World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
48
Citations
9070
World Ranking
3079
National Ranking
91

Materials Science

D-Index
51
Citations
9277
World Ranking
9916
National Ranking
555

Ernst-Bernhard Kley publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Ernst-Bernhard Kley sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 369 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Ernst-Bernhard Kley D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Ernst-Bernhard Kley sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 48 D-Index — 56th percentile

56% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Ernst-Bernhard Kley is affiliated with Friedrich Schiller University Jena in Germany. Their research primarily focuses on the field of engineering with specialization in electrical and electronic engineering, biomedical engineering, and surfaces, coatings, and films.

The main topics of their work include photonic and optical devices, plasmonic and surface plasmon research, optical network technologies, optical coatings and gratings, as well as nanofabrication and lithography techniques.

  • Photonic and Optical Devices
  • Plasmonic and Surface Plasmon Research
  • Optical Network Technologies
  • Optical Coatings and Gratings
  • Nanofabrication and Lithography Techniques

Kley has published papers in notable venues, such as:

  • Nature Communications
  • Advanced Functional Materials
  • Photonics Research

Recent papers include:

  • Modular nonlinear hybrid plasmonic circuit, 2020, Nature Communications
  • Photonic Nanomaterials: Merging Top-Down and Bottom-Up Approaches to Fabricate Artificial Photonic Nanomaterials with a Deterministic Electric and Magnetic Response (Adv. Funct. Mater. 3/2020), 2020, Advanced Functional Materials
  • Sub-nanometer address grid in variable shaped e-beam lithography for efficient inscription of high-precision large-area optical gratings, 2025, Photonics Research

Frequent co-authors they have collaborated with include:

  • Thomas Siefke
  • Andreas Tünnermann
  • Alessandro Tuniz
  • Oliver Bickerton
  • Fernando Díaz

Best Publications

  • Asymmetric transmission of linearly polarized light at optical metamaterials.

    C. Menzel;C. Helgert;C. Rockstuhl;E.-B. Kley

  • Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range

    Thomas Siefke;Stefanie Kroker;Stefanie Kroker;Kristin Pfeiffer;Oliver Puffky

  • High-power femtosecond Yb-doped fiber amplifier.

    Jens Limpert;T. Schreiber;T. Clausnitzer;K. Zöllner

  • Sparsity-based single-shot subwavelength coherent diffractive imaging

    A. Szameit;Y. Shechtman;E. Osherovich;E. Bullkich

  • An intelligible explanation of highly-efficient diffraction in deep dielectric rectangular transmission gratings.

    Tina Clausnitzer;Thomas Kampfe;Ernst-Bernhard Kley;Andreas Tunnermann

  • Efficient Coupling into Polymer Waveguides by Gratings

    Ralf Waldhäusl;Bernd Schnabel;Peter Dannberg;Ernst-Bernhard Kley

  • Highly efficient transmission gratings in fused silica for chirped-pulse amplification systems

    Tina Clausnitzer;Jens Limpert;Karsten Zöllner;Holger Zellmer

  • Spatial and spectral light shaping with metamaterials.

    Benny Walther;Christian Helgert;Carsten Rockstuhl;Frank Setzpfandt

  • High-average-power femtosecond fiber chirped-pulse amplification system

    Limpert J;Clausnitzer T;Liem A;Schreiber T

  • Chiral metamaterial composed of three-dimensional plasmonic nanostructures.

    Christian Helgert;Ekaterina Pshenay-Severin;Matthias Falkner;Christoph Menzel

  • Continuous profile writing by electron and optical lithography

    Ernst-Bernhard Kley

  • Terahertz emission from black silicon

    P. Hoyer;M. Theuer;R. Beigang;E.-B. Kley

  • The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

    Martin Steglich;Thomas Käsebier;Matthias Zilk;Thomas Pertsch

  • Fabrication of nanoscale lithium niobate waveguides for second-harmonic generation.

    Reinhard Geiss;Sina Saravi;Anton Sergeyev;Séverine Diziain

  • Realization of a Monolithic High-Reflectivity Cavity Mirror from a Single Silicon Crystal

    Frank Brückner;Daniel Friedrich;Tina Clausnitzer;Michael Britzger

  • STUDY ON POLARIZING VISIBLE LIGHT BY SUBWAVELENGTH-PERIOD METAL-STRIPE GRATINGS

    Bernd Schnabel;Ernst-Bernhard Kley;Frank Wyrowski

  • Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

    Marko Vogler;Sabine Wiedenberg;Michael Mühlberger;Iris Bergmair

  • Enhancing second harmonic generation in gold nanoring resonators filled with lithium niobate.

    Dennis Lehr;Jörg Reinhold;Illia Thiele;Holger Hartung

  • Effective properties of amorphous metamaterials

    C. Helgert;C. Rockstuhl;C. Etrich;C. Menzel

  • Highly-dispersive dielectric transmission gratings with 100% diffraction efficiency

    T. Clausnitzer;T. Kämpfe;E.-B. Kley;A. Tünnermann

  • A Surface‐Emitting Circular Grating Polymer Laser

    C. Bauer;H. Giessen;H. Giessen;B. Schnabel;B. Schnabel;E. B. Kley

Frequent Co-Authors

Andreas Tünnermann
Andreas Tünnermann Friedrich Schiller University Jena
Thomas Pertsch
Thomas Pertsch Friedrich Schiller University Jena
Roman Schnabel
Roman Schnabel Universität Hamburg
Karsten Danzmann
Karsten Danzmann Max Planck Institute for Gravitational Physics
Falk Lederer
Falk Lederer Friedrich Schiller University Jena
Carsten Rockstuhl
Carsten Rockstuhl Karlsruhe Institute of Technology
Stefan Nolte
Stefan Nolte Friedrich Schiller University Jena
Ulf Peschel
Ulf Peschel Friedrich Schiller University Jena
Ralf B. Wehrspohn
Ralf B. Wehrspohn Martin Luther University Halle-Wittenberg
Harald Giessen
Harald Giessen University of Stuttgart

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