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D-Index & Metrics

Materials Science

D-Index
49
Citations
9132
World Ranking
10516
National Ranking
125

Jow-Lay Huang publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jow-Lay Huang sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 363 publications — 72nd percentile

72% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jow-Lay Huang D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jow-Lay Huang sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 49 D-Index — 19th percentile

19% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Jow-Lay Huang is a researcher affiliated with National Cheng Kung University in Taiwan. Their research primarily spans the fields of Engineering and Materials Science, with a focus on several specialized subfields including Electrical and Electronic Engineering, Materials Chemistry, Renewable Energy, Sustainability and the Environment, Biomedical Engineering, and Polymers and Plastics.

The main topics of their scientific work incorporate:

  • ZnO doping and properties
  • Gas Sensing Nanomaterials and Sensors
  • Electrocatalysts for Energy Conversion
  • Advancements in Battery Materials
  • Acoustic Wave Resonator Technologies
  • Transition Metal Oxide Nanomaterials
  • Advanced Battery Materials and Technologies

Huang has published numerous papers in a variety of scientific venues. Some of the recent publications include:

  • "Cd doped ZnO nanorods for efficient room temperature NH3 sensing", 2022, Materials Chemistry and Physics
  • "Enhanced piezoelectric coefficient and the piezoelectric nanogenerator output performance in Y-doped ZnO thin films", 2022, Materials Science in Semiconductor Processing
  • "Molybdenum carbide (Mo2C) and reduced graphene oxide (rGO) nano-composites as an efficient electrocatalyst for water splitting", 2022, Materials Letters
  • "Synergistic effects of Ga doping and Mg alloying over the enhancement of the stress sensitivity of a Ga-doped MgZnO pressure sensor", 2021, Nanoscale Advances
  • "Effects of a polystyrene intermediate layer for improved electrochromic properties of nano porous WO3electrochromic films", 2022, Materials Advances

Huang frequently collaborates with a range of co-authors in their research projects. The most frequent co-authors include:

  • Sanjaya Brahma
  • Sheng-Chang Wang
  • Chuan-Pu Liu
  • D.R. Sahu
  • Yi-Xiu Chen

Their work has been published in venues such as Materials Letters, SSRN Electronic Journal, Materials Chemistry and Physics, Materials Science in Semiconductor Processing, and Nanoscale Advances, among others.

Best Publications

  • ZnO/Ag/ZnO multilayer films for the application of a very low resistance transparent electrode

    Diptiranjan Sahu;Shin-Yuan Lin;Jow-Lay Huang

  • Effect of thickness on the structural and optical properties of ZnO films by r.f. magnetron sputtering

    Su-Shia Lin;Jow-Lay Huang

  • ZnO nanopencils: Efficient field emitters

    R. C. Wang;C. P. Liu;Jow-Lay Huang;S. J. Chen

  • Strengthening of Oxide Ceramics by Transformation‐Induced Stress

    Anil V. Virkar;Jow Lay Huang;Raymond A. Cutler

  • High quality transparent conductive ZnO/Ag/ZnO multilayer films deposited at room temperature

    Diptiranjan Sahu;Jow-Lay Huang

  • Investigation of conductive and transparent Al-doped ZnO/Ag/Al-doped ZnO multilayer coatings by electron beam evaporation

    D. R. Sahu;Shin Yuan Lin;Jow-Lay Huang

  • The properties of Ti-doped ZnO films deposited by simultaneous RF and DC magnetron sputtering

    Su-Shia Lin;Jow-Lay Huang;Pavol Sajgalik

  • Effects of substrate temperature on the properties of heavily Al-doped ZnO films by simultaneous r.f. and d.c. magnetron sputtering

    Su-Shia Lin;Jow-Lay Huang;Pavol Sajgalik

  • Effect of holmium substitution for the improvement of multiferroic properties of BiFeO3

    S.K. Pradhan;J. Das;P.P. Rout;V.R. Mohanta

  • The properties of heavily Al-doped ZnO films before and after annealing in the different atmosphere

    Su-Shia Lin;Jow-Lay Huang;P Šajgalik

  • Single-crystalline AlZnO nanowires/nanotubes synthesized at low temperature

    Ruey-Chi Wang;Chuan-Pu Liu;Jow-Lay Huang;Shu-Jen Chen

  • Graphene coated Ni films: A protective coating

    Pramoda K. Nayak;Chan Jung Hsu;Sheng Chang Wang;James C. Sung

  • The effects of r.f. power and substrate temperature on the properties of ZnO films

    Su-Shia Lin;Jow-Lay Huang;Ding-Fwu Lii

  • Effect Of Y2O3 and Yb2O3 on the microstructure and mechanical properties of silicon nitride

    Horng-Hwa Lu;Jow-Lay Huang

  • Effect of substrate temperature on the properties of Ti-doped ZnO films by simultaneous rf and dc magnetron sputtering

    Su Shia Lin;Jow Lay Huang;Ding Fwu Lii

  • Genetic variants in brain-derived neurotrophic factor associated with Alzheimer’s disease

    R. Huang;J. Huang;H. Cathcart;Suzanne H Smith

  • Effect of the electrical discharge machining on strength and reliability of TiN/Si3N4 composites

    Chien-Cheng Liu;Jow-Lay Huang

  • Improved properties of Al-doped ZnO film by electron beam evaporation technique

    D. R. Sahu;Shin-Yuan Lin;Jow-Lay Huang

  • The properties of ZnO/Cu/ZnO multilayer films before and after annealing in the different atmosphere

    Dipti Ranjan Sahu;Jow-Lay Huang

  • Deposition of Ag-based Al-doped ZnO multilayer coatings for the transparent conductive electrodes by electron beam evaporation

    Diptiranjan Sahu;Shin-Yuan Lin;Jow-Lay Huang

Frequent Co-Authors

Chuan-Pu Liu
Chuan-Pu Liu National Cheng Kung University
Anil V. Virkar
Anil V. Virkar University of Utah
Kuei-Hsien Chen
Kuei-Hsien Chen Academia Sinica
Hong Ping Lin
Hong Ping Lin National Cheng Kung University
Jozef Keckes
Jozef Keckes University of Leoben
Takashi Goto
Takashi Goto Tohoku University
Panchanan Pramanik
Panchanan Pramanik Indian Institute of Technology Kharagpur
Ferdinand Hofer
Ferdinand Hofer Graz University of Technology
David J. Sellmyer
David J. Sellmyer University of Nebraska–Lincoln
Hyung-Ho Park
Hyung-Ho Park Yonsei University

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