The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Michael Scalora sits on this spectrum.
This scientist: 491 publications — 94th percentile
94% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Michael Scalora sits on this spectrum.
This scientist: 59 D-Index — 77th percentile
77% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Michael Scalora is affiliated with the United States Department of the Army in the United States. Their research spans multiple fields primarily within engineering and physics, with a strong focus on materials science. The main areas of study include atomic and molecular physics, optics, biomedical engineering, electronic, optical and magnetic materials, electrical and electronic engineering, and materials chemistry.
The scientist's work concentrates on topics involving plasmonic and surface plasmon research, photonic and optical devices, advanced fiber laser technologies, metamaterials and metasurfaces applications, nonlinear optical materials studies, spectroscopy and quantum chemical studies, as well as the synthesis and applications of gold and silver nanoparticles.
Michael Scalora has published extensively in venues such as arXiv (Cornell University), Optics Express, APL Photonics, EPJ Web of Conferences, and Nature Communications. Some of their recent papers include:
Their collaborations include frequent co-authors such as M. A. Vincenti, Domenico de Ceglia, J. Trull, C. Cojocaru, and L. Rodríguez-Suné.
Jonathan P. Dowling;Michael Scalora;Mark J. Bloemer;Charles M. Bowden
Michael Scalora;Jonathan P. Dowling;Charles M. Bowden;Mark J. Bloemer
J.M. Bendickson;M. Scalora;J.P. Dowling
M. Scalora;M. J. Bloemer;A. S. Pethel;J. P. Dowling
M. Scalora;M. J. Bloemer;A. S. Manka;J. P. Dowling
M Centini;C Sibilia;M Scalora;G D'Aguanno
Michael Scalora;Jonathan P. Dowling;Charles M. Bowden;Mark J. Bloemer
Michael D. Tocci;Mark J. Bloemer;Michael Scalora;Jonathan P. Dowling
N. Aközbek;A. Iwasaki;A. Becker;M. Scalora
N. Aközbek;M. Scalora;C.M. Bowden;S.L. Chin
M. Scalora;R. J. Flynn;S. B. Reinhardt;R. L. Fork
Michael Scalora;Maxim S. Syrchin;Neset Akozbek;Evgeni Y. Poliakov
Mark J. Bloemer;Michael Scalora
M. Scalora;M. A. Vincenti;D. de Ceglia;V. Roppo
Y. Dumeige;P. Vidakovic;S. Sauvage;I. Sagnes
Cristian Ciraci;Ekaterina Poutrina;Michael Scalora;David R Smith
Michael D. Tocci;Michael Scalora;Mark J. Bloemer;Jonathan P. Dowling
Michael Scalora;Giuseppe D’Aguanno;Nadia Mattiucci;Mark J. Bloemer
Stanislav O. Konorov;Aleksei M. Zheltikov;Michael Scalora
Ting S. Luk;Domenico de Ceglia;Sheng Liu;Gordon A. Keeler
Michael Scalora;Mark J. Bloemer;Michael D. Tocci
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