Michal Kruk is affiliated with the City University of New York in the United States. Their research spans multiple areas within engineering, with a particular focus on industrial and manufacturing engineering as well as mechanical engineering. Their work also touches on electrical and electronic engineering, plant science, and ecology.
The scientist's research topics include:
Michal Kruk has contributed to several publication venues, with a majority of their work found in:
Notable recent papers authored or co-authored by Michal Kruk include:
Frequent co-authors collaborating with Michal Kruk include:
The research contributions of Michal Kruk focus heavily on applying machine learning techniques and industrial vision systems to improve manufacturing processes, particularly in machining and chipboard processing. They also engage in plant-related research, applying remote sensing and machine learning to agricultural challenges such as potato yield prediction and plant pathogen resistance.
Shinae Jun;Sang Hoon Joo;Ryong Ryoo;Michal Kruk
Ryong Ryoo;Sang Hoon Joo;Michal Kruk;Mietek Jaroniec
Michal Kruk;Mietek Jaroniec;Yasuhiro Sakamoto;Osamu Terasaki
† Tae-Wan Kim;Ryong Ryoo;Michal Kruk;Kamil P. Gierszal
Jivaldo R. Matos;Michal Kruk;Lucildes P. Mercuri;Mietek Jaroniec
Liang Cao;Tiffany Man;Michal Kruk
Tewodros Asefa;Michal Kruk;Mark J. MacLachlan;Neil Coombs
Michal Kruk;Bruno Dufour;Ewa B Celer;Tomasz Kowalewski
Sang Hoon Joo;Ryong Ryoo;Michal Kruk;Mietek Jaroniec
Chuanbing Tang;Adam Tracz;Michal Kruk;Rui Zhang
Abdelhamid Sayari;Michal Kruk;Mietek Jaroniec;Igor L. Moudrakovski
Michal Kruk;Mietek Jaroniec;Sang Hoon Joo;Ryong Ryoo
Masakatsu Kuroki;Masakatsu Kuroki;Tewodros Asefa;Wesley Whitnal;Michal Kruk
Michal Kruk;Bruno Dufour;Ewa B. Celer;Tomasz Kowalewski
Jivaldo R. Matos;Jivaldo R. Matos;Michal Kruk;Lucildes P. Mercuri;Lucildes P. Mercuri;Mietek Jaroniec
Michal Kruk;Tewodros Asefa;Mietek Jaroniec;Geoffrey A. Ozin
Michal Kruk;Mietek Jaroniec;Ryong Ryoo;Sang Hoon Joo
Michal Kruk;Mietek Jaroniec;Ryong Ryoo;Ji Man Kim
Ryong Ryoo;In-Soo Park;Shinae Jun;Chul Wee Lee
Michal Kruk;Kevin M. Kohlhaas;Bruno Dufour;Ewa B. Celer
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Applied Materials (United States)
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