World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
46
Citations
9483
World Ranking
5103
National Ranking
59

Henri Jansen publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Henri Jansen sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 162 publications — 32nd percentile

32% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Henri Jansen D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Henri Jansen sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 46 D-Index — 49th percentile

49% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Research.com Recognitions

  • 2005 - Fellow of American Physical Society (APS) Citation For his contributions to the theory and methods of electronic structure calculations, especially for developing precise methods for computing crystalline magnetic anisotropy

Overview

Henri Jansen is affiliated with the Technical University of Denmark. Their research is primarily situated within the broad field of Engineering, with significant contributions across various subfields including Electrical and Electronic Engineering, Biomedical Engineering, Atomic and Molecular Physics and Optics, Aerospace Engineering, and Materials Chemistry.

The scientist's body of work covers multiple topics, reflecting a diverse research portfolio. These include:

  • Semiconductor materials and devices
  • Photonic and Optical Devices
  • Photonic Crystals and Applications
  • Nanowire Synthesis and Applications
  • Plasma Diagnostics and Applications
  • Mechanical and Optical Resonators
  • Advanced Surface Polishing Techniques

Among the recent publications authored or coauthored by Jansen are the following papers:

  • "Nanometer-scale photon confinement in topology-optimized dielectric cavities" (2022), published in Nature Communications
  • "The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature" (2020), published in ECS Journal of Solid State Science and Technology
  • "On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand" (2020), published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask" (2020), published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Deep reactive ion etching of 'grass-free' widely-spaced periodic 2D arrays, using sacrificial structures" (2020), published in Microelectronic Engineering

Jansen has frequently collaborated with several researchers, notably Vy Thi Hoang Nguyen, Jörg Hübner, Flemming Jensen, Pele Leussink, and Marcus Albrechtsen. These co-authors have contributed extensively alongside Jansen on various projects and publications.

The scientist regularly publishes in specialized venues connected to their fields of study, with recurrent contributions to:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Nature Communications
  • ECS Journal of Solid State Science and Technology
  • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
  • Microelectronic Engineering

In 2005, Henri Jansen was recognized as a Fellow of the American Physical Society (APS) for contributions to the theory and methods of electronic structure calculations, specifically for developing precise methods for computing crystalline magnetic anisotropy.

Best Publications

  • Stiction in surface micromachining

    Niels Tas;Tonny Sonnenberg;Henri Jansen;Rob Legtenberg

  • The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control

    Henri Jansen;de Meint Boer;Rob Legtenberg;Miko Elwenspoek

  • A survey on the reactive ion etching of silicon in microtechnology

    Henri Jansen;Han Gardeniers;Meint de Boer;Miko Elwenspoek

  • Capillary filling speed of water in nanochannels

    N.R. Tas;J. Haneveld;H.V. Jansen;M.C. Elwenspoek

  • Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures

    M.J. de Boer;J.G.E. Gardeniers;H.V. Jansen;E. Smulders

  • Silicon nitride nanosieve membrane

    Hien D. Tong;Henri V. Jansen;Vishwas J. Gadgil;Cazimir G. Bostan

  • The μ-flown: A novel device for measuring acoustic flows

    Hans-Elias de Bree;Peter Leussink;Twan Korthorst;Henri Jansen

  • Micromachining of buried micro channels in silicon

    M.J. de Boer;R.W. Tjerkstra;J.W. Berenschot;H.V. Jansen

  • Anisotropic Reactive Ion Etching of Silicon Using SF 6 / O 2 / CHF 3 Gas Mixtures

    R. Legtenberg;Henricus V. Jansen;Meint J. de Boer;Michael Curt Elwenspoek

  • Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

    H V Jansen;M J de Boer;S Unnikrishnan;M C Louwerse

  • System for fabrication of integrated tunable/switchable passive microwave and millimeter wave modules

    Hendrikus Tilmans;Eric Beyne;Henri Jansen;Walter De Raedt

  • RIE lag in high aspect ratio trench etching of silicon

    Henri Jansen;Meint de Boer;Remco Wiegerink;Niels Tas

  • Capillary filling of sub- 10 nm nanochannels

    J. Haneveld;Niels Roelof Tas;N. Brunets;Henricus V. Jansen

  • The black silicon method II: The effect of mask material and loading on the reactive ion etching of deep silicon trenches

    Henri Jansen;Meint de Boer;Johannes Burger;Rob Legtenberg

  • Characterization of a planar microcoil for implantable microsystems

    C.R. Neagu;H.V. Jansen;A. Smith;J.G.E. Gardeniers

  • Ta2O5 as gate dielectric material for low-voltage organic thin-film transistors

    Unknown

  • High resolution powder blast micromachining

    H. Wensink;J.W. Berenschot;H.V. Jansen;M.C. Elwenspoek

  • A capacitive RF power sensor based on MEMS technology

    L.J. Fernández;R.J. Wiegerink;Jaap Flokstra;J. Sesé

  • Nanometer-scale photon confinement in topology-optimized dielectric cavities

    Unknown

  • Scanning electron microscopic, transmission electron microscopic, and confocal laser scanning microscopic observation of fibroblasts cultured on microgrooved surfaces of bulk titanium substrata

    E.T. den Braber;H.V. Jansen;M.J. de Boer;H.J.E. Croes

  • Wet anisotropic etching for fluidic 1D nanochannels

    Jeroen Haneveld;Henri Jansen;Erwin Berenschot;Niels Tas

  • 2D-Confined Nanochannels Fabricated by Conventional Micromachining

    N.R. Tas;T.S.J. Lammerink;P. Mela;H.V. Jansen

Frequent Co-Authors

Michael Curt Elwenspoek
Michael Curt Elwenspoek University of Twente
Johannes G.E. Gardeniers
Johannes G.E. Gardeniers University of Twente
Jurriaan Huskens
Jurriaan Huskens University of Twente
Jakob Birkedal Wagner
Jakob Birkedal Wagner Technical University of Denmark
Ole Hansen
Ole Hansen Technical University of Denmark
Albert van den Berg
Albert van den Berg University of Twente
Jürgen Brugger
Jürgen Brugger École Polytechnique Fédérale de Lausanne

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