1932-5150
Published by: SPIE
https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 647 | 22 | 32 | 7 |
| Engineering and Technology | 1221 | 11 | 17 | 5 |
The discussions in the journal mainly cover the fields of Optics, Lithography, Optoelectronics, Nanotechnology and Photolithography. Optics research featured in Journal of Micro-nanolithography Mems and Moems incorporates concerns from various other topics such as Wafer and Photomask. The presented research on Photomask deals specifically with Optical proximity correction but it also addresses topics in Algorithm.
The journal explores research in Lithography alongside concepts in Resist and other areas of study in Surface finish. In addition to Optoelectronics research, it aims to explore topics under Etching (microfabrication) and Laser. Nanotechnology research discussed connects with the study of Nanolithography.
The studies in Photolithography featured incorporate elements of Immersion lithography, Multiple patterning, Computational lithography, Photoresist and Maskless lithography. The studies on Microelectromechanical systems discussed can also contribute to research in the domains of Surface micromachining and Actuator. Journal of Micro-nanolithography Mems and Moems explores research in Extreme ultraviolet lithography and the adjacent study of Extreme ultraviolet.
The most cited publications mainly deal with areas of study such as Optics, Lithography, Optoelectronics, Extreme ultraviolet lithography and Photolithography. The journal articles connects the study in Optics with the closely related areas of Immersion lithography. While the journal publications focused on Lithography, they were also able to explore topics like Nanotechnology, Resist, X-ray lithography, Photomask and Next-generation lithography.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Micro-nanolithography Mems and Moems (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Micro-nanolithography Mems and Moems (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 0.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 0.00% were posted by at least one author from the top 10 institutions publishing in the journal. Another 0.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 0.00% of all publications and 100.00% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Iacopo Mochi;Sara Fernandez;Ricarda Nebling;Uldis Locans
(2020)Mika Pflüger;R. Joseph Kline;Analía Fernández Herrero;Martin Hammerschmidt
(2020)Jonathan H. Ma;Jonathan H. Ma;Han Wang;David G. Prendergast;Andrew R. Neureuther;Andrew R. Neureuther
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