World's Best Scientists 2026 revealed!

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Engineering and Technology

D-Index
46
Citations
9483
World Ranking
5101
National Ranking
59

Research.com Recognitions

  • 2005 - Fellow of American Physical Society (APS) Citation For his contributions to the theory and methods of electronic structure calculations, especially for developing precise methods for computing crystalline magnetic anisotropy

Overview

Henri Jansen is affiliated with the Technical University of Denmark. Their research is primarily situated within the broad field of Engineering, with significant contributions across various subfields including Electrical and Electronic Engineering, Biomedical Engineering, Atomic and Molecular Physics and Optics, Aerospace Engineering, and Materials Chemistry.

The scientist's body of work covers multiple topics, reflecting a diverse research portfolio. These include:

  • Semiconductor materials and devices
  • Photonic and Optical Devices
  • Photonic Crystals and Applications
  • Nanowire Synthesis and Applications
  • Plasma Diagnostics and Applications
  • Mechanical and Optical Resonators
  • Advanced Surface Polishing Techniques

Among the recent publications authored or coauthored by Jansen are the following papers:

  • "Nanometer-scale photon confinement in topology-optimized dielectric cavities" (2022), published in Nature Communications
  • "The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature" (2020), published in ECS Journal of Solid State Science and Technology
  • "On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand" (2020), published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask" (2020), published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Deep reactive ion etching of 'grass-free' widely-spaced periodic 2D arrays, using sacrificial structures" (2020), published in Microelectronic Engineering

Jansen has frequently collaborated with several researchers, notably Vy Thi Hoang Nguyen, Jörg Hübner, Flemming Jensen, Pele Leussink, and Marcus Albrechtsen. These co-authors have contributed extensively alongside Jansen on various projects and publications.

The scientist regularly publishes in specialized venues connected to their fields of study, with recurrent contributions to:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Nature Communications
  • ECS Journal of Solid State Science and Technology
  • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
  • Microelectronic Engineering

In 2005, Henri Jansen was recognized as a Fellow of the American Physical Society (APS) for contributions to the theory and methods of electronic structure calculations, specifically for developing precise methods for computing crystalline magnetic anisotropy.

Best Publications

  • Stiction in surface micromachining

    Niels Tas;Tonny Sonnenberg;Henri Jansen;Rob Legtenberg

  • The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control

    Henri Jansen;de Meint Boer;Rob Legtenberg;Miko Elwenspoek

  • A survey on the reactive ion etching of silicon in microtechnology

    Henri Jansen;Han Gardeniers;Meint de Boer;Miko Elwenspoek

  • Capillary filling speed of water in nanochannels

    N.R. Tas;J. Haneveld;H.V. Jansen;M.C. Elwenspoek

  • Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures

    M.J. de Boer;J.G.E. Gardeniers;H.V. Jansen;E. Smulders

  • Silicon nitride nanosieve membrane

    Hien D. Tong;Henri V. Jansen;Vishwas J. Gadgil;Cazimir G. Bostan

  • The μ-flown: A novel device for measuring acoustic flows

    Hans-Elias de Bree;Peter Leussink;Twan Korthorst;Henri Jansen

  • Micromachining of buried micro channels in silicon

    M.J. de Boer;R.W. Tjerkstra;J.W. Berenschot;H.V. Jansen

  • Anisotropic Reactive Ion Etching of Silicon Using SF 6 / O 2 / CHF 3 Gas Mixtures

    R. Legtenberg;Henricus V. Jansen;Meint J. de Boer;Michael Curt Elwenspoek

  • Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

    H V Jansen;M J de Boer;S Unnikrishnan;M C Louwerse

  • System for fabrication of integrated tunable/switchable passive microwave and millimeter wave modules

    Hendrikus Tilmans;Eric Beyne;Henri Jansen;Walter De Raedt

  • RIE lag in high aspect ratio trench etching of silicon

    Henri Jansen;Meint de Boer;Remco Wiegerink;Niels Tas

  • Capillary filling of sub- 10 nm nanochannels

    J. Haneveld;Niels Roelof Tas;N. Brunets;Henricus V. Jansen

  • The black silicon method II: The effect of mask material and loading on the reactive ion etching of deep silicon trenches

    Henri Jansen;Meint de Boer;Johannes Burger;Rob Legtenberg

  • Characterization of a planar microcoil for implantable microsystems

    C.R. Neagu;H.V. Jansen;A. Smith;J.G.E. Gardeniers

  • Ta2O5 as gate dielectric material for low-voltage organic thin-film transistors

    Unknown

  • High resolution powder blast micromachining

    H. Wensink;J.W. Berenschot;H.V. Jansen;M.C. Elwenspoek

  • A capacitive RF power sensor based on MEMS technology

    L.J. Fernández;R.J. Wiegerink;Jaap Flokstra;J. Sesé

  • Nanometer-scale photon confinement in topology-optimized dielectric cavities

    Unknown

  • Scanning electron microscopic, transmission electron microscopic, and confocal laser scanning microscopic observation of fibroblasts cultured on microgrooved surfaces of bulk titanium substrata

    E.T. den Braber;H.V. Jansen;M.J. de Boer;H.J.E. Croes

  • Wet anisotropic etching for fluidic 1D nanochannels

    Jeroen Haneveld;Henri Jansen;Erwin Berenschot;Niels Tas

  • 2D-Confined Nanochannels Fabricated by Conventional Micromachining

    N.R. Tas;T.S.J. Lammerink;P. Mela;H.V. Jansen

Frequent Co-Authors

Michael Curt Elwenspoek
Michael Curt Elwenspoek University of Twente
Johannes G.E. Gardeniers
Johannes G.E. Gardeniers University of Twente
Jurriaan Huskens
Jurriaan Huskens University of Twente
Jakob Birkedal Wagner
Jakob Birkedal Wagner Technical University of Denmark
Ole Hansen
Ole Hansen Technical University of Denmark
Albert van den Berg
Albert van den Berg University of Twente
Jürgen Brugger
Jürgen Brugger École Polytechnique Fédérale de Lausanne

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