| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 229 | 80 | 104 | 16 |
| Materials Science | 512 | 51 | 56 | 11 |
The discussions in IEEE Transactions on Nanotechnology mainly cover the fields of Optoelectronics, Electronic engineering, Nanotechnology, Transistor and Electrical engineering. The journal facilitates discussions on Optoelectronics that incorporate concepts from other fields like Field-effect transistor, Optics and MOSFET. The journal centers on topics in Optics, with a focus on Plasmon.
MOSFET research featured in it incorporates concerns from various other topics such as Threshold voltage and Condensed matter physics. IEEE Transactions on Nanotechnology holds forums on Electronic engineering that merges themes from other disciplines such as Electronic circuit and Integrated circuit. The research on Nanotechnology featured in the journal combines topics in other fields like Nanolithography and Electrode.
The majority of Electrical engineering studies are focused on the issues of Voltage. The majority of Carbon nanotube studies in the journal are focused on the subject of Nanotube.
The most cited publications are mainly concerned with subjects like Electronic engineering, Optoelectronics, Nanotechnology, Nanoelectronics and Electrical engineering. The most cited publications explore research in Optoelectronics alongside concepts in MOSFET and other areas of study in Threshold voltage. The featured Nanoelectronics studies in the published papers mainly concentrate on Field-effect transistor but also cover areas of interest in Condensed matter physics.
Optoelectronics, Logic gate, Electronic engineering, Transistor and Nanoparticle are the subjects of interest in IEEE Transactions on Nanotechnology. While the journal focused on Optoelectronics, it was also able to explore topics like Etching (microfabrication), Substrate (electronics) and Graphene. The studies on Logic gate discussed can also contribute to research in the domains of Carbon nanotube field-effect transistor, Capacitance, Electronic circuit and Topology.
The research on Electronic engineering tackled can also make contributions to studies in the areas of Digital electronics and Signal integrity. In addition to Transistor research, the journal aims to explore topics under Noise (electronics), Amplifier and Ternary operation. The journal deals with Nanoparticle in conjunction with other fields like
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in IEEE Transactions on Nanotechnology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in IEEE Transactions on Nanotechnology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 7.69% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 6.25% were posted by at least one author from the top 10 institutions publishing in the journal. Another 6.25% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 21.88% of all publications and 65.62% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Lokendra Singh;Ragini Singh;Bingyuan Zhang;Brajesh Kumar Kaushik
(2020)Samuel Sze Hang Ng;Robert A. Wolkow;Konrad Walus;Jacob Retallick
(2020)Abdolah Amirany;Kian Jafari;Mohammad Hossein Moaiyeri
(2020)Tae-Hyeon Kim;Min-Hwi Kim;Suhyun Bang;Dong Keun Lee
(2020)Shashank Sundriyal;Vishal Shrivastav;Ashwinder Kaur;Prashant Dubey
(2021)Enrique Miranda;Jordi Sune
(2020)Hussein Nili;Adrien F. Vincent;Mirko Prezesio;Mohammad R. Mahmoodi
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