The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where David A. Czaplewski sits on this spectrum.
This scientist: 173 publications — 37th percentile
37% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where David A. Czaplewski sits on this spectrum.
This scientist: 49 D-Index — 57th percentile
57% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
David A. Czaplewski is affiliated with Argonne National Laboratory in the United States. Their research primarily spans the fields of Engineering, Physics and Astronomy, and Materials Science, incorporating extensive work across related subfields such as Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biomedical Engineering, and Materials Chemistry.
Their research interests cover a range of specialized topics. These include Metamaterials and Metasurfaces Applications, Mechanical and Optical Resonators, Plasmonic and Surface Plasmon Research, Force Microscopy Techniques and Applications, Advanced Antenna and Metasurface Technologies, Photonic and Optical Devices, and Liquid Crystal Research Advancements.
David A. Czaplewski has published multiple papers in various scientific journals and venues. Some recent publications are:
Their publication record also includes frequent contributions to venues such as arXiv (Cornell University), Optics Express, Nano Letters, Nature Communications, and Nanotechnology.
Collaborations have been a significant aspect of their research, with frequent co-authors including Daniel López, Jie Gao, Xiaodong Yang, Mikhail A. Kats, and Liliana Stan.
Haiqing Liu;Jun Kameoka;David A. Czaplewski;Harold G. Craighead
B. Ilic;D. Czaplewski;Harold G. Craighead;P. Neuzil
B. Ilic;D. Czaplewski;M. Zalalutdinov;Harold G. Craighead
Masayuki Sato;B.E. Hubbard;A.J. Sievers;B. Ilic
Jun Kameoka;Reid Orth;Yanou Yang;David Czaplewski
Huixu Deng;Zhigang Li;Liliana Stan;Daniel Rosenmann
Jun Kameoka;Reid Orth;Bojan Ilic;David Czaplewski
N. Earnest;S. Chakram;Y. Lu;N. Irons
Yu-Chih Tseng;Qing Peng;Leonidas E. Ocola;David A. Czaplewski
Changyao Chen;Damián H. Zanette;David A. Czaplewski;Steven Shaw
David A. Czaplewski;Jun Kameoka;Robert Timothy Mathers;Geoffrey W. Coates
M. Zalalutdinov;A. Olkhovets;A. Zehnder;B. Ilic
Fei Cheng;Jie Gao;Liliana Stan;Daniel Rosenmann
M. Zalalutdinov;A. Zehnder;A. Olkhovets;S. Turner
Masayuki Sato;B.E. Hubbard;L.Q. English;A.J. Sievers
D.A. Czaplewski;C.W. Dyck;H. Sumali;J.E. Massad
David A. Czaplewski;Changyao Chen;Daniel Lopez;Oriel Shoshani
David A Czaplewski;Gary A Patrizi;Garth M Kraus;Joel R Wendt
Zhigang Li;Liliana Stan;David A. Czaplewski;Xiaodong Yang
Jun Kameoka;Jun Kameoka;Scott S. Verbridge;Haiqing Liu;David A. Czaplewski;David A. Czaplewski
Leixin Ouyang;Wei Wang;Daniel Rosenmann;David A. Czaplewski
Anton Hartono Sumali;David A. Czaplewski;Jaron D. Kuppers;Jordan Elias Massad
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