World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
36
Citations
5331
World Ranking
8708
National Ranking
72

Andreas G. Boudouvis publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Andreas G. Boudouvis sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 178 publications — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Andreas G. Boudouvis D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Andreas G. Boudouvis sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 36 D-Index — 13th percentile

13% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Andreas G. Boudouvis is affiliated with the National Technical University of Athens in Greece. Their primary area of research lies within the broader field of engineering, with a particular emphasis on electrical and electronic engineering, materials chemistry, mechanical engineering, biomedical engineering, and computational mechanics.

The scientist's research covers multiple topics, including:

  • Model Reduction and Neural Networks
  • Semiconductor materials and devices
  • Catalytic Processes in Materials Science
  • Innovative Microfluidic and Catalytic Techniques Innovation
  • Crystallization and Solubility Studies
  • Calcium Carbonate Crystallization and Inhibition
  • Gaussian Processes and Bayesian Inference

Boudouvis has published extensively in a variety of academic journals. Frequent publication venues include:

  • Computers & Chemical Engineering
  • arXiv (Cornell University)
  • Chemical Engineering Journal
  • E3S Web of Conferences
  • Frontiers in Physics

Among their recent papers are:

  • Monte Carlo and Kinetic Monte Carlo Models for Deposition Processes: A Review of Recent Works, 2021, Frontiers in Physics
  • Thorough computational analysis of the staggered herringbone micromixer reveals transport mechanisms and enables mixing efficiency-based improved design, 2021, Chemical Engineering Journal
  • Multiscale Modeling in Chemical Vapor Deposition Processes: Models and Methodologies, 2020, Archives of Computational Methods in Engineering
  • Crystal Growth, Dissolution, and Agglomeration Kinetics of Sodium Chlorate, 2021, Industrial & Engineering Chemistry Research
  • A data-driven reduced-order model of nonlinear processes based on diffusion maps and artificial neural networks, 2020, Chemical Engineering Journal

Frequent coauthors in their body of work include:

  • Eleni D. Koronaki
  • Stéphane Bordas
  • Paris Papavasileiou
  • M. Kathrein
  • Christoph Czettl

Best Publications

  • A simple correlation for the operating temperature of photovoltaic modules of arbitrary mounting

    E. Skoplaki;A.G. Boudouvis;J.A. Palyvos

  • Flows of viscoplastic materials: Models and computations

    T.C. Papanastasiou;A.G. Boudouvis

  • Effect of Liquid Films on the Drying of Porous Media

    A. G. Yiotis;A. G. Boudouvis;A. K. Stubos;I. N. Tsimpanogiannis

  • A 2-D pore-network model of the drying of single-component liquids in porous media

    A.G Yiotis;A.K Stubos;A.G Boudouvis;Y.C Yortsos

  • On the Connection between Dielectric Breakdown Strength, Trapping of Charge, and Contact Angle Saturation in Electrowetting

    Antonis I. Drygiannakis;Athanasios G. Papathanasiou;Andreas G. Boudouvis

  • Radiative heat transfer in natural gas-fired furnaces

    E.P Keramida;H.H Liakos;M.A Founti;A.G Boudouvis

  • Manifestation of the connection between dielectric breakdown strength and contact angle saturation in electrowetting

    A. G. Papathanasiou;A. G. Boudouvis

  • Effect of liquid films on the isothermal drying of porous media.

    Yiotis Ag;Boudouvis Ag;Stubos Ak;Tsimpanogiannis In

  • Etching of SiO2 and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition

    Evangelos Gogolides;Philippe Vauvert;George Kokkoris;Guy Turban

  • Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon

    Nikolaos V. Mantzaris;Evangelos Gogolides;Andreas G. Boudouvis;Ahmed Rhallabi

  • Normal field instability and patterns in pools of ferrofluid

    A.G. Boudouvis;A.G. Boudouvis;J.L. Puchalla;J.L. Puchalla;L.E. Scriven;L.E. Scriven;R.E. Rosensweig;R.E. Rosensweig

  • Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution

    G. Kokkoris;A. Tserepi;A. G. Boudouvis;E. Gogolides

  • Mass transport analysis in perforation-mediated modified atmosphere packaging of strawberries

    G. Xanthopoulos;E.D. Koronaki;A.G. Boudouvis

  • Pore-Network Modeling of Isothermal Drying in Porous Media

    A. G. Yiotis;A. K. Stubos;A. G. Boudouvis;I. N. Tsimpanogiannis

  • RADIO-FREQUENCY PLASMAS IN CF4 : SELF-CONSISTENT MODELING OF THE PLASMA PHYSICS AND CHEMISTRY

    Nikolaos V. Mantzaris;Andreas Boudouvis;Evangelos Gogolides

  • Plasma processing for polymeric microfluidics fabrication and surface modification: Effect of super-hydrophobic walls on electroosmotic flow

    N. Vourdas;A. Tserepi;A. G. Boudouvis;E. Gogolides

  • Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si

    Georgios P. Gakis;Georgios P. Gakis;Constantin Vahlas;Hugues Vergnes;Sandrine Dourdain

  • Hierarchical, Plasma Nanotextured, Robust Superamphiphobic Polymeric Surfaces Structurally Stabilized Through a Wetting–drying Cycle

    Arun Kumar Gnanappa;Dimitrios P. Papageorgiou;Evangelos Gogolides;Angeliki Tserepi

  • Illuminating the connection between contact angle saturation and dielectric breakdown in electrowetting through leakage current measurements

    Unknown

  • Modelling of radio frequency plasmas in tetrafluoromethane (CF4): the gas phase physics and the role of negative ion detachment

    E Gogolides;M Stathakopoulos;A Boudouvis

  • Gold nanoparticles, radiations and the immune system: Current insights into the physical mechanisms and the biological interactions of this new alliance towards cancer therapy

    Nikolaos M. Dimitriou;George Tsekenis;Evangelos C. Balanikas;Athanasia Pavlopoulou

  • Multiscale modeling in chemical vapor deposition processes: Coupling reactor scale with feature scale computations

    Nikolaos Cheimarios;George Kokkoris;Andreas G. Boudouvis

  • A CFD analysis of slag properties, electrode shape and immersion depth effects on electric submerged arc furnace heating in ferronickel processing

    K.T. Karalis;N. Karkalos;N. Cheimarios;G.S.E. Antipas

  • Nanomechanical and nanotribological properties of hydrophobic fluorocarbon dielectric coating on tetraethoxysilane for electrowetting applications

    Elias P. Koumoulos;Costas A. Charitidis;Dimitrios P. Papageorgiou;Athanasios G. Papathanasiou

Frequent Co-Authors

Evangelos Gogolides
Evangelos Gogolides National Centre of Scientific Research Demokritos
N.C. Markatos
N.C. Markatos National Technical University of Athens
Uwe Hampel
Uwe Hampel Helmholtz-Zentrum Dresden-Rossendorf
L. E. Scriven
L. E. Scriven University of Minnesota
Angeliki Tserepi
Angeliki Tserepi National Centre of Scientific Research Demokritos
Ioannis G. Kevrekidis
Ioannis G. Kevrekidis Johns Hopkins University
Stéphane Bordas
Stéphane Bordas University of Luxembourg
Panagiotis Argitis
Panagiotis Argitis National Centre of Scientific Research Demokritos

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