric polymer thin films

    Q. M. Zhang;Haisheng Xu;Fei Fang;Z.-Y. Cheng

  • Shape-dependent activity of platinum array catalyst.

    Vladimir Komanicky;Hakim Iddir;Kee-Chul Chang;Andreas Menzel

  • In‐situ x‐ray reflectivity study of incipient oxidation of Pt(111) surface in electrolyte solutions

    H. You;D. J. Zurawski;Z. Nagy;R. M. Yonco

  • Commensurate water monolayer at the RuO2(110)/water interface.

    Y. S. Chu;T. E. Lister;W. G. Cullen;H. You

  • Lead adsorption at the calcite-water interface: Synchrotron X-ray standing wave and X-ray reflectivity studies

    Neil C. Sturchio;Ronald P. Chiarello;Likwan Cheng;Likwan Cheng;Paul F. Lyman

  • The upper critical field of untwinned YBa2Cu3O7−δ crystals

    U. Welp;M. Grimsditch;H. You;W.K. Kwok

  • pH- and Cation-Dependent Water Oxidation on Rutile RuO2(110)

    Reshma R. Rao;Botao Huang;Yu Katayama;Jonathan Hwang

  • Three-dimensional imaging of dislocation dynamics during the hydriding phase transformation

    A. Ulvestad;M. J. Welland;W. Cha;Y. Liu

  • Uniaxial in-plane magnetic anisotropy of Ga1−xMnxAs

    U. Welp;V. K. Vlasko-Vlasov;A. Menzel;H. D. You

  • Finite-size effect on the first-order metal-insulator transition in VO2 films grown by metal-organic chemical-vapor deposition.

    H. K. Kim;H. You;R. P. Chiarello;H. L. M. Chang

  • Epitaxial TiO2 and VO2 films prepared by MOCVD

    H.L.M. Chang;H. You;J. Guo;D.J. Lam

Frequent Co-Authors

Chenhui Zhu
Chenhui Zhu Lawrence Berkeley National Laboratory
Peter Zapol
Peter Zapol Argonne National Laboratory
Nenad M. Markovic
Nenad M. Markovic Argonne National Laboratory
Andreas Menzel
Andreas Menzel TU Dortmund University
Vojislav R. Stamenkovic
Vojislav R. Stamenkovic University of California, Irvine
Ulrich Welp
Ulrich Welp Argonne National Laboratory
Thomas P. Moffat
Thomas P. Moffat National Institute of Standards and Technology
Livia Giordano
Livia Giordano University of Milano-Bicocca

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