What is he best known for?
The fields of study he is best known for:
- Optics
- Electrical engineering
- Composite material
His scientific interests lie mostly in Optoelectronics, Etching, Silicon, Reactive-ion etching and Nanotechnology.
Dry etching and Scanning electron microscope is closely connected to Plasma etching in his research, which is encompassed under the umbrella topic of Optoelectronics.
His Etching research is multidisciplinary, incorporating elements of Wafer, Coating and Passivation.
As part of one scientific family, Henri Jansen deals mainly with the area of Silicon, narrowing it down to issues related to the Etching, and often Ceramic, Jet, Metallurgy and Machining.
His studies in Reactive-ion etching integrate themes in fields like Black silicon and Trench.
Henri Jansen regularly links together related areas like Surface micromachining in his Nanotechnology studies.
His most cited work include:
- The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control (495 citations)
- Stiction in surface micromachining (426 citations)
- A survey on the reactive ion etching of silicon in microtechnology (340 citations)
What are the main themes of his work throughout his whole career to date?
Henri Jansen mostly deals with Optoelectronics, Nanotechnology, Silicon, Wafer and Microelectromechanical systems.
His Optoelectronics study combines topics in areas such as Layer, Thin film, Surface micromachining and Plasma etching.
Henri Jansen interconnects Nanolithography and Lithography in the investigation of issues within Nanotechnology.
Henri Jansen combines subjects such as Trench, Deep reactive-ion etching, Reactive-ion etching and Composite material with his study of Silicon.
The study incorporates disciplines such as Dry etching and Isotropic etching in addition to Reactive-ion etching.
His Microelectromechanical systems research is multidisciplinary, incorporating perspectives in Mechanical engineering, Capacitive sensing, Electrical engineering, Bulk micromachining and Electronic engineering.
He most often published in these fields:
- Optoelectronics (35.53%)
- Nanotechnology (33.55%)
- Silicon (32.24%)
What were the highlights of his more recent work (between 2015-2021)?
- Optoelectronics (35.53%)
- Silicon (32.24%)
- Plasma etching (9.87%)
In recent papers he was focusing on the following fields of study:
His primary areas of investigation include Optoelectronics, Silicon, Plasma etching, Nanotechnology and Scientific method.
His work carried out in the field of Optoelectronics brings together such families of science as Characterization, Deep reactive-ion etching, Thin metal and Transmission.
His work deals with themes such as Photonics, Photocurrent and Nanophotonics, which intersect with Silicon.
His Plasma etching study is concerned with Etching in general.
His Nanotechnology research incorporates elements of Adhesion and Structural coloration.
His Nanolithography research incorporates themes from Deposition and Reactive-ion etching.
Between 2015 and 2021, his most popular works were:
- DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process (16 citations)
- Elevated temperature transmission Kikuchi diffraction in the SEM (10 citations)
- DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process (7 citations)
In his most recent research, the most cited papers focused on:
- Optics
- Electrical engineering
- Mechanical engineering
Henri Jansen mainly investigates Silicon, Optoelectronics, Plasma etching, Nanotechnology and Deep reactive-ion etching.
His study in the fields of Nanowire and Photocurrent under the domain of Optoelectronics overlaps with other disciplines such as Photodegradation.
His Plasma etching study integrates concerns from other disciplines, such as Reactive-ion etching, Photonic crystal and Anisotropy.
His study in Nanotechnology is interdisciplinary in nature, drawing from both Scientific method and Structural coloration.
His Deep reactive-ion etching research integrates issues from Surface finish, Deposition, Optical profilometry and Aspect ratio.
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