The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Douglas R. MacFarlane sits on this spectrum.
This scientist: 942 publications — 98th percentile
98% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Douglas R. MacFarlane sits on this spectrum.
This scientist: 145 D-Index — 99th percentile
99% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Douglas R. MacFarlane is affiliated with Monash University in Australia and has an extensive research profile in Engineering and Materials Science. Their work spans key subfields such as Materials Chemistry, Electrical and Electronic Engineering, Catalysis, Renewable Energy, Sustainability and the Environment, and Mechanical Engineering.
The scientist's primary research focuses on topics including Ammonia Synthesis and Nitrogen Reduction, Advanced Battery Materials and Technologies, Electrocatalysts for Energy Conversion, as well as Crystallization and Solubility Studies. Their investigations also involve advanced methods in X-ray Diffraction in Crystallography and ongoing advancements in battery materials.
Their recent scholarly output features notable publications in prominent scientific venues. These include:
Frequent co-authors collaborating on these and other projects include Alexandr N. Simonov, Mega Kar, Karolina Matuszek, Jennifer M. Pringle, and Samantha L. Piper.
Douglas R. MacFarlane frequently publishes in specialized venues such as The Cambridge Structural Database, ECS Meeting Abstracts, Journal of Materials Chemistry A, ChemSusChem, and Faraday Discussions, contributing valuable research insights across multiple disciplines.
Michel Armand;F Endres;Douglas Robert Macfarlane;Hiroyuki Ohno
Douglas R. MacFarlane;Naoki Tachikawa;Maria Forsyth;Jennifer M. Pringle
Douglas R. MacFarlane;Pavel V. Cherepanov;Jaecheol Choi;Bryan H.R. Suryanto
G.M. Fahy;D.R. MacFarlane;C.A. Angell;H.T. Meryman
Bryan H.R. Suryanto;Hoang Long Du;Dabin Wang;Jun Chen
Wen Lu;Andrei G. Fadeev;Baohua Qi;Elisabeth Smela
Zhigang Lei;Biaohua Chen;Yoon Mo Koo;Douglas R. Macfarlane
Douglas R Macfarlane;Pavla Meakin;Jiazeng Sun;Nahid Amini
Frank Endres;Douglas MacFarlane;Andrew Abbott
Douglas R. MacFarlane;Maria Forsyth;Ekaterina I. Izgorodina;Andrew P. Abbott
Douglas Robert Macfarlane;Maria Forsyth;Patrick Craig Howlett;Jennifer Mary Pringle
Stewart A Forsyth;Jennifer Mary Pringle;Douglas Robert Macfarlane
Douglas R Macfarlane;Junhua H Huang;Maria Forsyth
Jiazeng Sun;Maria Forsyth;Douglas R Macfarlane
Douglas R. MacFarlane;Maria Forsyth;Patrick C. Howlett;Mega Kar
Anthony E. Somers;Patrick C. Howlett;Douglas R. MacFarlane;Maria Forsyth
Fengwang Li;Lu Chen;Gregory P. Knowles;Douglas R. MacFarlane
Chuangwei Liu;Qinye Li;Chengzhang Wu;Jie Zhang
Fengling Zhou;Luis Miguel Azofra;Muataz Ali;Mega Kar
Douglas R Macfarlane;Stewart A Forsyth;Jake J Golding;G B Deacon
Patrick Craig Howlett;Douglas Robert Macfarlane;Anthony F Hollenkamp
Kevin James Fraser;Douglas Robert Macfarlane
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