World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
30
Citations
3784
World Ranking
6803
National Ranking
39

V. Chu publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where V. Chu sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 237 publications — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

V. Chu D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where V. Chu sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 30 D-Index — 3rd percentile

3% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Best Publications

  • Photothermal and photoconductive determination of surface and bulk defect densities in amorphous silicon films

    Z E. Smith;V. Chu;K. Shepard;S. Aljishi

  • Thermal-equilibrium defect processes in hydrogenated amorphous silicon

    Z. E. Smith;S. Aljishi;D. Slobodin;V. Chu

  • Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition

    Unknown

  • Detection of DNA and proteins using amorphous silicon ion-sensitive thin-film field effect transistors.

    Unknown

  • Optoelectronic and structural properties of amorphous silicon-carbon alloys deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition

    J.P. Conde;V. Chu;M.F. Da Silva;A. Kling

  • Current routes in hydrogenated microcrystalline silicon

    Unknown

  • Control of sequential fluid delivery in a fully autonomous capillary microfluidic device

    Unknown

  • Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900 °C

    Unknown

  • DNA aptamer-based sandwich microfluidic assays for dual quantification and multi-glycan profiling of cancer biomarkers.

    Unknown

  • Amorphous silicon air-gap resonators on large-area substrates

    Unknown

  • Transport and photoluminescence of hydrogenated amorphous silicon–carbon alloys

    V. Chu;J. P. Conde;J. Jarego;P. Brogueira

  • Spin dependent tunnel junctions for memory and read-head applications

    P.P. Freitas;S. Cardoso;R. Sousa;Wanjun Ku

  • Electrostatically actuated polymer microresonators

    Unknown

  • Electrostatic actuation of thin-film microelectromechanical structures

    Unknown

  • Amorphous silicon electrostatic microresonators with high quality factors

    Unknown

  • Optoelectronic properties of hydrogenated amorphous silicon films deposited under negative substrate bias

    P. Roca i Cabarrocas;P. Morin;V. Chu;J. P. Conde

  • Immobilization and hybridization by single sub-millisecond electric field pulses, for pixel-addressed DNA microarrays.

    F Fixe;H.M Branz;N Louro;V Chu

  • Top-Down Fabricated Silicon Nanowire Arrays for Field-Effect Detection of Prostate-Specific Antigen

    Dipti Rani;Vivek Pachauri;Narayanan Madaboosi;Pawan Jolly

Frequent Co-Authors

Paulo P. Freitas
Paulo P. Freitas International Iberian Nanotechnology Laboratory
Sigurd Wagner
Sigurd Wagner Princeton University
Susana Cardoso
Susana Cardoso Instituto Superior Técnico
Leonel Sousa
Leonel Sousa Instituto Superior Técnico
Candido Pirri
Candido Pirri Polytechnic University of Turin
Patrick M. Lenahan
Patrick M. Lenahan Pennsylvania State University
P. Roca i Cabarrocas
P. Roca i Cabarrocas École Polytechnique
Philippe M. Fauchet
Philippe M. Fauchet Vanderbilt University
Fabrizio Giorgis
Fabrizio Giorgis Polytechnic University of Turin
Howard M. Branz
Howard M. Branz University of Colorado Boulder

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