World's Best Scientists 2026 revealed!
Uwe Schnakenberg

Uwe Schnakenberg

D-Index & Metrics

Engineering and Technology

D-Index
37
Citations
5371
World Ranking
8408
National Ranking
284

Uwe Schnakenberg publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Uwe Schnakenberg sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 182 publications — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Uwe Schnakenberg D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Uwe Schnakenberg sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 37 D-Index — 16th percentile

16% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Uwe Schnakenberg is affiliated with RWTH Aachen University in Germany, with a primary focus on the field of Engineering. Their research spans several specialized subfields, including Biomedical Engineering, Electrical and Electronic Engineering, Molecular Biology, Public Health, Environmental and Occupational Health, and Bioengineering.

The scientist's work covers a range of main topics within their research domain:

  • Microfluidic and Bio-sensing Technologies
  • Microfluidic and Capillary Electrophoresis Applications
  • Electrowetting and Microfluidic Technologies
  • 3D Printing in Biomedical Research
  • Reproductive Biology and Fertility
  • Fuel Cells and Related Materials
  • Analytical Chemistry and Sensors

Uwe Schnakenberg has contributed to various publication venues, reflecting the diversity of their scientific interests. Frequent venues include:

  • RWTH Publications (RWTH Aachen)
  • Sensors and Actuators B Chemical
  • physica status solidi (a)
  • Electroanalysis
  • Sensors and Actuators A Physical

Their recent papers provide insight into the scope and focus of the research efforts. Notable publications include:

  • "Different Frequency of Cyclic Tensile Strain Relates to Anabolic/Catabolic Conditions Consistent with Immunohistochemical Staining Intensity in Tenocytes", 2020, International Journal of Molecular Sciences
  • "PortaDrop: A portable digital microfluidic platform providing versatile opportunities for Lab-On-A-Chip applications", 2020, PLoS ONE
  • "The spatial self-organization within pluripotent stem cell colonies is continued in detaching aggregates", 2022, Biomaterials
  • "Dry Film Resist Laminated Microfluidic System for Electrical Impedance Measurements", 2021, Micromachines
  • "Electrochemical Impedance Spectroscopy Biosensor Enabling Kinetic Monitoring of Fucosyltransferase Activity", 2021, ACS Sensors

Collaboration plays a role in their research, with frequent co-authors including:

  • Yuan Cao
  • Tom Kremers
  • Julia Floehr
  • Danyil Azarkh
  • Andrij Pich

Best Publications

  • Surface topography enhances differentiation of mesenchymal stem cells towards osteogenic and adipogenic lineages

    Giulio Abagnale;Michael Steger;Vu Hoa Nguyen;Nils Hersch

  • TMAHW etchants for silicon micromachining

    U. Schnakenberg;W. Benecke;P. Lange

  • Keratins as the main component for the mechanical integrity of keratinocytes

    Lena Ramms;Gloria Fabris;Reinhard Windoffer;Nicole Schwarz

  • Sputtered Iridium Oxide Films as Charge Injection Material for Functional Electrostimulation

    E. Slavcheva;R. Vitushinsky;W. Mokwa;U. Schnakenberg

  • PZT thin films for piezoelectric microactuator applications

    H. Kueppers;T. Leuerer;U. Schnakenberg;W. Mokwa

  • NH4Oh-based etchants for silicon micromachining

    U. Schnakenberg;W. Benecke;D. Löchel

  • Microfluidic biolector-microfluidic bioprocess control in microtiter plates.

    Matthias Funke;Andreas Buchenauer;Uwe Schnakenberg;Wilfried Mokwa

  • Micro-transponder systems for medical applications

    W. Mokwa;U. Schnakenberg

  • Initial investigations on systems for measuring intraocular pressure

    U Schnakenberg;P Walter;G vom Bögel;C Krüger

  • Microelectrode arrays and application to biosensing devices

    R. Hintsche;M. Paeschke;U. Wollenberger;U. Schnakenberg

  • Properties of interdigital electrode arrays with different geometries

    M. Paeschke;U. Wollenberger;C. Köhler;T. Lisec

  • RF-sputtering of iridium oxide to be used as stimulation material in functional medical implants

    B Wessling;W Mokwa;U Schnakenberg

  • Development of a Completely Encapsulated Intraocular Pressure Sensor

    P. Walter;U. Schnakenberg;G. vom Bögel;P. Ruokonen

  • Substrate arrays of iridium oxide microelectrodes for in vitro neuronal interfacing

    Shady Gawad;Shady Gawad;Michele Giugliano;Michele Giugliano;Marc O Heuschkel;Boerge Wessling

  • Electrodeposition and properties of NiW films for MEMS application

    E. Slavcheva;W. Mokwa;U. Schnakenberg

  • Characterization of electroplated nickel

    T. Fritz;H. S. Cho;K. J. Hemker;W. Mokwa

  • Micro-bioreactors for fed-batch fermentations with integrated online monitoring and microfluidic devices.

    A. Buchenauer;M.C. Hofmann;M. Funke;J. Büchs

  • A smart accelerometer with on-chip electronics fabricated by a commercial CMOS process

    W. Riethmüller;W. Benecke;U. Schnakenberg;B. Wagner

  • Intravascular pressure monitoring system

    Uwe Schnakenberg;Clemens Krüger;Joachim-Georg Pfeffer;Wilfried Mokwa

  • Thermal Annealing Effects on the Mechanical Properties of Plasma‐Enhanced Chemical Vapor Deposited Silicon Oxide Films

    H. ‐J. Schliwinski;U. Schnakenberg;W. Windbracke;H. Neff

  • NH4OH-based etchants for silicon micromachining: Influence of additives and stability of passivation layers

    U. Schnakenberg;W. Benecke;B. Löchel;S. Ullerich

Frequent Co-Authors

Wilfried Mokwa
Wilfried Mokwa RWTH Aachen University
Peter Walter
Peter Walter University of California, San Francisco
Jochen Büchs
Jochen Büchs RWTH Aachen University
Alexander Böker
Alexander Böker Fraunhofer Society
Rolf W. Günther
Rolf W. Günther Charité - University Medicine Berlin
Sven Ingebrandt
Sven Ingebrandt RWTH Aachen University
Bernhard Blümich
Bernhard Blümich RWTH Aachen University
Ulla Wollenberger
Ulla Wollenberger University of Potsdam
Andreas Offenhäusser
Andreas Offenhäusser Forschungszentrum Jülich
Rainer Waser
Rainer Waser RWTH Aachen University

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