| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 410 | 30 | 28 | 6 |
| Engineering and Technology | 845 | 13 | 35 | 10 |
The journal covers a variety of subjects, including Electronic engineering, Wafer, Optoelectronics, Semiconductor device fabrication and Integrated circuit. IEEE Transactions on Semiconductor Manufacturing addresses concerns in Electronic engineering which are intertwined with other disciplines, such as Transistor and Process control, Process (computing). While it focused on Process control, it was also able to explore topics like Control engineering, Control theory and Control theory.
The concepts on Wafer presented in it can also apply to other research fields, including Etching (microfabrication), Chemical-mechanical planarization, Optics and Analytical chemistry. In addition to Optoelectronics research, the journal aims to explore topics under Electrical engineering and MOSFET. Topics in Semiconductor device fabrication were tackled in line with various other fields like Reliability engineering, Manufacturing engineering and Artificial intelligence.
The journal aims to investigate interdisciplinary topics such as Manufacturing engineering and Special section.
The most cited articles explore disciplines such as Electronic engineering, Semiconductor device fabrication, Wafer, Process control and Integrated circuit. While work presented in the journal publications provide substantial information on Electronic engineering, it also covers topics in Integrated circuit layout and Plasma etching. The works on Semiconductor device fabrication tackled in the most cited publications bring together disciplines like Petri net, Real-time computing, Artificial intelligence, Scheduling (production processes) and Production control.
IEEE Transactions on Semiconductor Manufacturing mainly deals with areas of study such as Artificial intelligence, Wafer, Silicon, Semiconductor device fabrication and Pattern recognition. The journal addresses concerns in Artificial intelligence which are intertwined with other disciplines, such as Machine learning and Process (computing). The majority of Process (computing) studies in the journal are focused on the subject of Process control.
Issues in Wafer were discussed, taking into consideration concepts from other disciplines like Variation (game tree), Trench, Cluster analysis, Process optimization and MOSFET. The work on Silicon tackled in it brings together disciplines like Etching (microfabrication), Chemical vapor deposition, Doping and Analytical chemistry. The journal explores issues in Semiconductor device fabrication which can be linked to other research areas like Artificial neural network, Manufacturing engineering, Advanced manufacturing, Manufacturing technology and Semiconductor device modeling.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in IEEE Transactions on Semiconductor Manufacturing (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in IEEE Transactions on Semiconductor Manufacturing (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 19.30% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 19.57% were posted by at least one author from the top 10 institutions publishing in the journal. Another 10.87% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 28.26% of all publications and 41.30% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Jared O'Leary;Kapil Sawlani;Ali Mesbah
(2020)Chen-Fu Chien;Chia-Cheng Chen
(2020)Hsueh-Ping Lu;Chao-Ton Su
(2021)Timm Ziarnetzky;Lars Monch;Reha Uzsoy
(2020)Chen-Fu Chien;Yin-Hung Chen;Mei-Fang Lo
(2020)Xiangdong Li;Karen Geens;Dirk Wellekens;Ming Zhao
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