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Weileun Fang

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 37 5103 4899 94 94 422 6128

Weileun Fang publications per year

The chart shows the history of publications by Weileun Fang between 1994 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Weileun Fang published across 32 years, from 1994 to 2025, averaging 13.9 papers a year. Output peaked at 35 publications in 2011. 38 of the 444 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1994 to 2025. Vertical axis: number of publications, 0 to 35. Peak 35 publications in 2011. 1994: 2 publications 1995: 2 publications 1996: 1 publication 1997: 1 publication 1998: 3 publications 1999: 6 publications 2000: 5 publications 2001: 11 publications 2002: 6 publications 2003: 13 publications 2004: 8 publications 2005: 13 publications 2006: 15 publications 2007: 27 publications 2008: 17 publications 2009: 27 publications 2010: 22 publications 2011: 35 publications 2012: 24 publications 2013: 32 publications 2014: 14 publications 2015: 17 publications 2016: 8 publications 2017: 14 publications 2018: 5 publications 2019: 17 publications 2020: 15 publications 2021: 17 publications 2022: 13 publications 2023: 16 publications 2024: 17 publications 2025: 21 publications
1994 2025

444 publications in total across all disciplines

View publications per year as a table
Weileun Fang: publications per year, 1994 to 2025
Year Publications
1994 2
1995 2
1996 1
1997 1
1998 3
1999 6
2000 5
2001 11
2002 6
2003 13
2004 8
2005 13
2006 15
2007 27
2008 17
2009 27
2010 22
2011 35
2012 24
2013 32
2014 14
2015 17
2016 8
2017 14
2018 5
2019 17
2020 15
2021 17
2022 13
2023 16
2024 17
2025 21
Total 444
Download as CSV

Weileun Fang publications per year - data summary

  • Weileun Fang, a Electronics and Electrical Engineering scholar from National Tsing Hua University, has 444 publications recorded across 32 years, from 1994 to 2025.
  • The oldest publication on record dates to 1994 and the most recent to 2025.
  • The most productive year is 2011, with 35 publications.
  • The least productive years with any output are 1996 and 1997, with 1 publication each.
  • The rate of publication averages 13.9 papers per year over the whole span, or 13.9 per year counting only the 32 years with at least one publication.
  • The last 5 years on the chart (2021-2025) hold 84 publications, 19% of the career total.
  • Split into equal eras - 1994-2004: 58 publications (5.3 per year); 2005-2015: 243 publications (22.1 per year); 2016-2025: 143 publications (14.3 per year).
  • Comparing the opening and closing eras, the overall trend of publication is rising.

Weileun Fang publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Weileun Fang sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 414–433 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 422 publications — 77th percentile

77% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169 422
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
Download as CSV

Weileun Fang publication distribution in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the publication count of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 53 ranges running from 34–53 to 1,065+ publications.
  • Weileun Fang, a Electronics and Electrical Engineering scholar from National Tsing Hua University, records 422 publications - the 77th percentile of the discipline.
  • 77% of ranked Electronics and Electrical Engineering scientists score the same or lower than Weileun Fang, and about 23% score higher.
  • The median of the discipline falls in the 254–273 publications range, and Weileun Fang ranks above the median.
  • The most crowded range is 174–193 publications, holding 445 scientists (6% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 294–313 publications), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 1,065 publications or more, 99 scientists in all (1% of the field).

Weileun Fang D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Weileun Fang sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 37 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 37 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220 37
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
Download as CSV

Weileun Fang D-index placement in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the discipline H-index (D-index) of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 82 ranges running from 30 to 111+ D-Index.
  • Weileun Fang, a Electronics and Electrical Engineering scholar from National Tsing Hua University, records 37 D-Index - the 27th percentile of the discipline.
  • 27% of ranked Electronics and Electrical Engineering scientists score the same or lower than Weileun Fang, and about 73% score higher.
  • The median of the discipline falls in the 46 D-Index range, and Weileun Fang ranks below the median.
  • The most crowded range is 32 D-Index, holding 263 scientists (4% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 50 D-Index), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 111 D-Index or more, 96 scientists in all (1% of the field).

Research.com Recognitions

  • 2015 - IEEE Fellow For contributions to measurement methods and process technologies for micro-electro-mechanical systems

Overview

Weileun Fang is affiliated with National Tsing Hua University in Taiwan. Their research primarily focuses on engineering, with a significant concentration in electrical and electronic engineering, biomedical engineering, atomic and molecular physics and optics, mechanical engineering, and cognitive neuroscience.

The main topics of their work include advanced MEMS and NEMS technologies, acoustic wave resonator technologies, mechanical and optical resonators, advanced sensor and energy harvesting materials, gas sensing nanomaterials and sensors, tactile and sensory interactions, and innovative energy harvesting technologies.

Frequent coauthors of Weileun Fang include Ya-Chu Lee, Mingching Wu, Hao-Chien Cheng, Fuchi Shih, and Tung-Lin Chien.

Their recent papers cover a range of technical subjects and publication venues:

  • On the design of piezoelectric MEMS microspeaker for the sound pressure level enhancement (2020), Sensors and Actuators A Physical
  • CMOS-MEMS technologies for the applications of environment sensors and environment sensing hubs (2021), Journal of Micromechanics and Microengineering
  • On the design of piezoelectric MEMS scanning mirror for large reflection area and wide scan angle (2022), Sensors and Actuators A Physical
  • CMOS-Based Tactile Force Sensor: A Review (2021), IEEE Sensors Journal
  • CMOS MEMS Thermoelectric Infrared Sensor With Plasmonic Metamaterial Absorber for Selective Wavelength Absorption and Responsivity Enhancement (2020), IEEE Sensors Journal

Weileun Fang has published extensively in several venues, including:

  • IEEE Sensors Journal
  • Sensors and Actuators A Physical
  • 2022 IEEE 35th International Conference on Micro Electro Mechanical Systems Conference (MEMS)
  • SSRN Electronic Journal
  • Journal of Micromechanics and Microengineering

Their contributions to the field were recognized with the IEEE Fellow award in 2015, specifically for contributions to measurement methods and process technologies for micro-electro-mechanical systems.

Best Publications

  • Determining mean and gradient residual stresses in thin films using micromachined cantilevers

    W Fang;J A Wickert

  • Localized induction heating solder bonding for wafer level MEMS packaging

    Hsueh-An Yang;Mingching Wu;Weileun Fang

  • Static and dynamic mechanical properties of polydimethylsiloxane/carbon nanotube nanocomposites

    Chung-Lin Wu;Chung-Lin Wu;Hsueh-Chu Lin;Jiong-Shiun Hsu;Ming-Chuen Yip

  • Determining thermal expansion coefficients of thin films using micromachined cantilevers

    Weileun Fang;Hsin-Chung Tsai;Chun-Yen Lo

  • Implementation of a Monolithic Single Proof-Mass Tri-Axis Accelerometer Using CMOS-MEMS Technique

    Chih-Ming Sun;Ming-Han Tsai;Yu-Chia Liu;Weileun Fang

  • Flexible carbon nanotubes electrode for neural recording.

    Chia-Min Lin;Yu-Tao Lee;Shih-Rung Yeh;Weileun Fang

  • Determination of the elastic modulus of thin film materials using self-deformed micromachined cantilevers

    Weileun Fang

  • The development and application of microthermal sensors with a mesh-membrane supporting structure

    Shih-Ta Hung;Shwin-Chung Wong;Weileun Fang

  • Thermal Actuated Solid Tunable Lens

    Sz-Yuan Lee;Hsi-Wen Tung;Wen-Chih Chen;Weileun Fang

  • Development of patterned carbon nanotubes on a 3D polymer substrate for the flexible tactile sensor application

    Chih-Fan Hu;Wang-Shen Su;Weileun Fang

  • A generalized CMOS-MEMS platform for micromechanical resonators monolithically integrated with circuits

    Wen-Chien Chen;Weileun Fang;Sheng-Shian Li

  • A Three-Axis CMOS-MEMS Accelerometer Structure With Vertically Integrated Fully Differential Sensing Electrodes

    Ming-Han Tsai;Yu-Chia Liu;Weileun Fang

  • On the buckling behavior of micromachined beams

    Weileun Fang;Chun-Hsien Lee;Hsin-Hua Hu

  • Design and application of a metal wet-etching post-process for the improvement of CMOS-MEMS capacitive sensors

    Ming-Han Tsai;Chih-Ming Sun;Yu-Chia Liu;Chuanwei Wang

  • Tuning the sensing range and sensitivity of three axes tactile sensors using the polymer composite membrane

    Chih-Chieh Wen;Weileun Fang

  • A reliable single-layer out-of-plane micromachined thermal actuator ☆

    Wen-Chih Chen;Chien-Cheng Chu;Jerwei Hsieh;Weileun Fang

  • Micromachined rubber O-ring micro-fluidic couplers

    Tze-Jung Yao;Sangwook Lee;Weileun Fang;Yu-Chong Tai

  • Determining the Poisson’s ratio of thin film materials using resonant method

    Hsin-Chang Tsai;Weileun Fang

  • On the design of piezoelectric MEMS microspeaker for the sound pressure level enhancement

    Hsu-Hsiang Cheng;Sung-Cheng Lo;Zi-Rong Huang;Yi-Jia Wang

  • Liquid crystal alignment in nanoporous anodic aluminum oxide layer for LCD panel applications

    Chitsung Hong;Tsung-Ta Tang;Chi-Yu Hung;Ru-Pin Pan

  • A novel stress isolation guard-ring design for the improvement of a three-axis piezoresistive accelerometer

    Hsieh-Shen Hsieh;Heng-Chung Chang;Heng-Chung Chang;Chih-Fan Hu;Chao-Lin Cheng

  • On the sensitivity improvement of CMOS capacitive accelerometer

    Chih-Ming Sun;Chuan Wei Wang;Weileun Fang

  • Design and simulation of a dual-axis sensing decoupled vibratory wheel gyroscope

    Deng-Horng Tsai;Weileun Fang

  • Development of a CMOS-Based Capacitive Tactile Sensor With Adjustable Sensing Range and Sensitivity Using Polymer Fill-In

    Yu-Chia Liu;Chih-Ming Sun;Li-Yuan Lin;Ming-Han Tsai

  • A novel electromagnetic elastomer membrane actuator with a semi-embedded coil

    Hung-Lin Yin;Yu-Che Huang;Weileun Fang;Jerwei Hsieh

  • Development of tracking and focusing micro actuators for dual-stage optical pick-up head

    Mingching Wu;Sheng-Yi Hsiao;Chih-Yu Peng;Weileun Fang

  • A novel CMOS out-of-plane accelerometer with fully differential gap-closing capacitance sensing electrodes

    Chuanwei Wang;Ming-Han Tsai;Chih-Ming Sun;Weileun Fang

Frequent Co-Authors

Chengkuo Lee
Chengkuo Lee National University of Singapore
Hong Hocheng
Hong Hocheng National Tsing Hua University
Huan-Cheng Chang
Huan-Cheng Chang Academia Sinica
Yu-Cheng Lin
Yu-Cheng Lin National Cheng Kung University
David A. Horsley
David A. Horsley University of California, Davis
Masayoshi Esashi
Masayoshi Esashi Tohoku University
Patrick Ruther
Patrick Ruther University of Freiburg
Reza Ghodssi
Reza Ghodssi University of Maryland, College Park
Yu-Chong Tai
Yu-Chong Tai California Institute of Technology
Ryutaro Maeda
Ryutaro Maeda National Institute of Advanced Industrial Science and Technology

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Related Online Degrees & Career Pathways

For students pursuing Electronics and Electrical Engineering, exploring complementary fields can expand career opportunities. One valuable pathway is project management, where leadership and organizational skills are critical. Many institutions now offer online accelerated project management degree programs that allow students to quickly gain these competencies alongside technical expertise.

Those interested in furthering their education may also consider a bachelor of project management. This degree is designed to provide a strong foundation in managing engineering projects, budgeting, and team coordination, critical skills in the electrical engineering industry.

Flexibility is often essential for working professionals. Fortunately, many universities offer online degree programs for working adults, enabling students to balance their studies with career and personal commitments while advancing in their field.

Additionally, incorporating instructional design expertise can open doors to training and development roles in technology companies. Exploring instructional design programs can equip graduates with skills to design effective educational materials and training modules, enhancing workforce development in engineering environments.

Best Scientists Citing Weileun Fang

Chengkuo Lee

Chengkuo Lee

National University of Singapore

Publications: 27

Hiroshi Toshiyoshi

Hiroshi Toshiyoshi

University of Tokyo

Publications: 17

Kazuhiro Hane

Kazuhiro Hane

Tohoku University

Publications: 15

Sheng Liu

Sheng Liu

Wuhan University

Publications: 14

Kazuo Sato

Kazuo Sato

Aichi Institute of Technology

Publications: 12

Yao-Joe Yang

Yao-Joe Yang

National Taiwan University

Publications: 11

Dzung Viet Dao

Dzung Viet Dao

Griffith University

Publications: 11

Nam-Trung Nguyen

Nam-Trung Nguyen

Griffith University

Publications: 11

Hans Zappe

Hans Zappe

University of Freiburg

Publications: 10

Yong-Kweon Kim

Yong-Kweon Kim

Seoul National University

Publications: 9

Brian L. Wardle

Brian L. Wardle

MIT

Publications: 9

Liwei Lin

Liwei Lin

University of California, Berkeley

Publications: 9

Toan Dinh

Toan Dinh

University of Southern Queensland

Publications: 9

Tayfun Akin

Tayfun Akin

Middle East Technical University

Publications: 9

Thomas Pardoen

Thomas Pardoen

Université Catholique de Louvain

Publications: 8

Raafat R. Mansour

Raafat R. Mansour

University of Waterloo

Publications: 8

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R. P. Campion

R. P. Campion

University of Nottingham

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Anne-Claude Gingras

Lunenfeld-Tanenbaum Research Institute

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Ana Miranda

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Andrew Lyne

Andrew Lyne

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Guobin Fu

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Anthony J. Koleske

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