World's Best Scientists 2026 revealed!
Michael Rohlfing

Michael Rohlfing

D-Index & Metrics

Chemistry

D-Index
54
Citations
11524
World Ranking
12532
National Ranking
921

Michael Rohlfing publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Michael Rohlfing sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 171 publications — 22nd percentile

22% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Michael Rohlfing D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Michael Rohlfing sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 54 D-Index — 31st percentile

31% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Michael Rohlfing is affiliated with the University of Münster in Germany. Their research primarily focuses on materials science and physics, with a significant body of work in materials chemistry and atomic and molecular physics and optics. They also have publications connected to electrical and electronic engineering, biomedical engineering, and organic chemistry.

Their research topics encompass:

  • 2D Materials and Applications
  • Graphene research and applications
  • Perovskite Materials and Applications
  • MXene and MAX Phase Materials
  • Quantum and electron transport phenomena
  • Advanced Chemical Physics Studies
  • Molecular Junctions and Nanostructures

Rohlfing has contributed to multiple publication venues, with a notable presence in:

  • Physical review. B./Physical review. B
  • arXiv (Cornell University)
  • ACS Nano
  • Journal of Chemical Theory and Computation
  • Nano Letters

Frequent co-authors include Thorsten Deilmann, Ursula Wurstbauer, Marie-Christin Heißenbüttel, Rudolf Bratschitsch, and Philipp Marauhn.

Some recent research publications are:

  • The Bulk van der Waals Layered Magnet CrSBr is a Quasi-1D Material, 2023, ACS Nano
  • Ab Initio Studies of Exciton g Factors: Monolayer Transition Metal Dichalcogenides in Magnetic Fields, 2020, Physical Review Letters
  • Dark trions govern the temperature-dependent optical absorption and emission of doped atomically thin semiconductors, 2020, Physical review. B./Physical review. B
  • Kekulene: On-Surface Synthesis, Orbital Structure, and Aromatic Stabilization, 2020, ACS Nano
  • Electronic and optical properties of a hexagonal boron nitride monolayer in its pristine form and with point defects from first principles, 2022, Physical review. B./Physical review. B

Best Publications

  • Electron-hole excitations and optical spectra from first principles

    Michael Rohlfing;Steven G. Louie;Steven G. Louie

  • Electron-Hole Excitations in Semiconductors and Insulators

    Michael Rohlfing;Michael Rohlfing;Steven G. Louie;Steven G. Louie

  • Excitonic Effects and the Optical Absorption Spectrum of Hydrogenated Si Clusters

    Michael Rohlfing;Michael Rohlfing;Steven G. Louie;Steven G. Louie

  • Quasiparticle band-structure calculations for C, Si, Ge, GaAs, and SiC using Gaussian-orbital basis sets.

    Michael Rohlfing;Peter Krüger;Johannes Pollmann

  • Molecular Distortions and Chemical Bonding of a Large π-Conjugated Molecule on a Metal Surface

    A. Hauschild;Khadga Jung Karki;B.C.C. Cowie;M. Rohlfing

  • Efficient scheme for GW quasiparticle band-structure calculations with applications to bulk Si and to the Si(001)-(2×1) surface

    Michael Rohlfing;Peter Krüger;Johannes Pollmann

  • Biaxial strain tuning of the optical properties of single-layer transition metal dichalcogenides

    Riccardo Frisenda;Matthias Drüppel;Robert Schmidt;Steffen Michaelis de Vasconcellos

  • Strain control of exciton-phonon coupling in atomically thin semiconductors

    Iris Niehues;Robert Schmidt;Matthias Drüppel;Philipp Marauhn

  • Excitons and Optical Spectrum of the Si ( 111 ) − ( 2 × 1 ) Surface

    Michael Rohlfing;Steven G. Louie

  • Diversity of trion states and substrate effects in the optical properties of an MoS2 monolayer.

    Matthias Drüppel;Thorsten Deilmann;Peter Krüger;Michael Rohlfing

  • Imaging Pauli repulsion in scanning tunneling microscopy.

    C. Weiss;C. Wagner;C. Kleimann;M. Rohlfing

  • Adsorption structure and scanning tunneling data of a prototype organic-inorganic interface : PTCDA on Ag(111)

    Michael Rohlfing;Ruslan Temirov;Frank Stefan Tautz

  • Lateral adsorption geometry and site-specific electronic structure of a large organic chemisorbate on a metal surface

    A. Kraft;R. Temirov;S. K. M. Henze;S. Soubatch

  • Reversible uniaxial strain tuning in atomically thin WSe 2

    Robert Schmidt;Iris Niehues;Robert Schneider;Matthias Drüppel

  • Highly Anisotropic in-Plane Excitons in Atomically Thin and Bulklike 1T′-ReSe2

    Ashish Arora;Jonathan Noky;Matthias Drüppel;Bhakti Jariwala

  • Dynamics of Exciton Formation at the Si(100) c(4×2) Surface

    Martin Weinelt;Michael Kutschera;Thomas Fauster;Michael Rohlfing

  • Binding energy of adsorbates on a noble-metal surface: Exchange and correlation effects

    Michael Rohlfing;Thomas Bredow

  • Binding energy of adsorbates on a noble-metal surface: exchange and correlation effects.

    Michael Rohlfing;Thomas Bredow

  • Quasiparticle band structure of CdS.

    Michael Rohlfing;Peter Krüger;Johannes Pollmann

  • Role of semicore d electrons in quasiparticle band-structure calculations

    Michael Rohlfing;Peter Krüger;Johannes Pollmann

  • Interlayer excitons in a bulk van der Waals semiconductor.

    Ashish Arora;Matthias Drüppel;Robert Schmidt;Thorsten Deilmann;Thorsten Deilmann

  • Excited states of biological chromophores studied using many-body perturbation theory: Effects of resonant-antiresonant coupling and dynamical screening

    Yuchen Ma;Michael Rohlfing;Carla Molteni

  • Excitonic effects and optical absorption spectrum of hydrogenated Si clusters

    Michael Rohlfing;Steven G. Louie

Frequent Co-Authors

Steven G. Louie
Steven G. Louie University of California, Berkeley
Rudolf Bratschitsch
Rudolf Bratschitsch University of Münster
Andres Castellanos-Gomez
Andres Castellanos-Gomez Spanish National Research Council
Alexandre Tkatchenko
Alexandre Tkatchenko University of Luxembourg
Marvin L. Cohen
Marvin L. Cohen University of California, Berkeley
Moritz Sokolowski
Moritz Sokolowski University of Bonn
Denis Andrienko
Denis Andrienko Max Planck Society
Chen Li
Chen Li Dongguan University of Technology
Paul Kögerler
Paul Kögerler RWTH Aachen University

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