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Materials Science

D-Index
63
Citations
15101
World Ranking
6131
National Ranking
1564

Alberto Piqué publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Alberto Piqué sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 297 publications — 59th percentile

59% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Alberto Piqué D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Alberto Piqué sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 63 D-Index — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2014 - Fellow of American Physical Society (APS) Citation For achievements in laser materials processing and developing the laserinduced forward transfer of nanoparticle inks and complex suspensions for the directwrite of functional materials for applications in micropower sources, chembio sensors and printed electronics
  • 2012 - SPIE Fellow

Overview

Alberto Piqué is affiliated with the United States Naval Research Laboratory. Their research spans primarily across Materials Science and Engineering, with a focus on subfields such as Materials Chemistry, Biomedical Engineering, Polymers and Plastics, Electronic, Optical and Magnetic Materials, and Mechanical Engineering.

The work of this scientist frequently addresses topics including ZnO doping and properties, Transition Metal Oxide Nanomaterials, Electronic and Structural Properties of Oxides, Additive Manufacturing and 3D Printing Technologies, Additive Manufacturing Materials and Processes, Thermal Radiation and Cooling Technologies, and Urban Heat Island Mitigation.

Among the recent published papers authored or co-authored by Alberto Piqué are:

  • Metals by Micro-Scale Additive Manufacturing: Comparison of Microstructure and Mechanical Properties (2020) in Advanced Functional Materials
  • ZnO Nanoparticle/Graphene Hybrid Photodetectors via Laser Fragmentation in Liquid (2020) in Nanomaterials
  • VO2-based thin-film radiators with variable thermal emissivity (2022) in Thin Solid Films
  • Tunable permittivity of La-doped BaSnO3 thin films for near- and mid-infrared plasmonics (2020) in Journal of Physics D Applied Physics
  • Electronic and optical properties of strain-locked metallic Ti2O3 films (2022) in Current Applied Physics

The venues where Alberto Piqué has published frequently include Thin Solid Films, Advanced Functional Materials, Nanomaterials, Current Applied Physics, and Optics Express.

Frequent collaborators listed alongside Alberto Piqué include Heungsoo Kim, Kristin M. Charipar, Nicholas A. Charipar, Scott A. Mathews, and David Lahneman.

Alberto Piqué's career has been recognized through awards such as the Fellow of American Physical Society (APS) awarded in 2014 for achievements in laser materials processing and the development of laser-induced forward transfer for nanoparticle inks and complex suspensions. The SPIE Fellow distinction was also awarded in 2012.

Best Publications

  • Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices

    H. Kim;C. M. Gilmore;A. Piqué;J. S. Horwitz

  • Transparent conducting aluminum-doped zinc oxide thin films for organic light-emitting devices

    H. Kim;C. M. Gilmore;J. S. Horwitz;A. Piqué

  • Laser deposition of polymer and biomaterial films.

    D B Chrisey;A Piqué;R A McGill;J S Horwitz

  • Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices

    H Kim;A Piqué;J.S Horwitz;H Murata

  • Indium tin oxide thin films for organic light-emitting devices

    H. Kim;A. Piqué;J. S. Horwitz;H. Mattoussi

  • Laser Direct-Write Techniques for Printing of Complex Materials

    Craig B. Arnold;Pere Serra;Alberto Piqué

  • Effect of film thickness on the properties of indium tin oxide thin films

    H. Kim;J. S. Horwitz;G. Kushto;A. Piqué

  • Direct-write technologies for rapid prototyping applications : sensors, electronics and integrated power sources

    Alberto Piqué;Douglas B. Chrisey

  • Laser precision microfabrication

    Koji Sugioka;Michel Meunier;Alberto Pique

  • Laser-Induced Forward Transfer: Fundamentals and Applications

    Pere Serra;Alberto Piqué

  • A novel laser transfer process for direct writing of electronic and sensor materials

    A. Piqué;D.B. Chrisey;R.C.Y. Auyeung;J. Fitz-Gerald

  • Transparent conducting F-doped SnO2 thin films grown by pulsed laser deposition

    H. Kim;R.C.Y. Auyeung;A. Piqué

  • Growth of organic thin films by the matrix assisted pulsed laser evaporation (MAPLE) technique

    A. Piqué;R.A. McGill;D.B. Chrisey;D. Leonhardt

  • Microstereolithography: a Review

    Arnaud Bertsch;Sébastien Jiguet;Paul Bernhard;Philippe Renaud

  • The deposition, structure, pattern deposition, and activity of biomaterial thin-films by matrix-assisted pulsed-laser evaporation (MAPLE) and MAPLE direct write

    P. K. Wu;B. R. Ringeisen;J. Callahan;M. Brooks

  • Three-Dimensional Printing of Interconnects by Laser Direct-Write of Silver Nanopastes

    Jiwen Wang;Raymond C. Y. Auyeung;Heungsoo Kim;Nicholas A. Charipar

  • Transparent conducting Sb-doped SnO2 thin films grown by pulsed-laser deposition

    Unknown

  • Laser transfer of biomaterials: Matrix-assisted pulsed laser evaporation (MAPLE) and MAPLE Direct Write

    P. K. Wu;P. K. Wu;B. R. Ringeisen;D. B. Krizman;C. G. Frondoza

  • Generation of mesoscopic patterns of viable Escherichia coli by ambient laser transfer

    B.R. Ringeisen;D.B. Chrisey;A. Piqué;H.D. Young

  • Impact of reduced dimensionality on the magnetic and magnetocaloric response of La0.7Ca0.3MnO3

    P. Lampen;N. S. Bingham;M. H. Phan;H. Kim

  • New approach to laser direct writing active and passive mesoscopic circuit elements

    D.B Chrisey;A Pique;J Fitz-Gerald;R.C.Y Auyeung

Frequent Co-Authors

Douglas B. Chrisey
Douglas B. Chrisey Tulane University
Craig B. Arnold
Craig B. Arnold Princeton University
James S. Horwitz
James S. Horwitz United States Naval Research Laboratory
Zakya H. Kafafi
Zakya H. Kafafi Lehigh University
Hideyuki Murata
Hideyuki Murata Japan Advanced Institute of Science and Technology
Jeffrey C. Owrutsky
Jeffrey C. Owrutsky United States Naval Research Laboratory
Dana D. Dlott
Dana D. Dlott University of Illinois at Urbana-Champaign
Richard A. Vaia
Richard A. Vaia United States Air Force Research Laboratory
Rhonda M. Stroud
Rhonda M. Stroud Arizona State University
Ralph Spolenak
Ralph Spolenak ETH Zurich

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