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Applied Physics Express
H-index 34

Applied Physics Express

1882-0778

Published by: IOP Publishing

https://iopscience.iop.org/journal/1882-0786

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Physics 139 33 92 14

Additional Metrics

Number of Best Scientists*: 487
Documents by Best Scientists*: 757
Top 100 Ranked Scientists*: 11
SCIMAGO H-index: 115
SCIMAGO SJR: 0.427
Impact Factor: 2.2

Overview

Top Research Topics at Applied Physics Express?

The main research concerns discussed in Applied Physics Express are Optoelectronics, Optics, Condensed matter physics, Analytical chemistry and Laser. Some problems in Optoelectronics that were presented in the journal overlapped with concepts under Layer (electronics), Epitaxy and Transistor. It centers on topics in Transistor, with a focus on Field-effect transistor.

It emphasizes research on Optics, which includes concerns such as Wavelength. While Condensed matter physics is the focus of the journal, it also provided insights into the studies of Magnetic field and Magnetization. In the journal, Thin film and Doping are investigated in conjunction with one another to address concerns in Analytical chemistry research.

  • Optoelectronics (40.73%)
  • Optics (17.73%)
  • Condensed matter physics (15.01%)

What are the most cited papers published in the journal?

  • Enhanced Conversion Efficiencies of Cu2ZnSnS4-Based Thin Film Solar Cells by Using Preferential Etching Technique (681 citations)
  • Structure of Silicene Grown on Ag(111) (428 citations)
  • 531 nm Green Lasing of InGaN Based Laser Diodes on Semi-Polar {202̄1} Free-Standing GaN Substrates (364 citations)

Research areas of the most cited articles at Applied Physics Express:

The most cited papers are organized to address concerns in the fields of Optoelectronics, Optics, Condensed matter physics, Analytical chemistry and Diode. Aside from discussions in Optoelectronics, the journal papers also deal with the subject of Transistor which intersects with Nanotechnology disciplines. While Analytical chemistry is the focus of the most cited publications, it also provides insights into the studies of Thin film and Doping.

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing in Applied Physics Express (based on the number of publications) are:

  • James S. Speck (67 papers) published 2 papers at the last edition, 2 less than at the previous edition,
  • Steven P. DenBaars (62 papers) published 5 papers at the last edition, 2 more than at the previous edition,
  • Shuji Nakamura (59 papers) published 5 papers at the last edition, 1 more than at the previous edition,
  • Teruo Ono (54 papers) published 2 papers at the last edition, 1 less than at the previous edition,
  • Jun Suda (44 papers) published 10 papers at the last edition, 4 more than at the previous edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing in Applied Physics Express (based on the number of publications) are:

  • University of Tokyo (383 papers) published 12 papers at the last edition, 12 less than at the previous edition,
  • Tohoku University (315 papers) published 14 papers at the last edition, 11 less than at the previous edition,
  • Osaka University (301 papers) published 19 papers at the last edition, 3 more than at the previous edition,
  • National Institute of Advanced Industrial Science and Technology (281 papers) published 18 papers at the last edition, 1 more than at the previous edition,
  • Nagoya University (224 papers) published 23 papers at the last edition, 9 less than at the previous edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 39.13% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 49.05% were posted by at least one author from the top 10 institutions publishing in the journal. Another 6.67% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 11.43% of all publications and 32.86% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Top Publications

  • Room-temperature operation of AlGaN ultraviolet-B laser diode at 298 nm on lattice-relaxed Al0.6Ga0.4N/AlN/sapphire

    Kosuke Sato;Kosuke Sato;Shinji Yasue;Kazuki Yamada;Shunya Tanaka

    (2020)
    91 Citations
  • Continuous-wave lasing of AlGaN-based ultraviolet laser diode at 274.8 nm by current injection

    (2022)
    46 Citations
  • Improving light output power of AlGaN-based deep-ultraviolet light-emitting diodes by optimizing the optical thickness of p-layers

    Yusuke Matsukura;Tetsuhiko Inazu;Cyril Pernot;Naoki Shibata

    (2021)
    44 Citations
  • Internal loss of AlGaN-based ultraviolet-B band laser diodes with p-type AlGaN cladding layer using polarization doping

    Tomoya Omori;Sayaka Ishizuka;Shunya Tanaka;Shinji Yasue

    (2020)
    37 Citations
  • Crystal orientation and anomalous Hall effect of sputter-deposited non-collinear antiferromagnetic Mn3Sn thin films

    Juyoung Yoon;Yutaro Takeuchi;Ryuichi Itoh;Shun Kanai

    (2020)
    31 Citations
  • Numerical simulation of artificial spin ice for reservoir computing

    Kwan Hon;Yuki Kuwabiraki;Minori Goto;Ryoichi Nakatani

    (2021)
    28 Citations
  • Single-beam three-axis optically pumped magnetometers with sub-100 femtotesla sensitivity

    Wei Xiao;Yulong Wu;Xiangzhi Zhang;Yulong Feng

    (2021)
    25 Citations
  • Effect of dislocation density on optical gain and internal loss of AlGaN-based ultraviolet-B band lasers

    Shunya Tanaka;Yuta Kawase;Shohei Teramura;Sho Iwayama;Sho Iwayama

    (2020)
    23 Citations
  • AlN quasi-vertical Schottky barrier diode on AlN bulk substrate using Al0.9Ga0.1N current spreading layer

    (2022)
    21 Citations
  • “Regrowth-free” fabrication of high-current-gain AlGaN/GaN heterojunction bipolar transistor with N-p-n configuration

    (2022)
    20 Citations

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Best Scientists Contributing to This Journal