| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Physics | 182 | 18 | 34 | 10 |
| Materials Science | 257 | 352 | 515 | 29 |
| Chemistry | 351 | 118 | 196 | 22 |
The concepts of Analytical chemistry, Thin film, Optoelectronics, Sputtering and Atomic physics are tackled in the journal. The Analytical chemistry works featured in Journal of Vacuum Science and Technology incorporate elements from Ion, Substrate (electronics) and Silicon. It holds forums on Thin film that merges themes from other disciplines such as Chemical vapor deposition, Composite material, Deposition (phase transition), Inorganic chemistry and Annealing (metallurgy).
Topics in Inorganic chemistry were tackled in line with various other fields like Oxide and Adsorption. Optoelectronics research presented in the journal encompasses a variety of subjects, including Nanotechnology, Optics and Epitaxy. Research in Crystallography and the interrelating topic of Electron diffraction were among the subjects of interest in the Epitaxy studies discussed in Journal of Vacuum Science and Technology.
While work presented in it provided substantial information on Sputtering, it also covered topics in Metallurgy and Argon. In addition to Atomic physics research, Journal of Vacuum Science and Technology aims to explore topics under Electron and Plasma. The study on Plasma presented in the journal intersects with the topics under Etching (microfabrication).
The most cited articles are organized to address concerns in the fields of Analytical chemistry, Thin film, Sputtering, Silicon and Atomic physics. The published articles address concerns in Analytical chemistry which are intertwined with other disciplines, such as Ion, Substrate (electronics) and Etching (microfabrication). The most cited publications explore research in Thin film alongside concepts in Optoelectronics and other areas of study in Nanotechnology.
The main points discussed in the journal deals with Analytical chemistry, Optoelectronics, X-ray photoelectron spectroscopy, Thin film and Atomic layer deposition. The journal explores topics in Analytical chemistry which can be helpful for research in disciplines like Hydrogen, Chemical vapor deposition, Doping, Sputtering and Ion. The concepts on Optoelectronics presented in it can also apply to other research fields, including Layer (electronics), Substrate (electronics), Epitaxy and Etching (microfabrication).
Oxide and Scanning electron microscope are some topics wherein X-ray photoelectron spectroscopy research discussed in the journal have an impact. The journal facilitates discussions on Thin film that incorporate concepts from other fields like Sapphire and Titanium. Some problems in Atomic layer deposition that were presented in it overlapped with concepts under Deposition (phase transition), Plasma, Nucleation, Dielectric and Chemical engineering.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Vacuum Science and Technology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Vacuum Science and Technology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 5.66% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 12.80% were posted by at least one author from the top 10 institutions publishing in the journal. Another 16.80% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 19.20% of all publications and 51.20% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Thomas R. Gengenbach;George H. Major;Matthew R. Linford;Christopher D. Easton
(2021)George H. Major;Neal Fairley;Peter M. A. Sherwood;Matthew R. Linford
(2020)Donald R. Baer;Kateryna Artyushkova;Hagai Cohen;Christopher D. Easton
(2020)George H. Major;Tahereh G. Avval;Behnam Moeini;Gabriele Pinto
(2020)Kateryna Artyushkova
(2020)Cedric J. Powell
(2020)Hanan Alexandra Hsain;Younghwan Lee;Monica Materano;Terence Mittmann
(2022)For students interested in Chemistry and its applications, exploring related online degrees can open diverse career pathways in healthcare and science. Fields like radiology and medical assistance often require specialized training that can be accessed through flexible online programs. For those seeking foundational technical roles, the best online radiology tech programs provide affordable and accredited options to gain essential skills.
Similarly, many individuals pursue roles as medical assistants, where hands-on patient care and office administration skills are vital. Quality online medical assistant programs often come with options for financial support; exploring online medical assistant programs with financial aid can help make education more affordable and accessible.
For advanced practice nurses focusing on leadership without direct clinical requirements, there are online dnp programs without clinicals, ideal for those looking to advance education with flexibility. Pharmacy also offers promising careers for chemistry enthusiasts; the online pharmd programs enable students to pursue a doctorate in pharmacy while balancing other commitments.
Taking advantage of these varied online degree options can help Chemistry students leverage their knowledge into rewarding healthcare and science careers, all while accommodating busy lifestyles.
