The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Benjamin J. Blalock sits on this spectrum.
This scientist: 270 publications — 50th percentile
50% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Benjamin J. Blalock sits on this spectrum.
This scientist: 43 D-Index — 45th percentile
45% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Benjamin J. Blalock is affiliated with the University of Tennessee at Knoxville in the United States. Their primary research domain lies within engineering, particularly focusing on electrical and electronic engineering.
The scientist has contributed to various subfields, including electrical and electronic engineering, biomedical engineering, and artificial intelligence. Their work encompasses several key topics, such as:
Their recent publications demonstrate a focus on power electronics, semiconductor technologies, and system-level vulnerability analysis. Notable papers include:
The scientist frequently publishes in venues such as:
Benjamin J. Blalock collaborates regularly with several co-authors including Jeffrey W. Teng, Brett L. Ringel, Zachary R. Brumbach, Justin P. Heimerl, and Jackson P. Moody, each having multiple joint publications with them.
B.J. Blalock;P.E. Allen;G.A. Rincon-Mora
Zhiqiang Wang;Xiaojie Shi;Yang Xue;Leon M. Tolbert
Zhiqiang Wang;Xiaojie Shi;Leon M. Tolbert;Fred Wang
Zheyu Zhang;Fred Wang;Leon M. Tolbert;Benjamin J. Blalock
Zheyu Zhang;Ben Guo;Fei Fred Wang;Edward A. Jones
Zhiqiang Wang;Xiaojie Shi;Leon M. Tolbert;Fei Wang
Zheyu Zhang;Fred Wang;Leon M. Tolbert;Benjamin J. Blalock
B.K. Swann;B.J. Blalock;L.G. Clonts;D.M. Binkley
Weimin Zhang;Fred Wang;Daniel J. Costinett;Leon M. Tolbert
Handong Gui;Ruirui Chen;Jiahao Niu;Zheyu Zhang
Zheyu Zhang;Weimin Zhang;Fred Wang;Leon M. Tolbert
Zhiqiang Wang;Xiaojie Shi;Leon M. Tolbert;Fei Fred Wang
M. Mojarradi;D. Binkley;B. Blalock;R. Andersen
Zheyu Zhang;Jeffery Dix;Fei Fred Wang;Benjamin J. Blalock
B.J. Blalock;P.E. Allen
Yang Xue;Junjie Lu;Zhiqiang Wang;Leon M. Tolbert
B.J. Blalock;H.W. Li;P.E. Allen;S.A. Jackson
Weimin Zhang;Zhuxian Xu;Zheyu Zhang;Fred Wang
Fan Xu;Ben Guo;Leon M. Tolbert;Fei Wang
Zheyu Zhang;Ben Guo;Fred Wang;Leon M. Tolbert
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