2005 - Fellow of American Physical Society (APS) Citation For his contributions to the theory and methods of electronic structure calculations, especially for developing precise methods for computing crystalline magnetic anisotropy
His scientific interests lie mostly in Optoelectronics, Etching, Silicon, Reactive-ion etching and Nanotechnology. Dry etching and Scanning electron microscope is closely connected to Plasma etching in his research, which is encompassed under the umbrella topic of Optoelectronics. His Etching research is multidisciplinary, incorporating elements of Wafer, Coating and Passivation.
As part of one scientific family, Henri Jansen deals mainly with the area of Silicon, narrowing it down to issues related to the Etching, and often Ceramic, Jet, Metallurgy and Machining. His studies in Reactive-ion etching integrate themes in fields like Black silicon and Trench. Henri Jansen regularly links together related areas like Surface micromachining in his Nanotechnology studies.
Henri Jansen mostly deals with Optoelectronics, Nanotechnology, Silicon, Wafer and Microelectromechanical systems. His Optoelectronics study combines topics in areas such as Layer, Thin film, Surface micromachining and Plasma etching. Henri Jansen interconnects Nanolithography and Lithography in the investigation of issues within Nanotechnology.
Henri Jansen combines subjects such as Trench, Deep reactive-ion etching, Reactive-ion etching and Composite material with his study of Silicon. The study incorporates disciplines such as Dry etching and Isotropic etching in addition to Reactive-ion etching. His Microelectromechanical systems research is multidisciplinary, incorporating perspectives in Mechanical engineering, Capacitive sensing, Electrical engineering, Bulk micromachining and Electronic engineering.
His primary areas of investigation include Optoelectronics, Silicon, Plasma etching, Nanotechnology and Scientific method. His work carried out in the field of Optoelectronics brings together such families of science as Characterization, Deep reactive-ion etching, Thin metal and Transmission. His work deals with themes such as Photonics, Photocurrent and Nanophotonics, which intersect with Silicon.
His Plasma etching study is concerned with Etching in general. His Nanotechnology research incorporates elements of Adhesion and Structural coloration. His Nanolithography research incorporates themes from Deposition and Reactive-ion etching.
Henri Jansen mainly investigates Silicon, Optoelectronics, Plasma etching, Nanotechnology and Deep reactive-ion etching. His study in the fields of Nanowire and Photocurrent under the domain of Optoelectronics overlaps with other disciplines such as Photodegradation. His Plasma etching study integrates concerns from other disciplines, such as Reactive-ion etching, Photonic crystal and Anisotropy.
His study in Nanotechnology is interdisciplinary in nature, drawing from both Scientific method and Structural coloration. His Deep reactive-ion etching research integrates issues from Surface finish, Deposition, Optical profilometry and Aspect ratio.
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Stiction in surface micromachining
Niels Tas;Tonny Sonnenberg;Henri Jansen;Rob Legtenberg.
Journal of Micromechanics and Microengineering (1996)
The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control
Henri Jansen;de Meint Boer;Rob Legtenberg;Miko Elwenspoek.
Journal of Micromechanics and Microengineering (1995)
A survey on the reactive ion etching of silicon in microtechnology
Henri Jansen;Han Gardeniers;Meint de Boer;Miko Elwenspoek.
Journal of Micromechanics and Microengineering (1996)
Capillary filling speed of water in nanochannels
N.R. Tas;J. Haneveld;H.V. Jansen;M.C. Elwenspoek.
Applied Physics Letters (2004)
Silicon nitride nanosieve membrane
Hien D. Tong;Henri V. Jansen;Vishwas J. Gadgil;Cazimir G. Bostan.
Nano Letters (2004)
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
M.J. de Boer;J.G.E. Gardeniers;H.V. Jansen;E. Smulders.
IEEE/ASME Journal of Microelectromechanical Systems (2002)
The μ-flown: A novel device for measuring acoustic flows
Hans-Elias de Bree;Peter Leussink;Twan Korthorst;Henri Jansen.
Sensors and Actuators A-physical (1996)
Micromachining of buried micro channels in silicon
M.J. de Boer;R.W. Tjerkstra;J.W. Berenschot;H.V. Jansen.
IEEE/ASME Journal of Microelectromechanical Systems (2000)
System for fabrication of integrated tunable/switchable passive microwave and millimeter wave modules
Hendrikus Tilmans;Eric Beyne;Henri Jansen;Walter De Raedt.
Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment
H V Jansen;M J de Boer;S Unnikrishnan;M C Louwerse.
Journal of Micromechanics and Microengineering (2009)
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