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IEEE

China Semiconductor Technology International Conference (CSTIC)

Location: Shanghai , China

Conference dates: 3/20/2023 - 3/21/2023

Research H-index
4

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 103 51 77 2
Electronics and Electrical Engineering 474 45 78 4
Engineering and Technology 358 17 20 2

Call for Papers

Topics to be addressed at CSTIC 2023 include, but are not limited to the following:

Symposium I: Device Engineering and Memory Technology

Symposium II: Lithography and Patterning

Symposium III: Dry & Wet Etch and Cleaning

Symposium IV: Thin Film, Plating and Process Integration

Symposium V: CMP and Post-Polish Cleaning

Symposium VI: Metrology, Reliability and Testing

Symposium VII: Packaging and Assembly

Symposium VIII: MEMS, Sensors and Emerging Semiconductor Technologies

Symposium IX: Design and Automation of Circuits and Systems

Overview

This page presents a comprehensive ranking of scientific conferences in the field of Engineering and Technology, meticulously compiled by Research.com, one of the most trusted sources for scientific research data across all major domains since 2014. The ranking aims to assist academics, industry professionals, and institutions by providing a thoroughly researched overview of leading conferences based on transparent and robust quantitative measures.

The position of each conference in this ranking is determined by Research.com's unique bibliometric score, which synthesizes the estimated h-index and considers the number of distinguished scientists who have participated in the conference over the past three years. The Impact Score values cited in this ranking were collected on 2024-11-27, ensuring that the data reflects the most current and relevant information available.

Our process entailed the careful examination of over 2,262 conferences, selected through a detailed and rigorous evaluation of more than 26,934 scientific documents published in the last three years by 9,385 leading and highly respected scientists in Engineering and Technology. This analytical approach underscores the depth and complexity of the research conducted by our team of specialists, further reinforcing the credibility and reliability of the presented rankings.

For a comprehensive explanation of our bibliometric scoring methodology and to better understand the criteria and analytical processes behind these results, please visit our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at China Semiconductor Technology International Conference (based on the number of publications) are:

  • Hai-Yang Zhang (42 papers) absent at the last edition,
  • Ru Huang (37 papers) published 5 papers at the last edition, 7 less than at the previous edition,
  • Kailiang Zhang (32 papers) absent at the last edition,
  • Fang Wang (27 papers) absent at the last edition,
  • Qiang Wu (26 papers) absent at the last edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at China Semiconductor Technology International Conference (based on the number of publications) are:

  • Semiconductor Manufacturing International Corporation (222 papers) published 10 papers at the last edition, 9 more than at the previous edition,
  • Peking University (104 papers) published 11 papers at the last edition, 5 less than at the previous edition,
  • Chinese Academy of Sciences (71 papers) published 4 papers at the last edition the same number as at the previous edition,
  • Katholieke Universiteit Leuven (49 papers) published 4 papers at the last edition, 2 more than at the previous edition,
  • Fudan University (41 papers) published 5 papers at the last edition, 3 less than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 47.34% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 38.20% were posted by at least one author from the top 10 institutions publishing at the conference. Another 21.35% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 16.85% of all publications and 23.60% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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