The chart shows the distribution of publications by all Research.com ranked scientists in the field of Physics in 2026. The highlighted bar marks where Daniel C. Ralph sits on this spectrum.
This scientist: 489 publications — 54th percentile
54% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,469 publications or more.
The chart shows the D-index (discipline H-index) distribution of Physics scientists ranked by Research.com in 2026. The highlighted bar marks where Daniel C. Ralph sits on this spectrum.
This scientist: 104 D-Index — 62nd percentile
62% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 185 D-Index or more.
Daniel C. Ralph is affiliated with Cornell University in the United States and has an extensive publication record primarily in the fields of Physics and Astronomy as well as Materials Science. Their research work spans several subfields including Atomic and Molecular Physics, and Optics, Materials Chemistry, Electronic, Optical and Magnetic Materials, Condensed Matter Physics, and Electrical and Electronic Engineering.
The main topics of their research include magnetic properties of thin films, multiferroics and related materials, magnetic and transport properties of perovskites and related materials, quantum and electron transport phenomena, topological materials and phenomena, physics of superconductivity and magnetism, and 2D materials and applications.
The scientist has published frequently in the following venues:
Several recent papers illustrate the scope and focus of their research:
Frequent collaborators include David A. Muller, Rakshit Jain, Xiyue S. Zhang, Thow Min Jerald Cham, and Arnab Bose.
Among notable recognitions, Daniel C. Ralph was awarded the status of Fellow of the Alfred P. Sloan Foundation in 1996.
Luqiao Liu;Chi Feng Pai;Y. Li;H. W. Tseng
Jiwoong Park;Jiwoong Park;Abhay N. Pasupathy;Jonas I. Goldsmith;Connie Chang
S. I. Kiselev;J. C. Sankey;I. N. Krivorotov;N. C. Emley
J. A. Katine;F. J. Albert;R. A. Buhrman;E. B. Myers
D.C. Ralph;M.D. Stiles
Luqiao Liu;O. J. Lee;T. J. Gudmundsen;Daniel C Ralph
Luqiao Liu;Takahiro Moriyama;D. C. Ralph;R. A. Buhrman
E. B. Myers;D. C. Ralph;J. A. Katine;R. N. Louie
Chi-Feng Pai;Luqiao Liu;Y. Li;H. W. Tseng
A. R. Mellnik;Joonsue Lee;Anthony R. Richardella;J. L. Grab
Frances Hellman;Axel Hoffmann;Yaroslav Tserkovnyak;Geoffrey S.D. Beach
Jack C. Sankey;Yong-Tao Cui;Jonathan Z. Sun;John C. Slonczewski
J.T. Heron;J.L. Bosse;Q. He;Y. Gao
V. S. Pribiag;I. N. Krivorotov;G. D. Fuchs;Patrick M Braganca
David MacNeill;Colin Heikes;Kin Fai Mak;Zachary Anderson
D. MacNeill;G. M. Stiehl;M. H. D. Guimaraes;R. A. Buhrman
DC Ralph;CT Black;M Tinkham
I. N. Krivorotov;N. C. Emley;J. C. Sankey;S. I. Kiselev
F. Kuemmeth;S. Ilani;D. C. Ralph;P. L. McEuen
Abhay N. Pasupathy;Radoslaw C. Bialczak;Jan Martinek;Jacob E. Grose
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