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Saiful I. Khondaker publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Saiful I. Khondaker sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

The last bar groups every scientist with 1,163 publications or more.

Saiful I. Khondaker D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Saiful I. Khondaker sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

The last bar groups every scientist with 165 D-Index or more.

Overview

Saiful I. Khondaker is affiliated with the University of Central Florida in the United States. Their research primarily focuses on materials science and physics, with significant contributions in the subfields of materials chemistry, atomic and molecular physics and optics, electronic, optical and magnetic materials, condensed matter physics, and electrical and electronic engineering.

The scientist's main areas of study cover various advanced topics, including:

  • 2D Materials and Applications
  • MXene and MAX Phase Materials
  • Topological Materials and Phenomena
  • Graphene research and applications
  • Advanced Condensed Matter Physics
  • Advanced Sensor and Energy Harvesting Materials
  • Quantum Dots Synthesis And Properties

Saiful I. Khondaker has published their research in several prominent venues. Frequent publication outlets include:

  • arXiv (Cornell University)
  • Scientific Reports
  • Journal of Electronic Materials
  • 2D Materials
  • Physical review. B./Physical review. B

Recent papers published by Saiful I. Khondaker demonstrate engagement in various contemporary topics in materials science and nanotechnology. Some of these include:

  • "Scalable lateral heterojunction by chemical doping of 2D TMD thin films," 2020, Scientific Reports
  • "Low pressure sulfurization and characterization of multilayer MoS2 for potential applications in supercapacitors," 2020, Energy
  • "Enhanced electrochemical performance of solution-processed single-wall carbon nanotube reinforced polyvinyl alcohol nanocomposite synthesized via solution-cast method," 2020, Nano Express
  • "Optoelectronic Properties of MoS2/Graphene Heterostructures Prepared by Dry Transfer for Light-Induced Energy Applications," 2022, Journal of Electronic Materials
  • "Rapid Degradation of the Electrical Properties of 2D MoS2 Thin Films under Long-Term Ambient Exposure," 2021, ACS Omega

Their collaboration network includes several frequent co-authors such as Jiun-Haw Chu, K. J. Harrison, Bhim Chamlagain, Madhab Neupane, and Ammon Johnston. This suggests involvement in multidisciplinary and cooperative research projects within the field of nanomaterials and condensed matter physics.

Best Publications

  • Graphene based materials: Past, present and future

    Virendra Singh;Daeha Joung;Lei Zhai;Soumen Das

  • Ultralight multiwalled carbon nanotube aerogel.

    Jianhua Zou;Jianhua Liu;Ajay Singh Karakoti;Amit Kumar

  • Crystallization and electrical resistivity of Cu2O and CuO obtained by thermal oxidation of Cu thin films on SiO2/Si substrates

    L. De Los Santos Valladares;L. De Los Santos Valladares;L. De Los Santos Valladares;D. Hurtado Salinas;D. Hurtado Salinas;A. Bustamante Dominguez;D. Acosta Najarro

  • Dispersion of Pristine Carbon Nanotubes Using Conjugated Block Copolymers

    Jianhua Zou;Liwei Liu;Hui Chen;Saiful I. Khondaker

  • Photoluminescence Quenching in Single-Layer MoS$_{2}$ via Oxygen Plasma Treatment

    Narae Kang;Hari P. Paudel;Michael N. Leuenberger;Laurene Tetard

  • Photoluminescence quenching in gold - MoS2 hybrid nanoflakes

    Udai Bhanu;Muhammad R. Islam;Laurene Tetard;Saiful I. Khondaker

  • Controlling Poly(3-hexylthiophene) Crystal Dimension: Nanowhiskers and Nanoribbons

    Jianhua Liu;Mohammad Arif;Jianhua Zou;Saiful I. Khondaker

  • Tuning the electrical property via defect engineering of single layer MoS2 by oxygen plasma

    Muhammad R. Islam;Narae Kang;Udai Bhanu;Hari P. Paudel

  • Ultrahigh density alignment of carbon nanotube arrays by dielectrophoresis.

    Shashank Shekhar;Paul Stokes;Saiful I. Khondaker

  • Efros-Shklovskii variable-range hopping in reduced graphene oxide sheets of varying carbonsp2fraction

    Daeha Joung;Saiful I. Khondaker

  • Oxygenated Functional Group Density on Graphene Oxide: Its Effect on Cell Toxicity

    Soumen Das;Sanjay Singh;Sanjay Singh;Virendra Singh;Daeha Joung

  • Position dependent photodetector from large area reduced graphene oxide thin films

    Surajit Ghosh;Biddut K. Sarker;Anindarupa Chunder;Lei Zhai

  • Electrical property tuning via defect engineering of single layer MoS2 by oxygen plasma

    Muhammad R. Islam;Narae Kang;Udai Bhanu;Hari P. Paudel

  • Space charge limited conduction with exponential trap distribution in reduced graphene oxide sheets

    Daeha Joung;A. Chunder;Lei Zhai;Saiful I. Khondaker

  • Reduced Graphene Oxide/Copper Phthalocyanine Composite and Its Optoelectrical Properties

    Anindarupa Chunder;Tanusri Pal;Saiful I. Khondaker;Lei Zhai

  • High yield fabrication of chemically reduced graphene oxide field effect transistors by dielectrophoresis

    Daeha Joung;A Chunder;Lei Zhai;Saiful I Khondaker

  • Centimeter Scale Patterned Growth of Vertically Stacked Few Layer Only 2D MoS2/WS2 van der Waals Heterostructure

    Nitin Choudhary;Juhong Park;Jun Yeon Hwang;Hee-Suk Chung

  • Anchoring ceria nanoparticles on reduced graphene oxide and their electronic transport properties

    Daeha Joung;Virendra Singh;Sanghoon Park;Alfons Schulte

  • Fabrication of nanometer-spaced electrodes using gold nanoparticles

    Saiful I. Khondaker;Zhen Yao

  • Ultra-high density alignment of carbon nanotubes array by dielectrophoresis

    Shashank Shekhar;Paul Stokes;Saiful I. Khondaker

Frequent Co-Authors

Lei Zhai
Lei Zhai University of Central Florida
Qun Huo
Qun Huo University of Central Florida
Yeonwoong Jung
Yeonwoong Jung University of Central Florida
Michael Pepper
Michael Pepper University College London
Ananth Dodabalapur
Ananth Dodabalapur The University of Texas at Austin
Sudipta Seal
Sudipta Seal University of Central Florida
James M. Tour
James M. Tour Rice University
James E. Hutchison
James E. Hutchison University of Oregon
Catherine J. Murphy
Catherine J. Murphy University of Illinois at Urbana-Champaign
Richard D. McCullough
Richard D. McCullough Harvard University

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