The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Tsuguo Fukuda sits on this spectrum.
This scientist: 708 publications — 96th percentile
96% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Tsuguo Fukuda sits on this spectrum.
This scientist: 68 D-Index — 64th percentile
64% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Tsuguo Fukuda is a researcher affiliated with Tohoku University in Japan. Their work primarily spans the fields of Engineering and Materials Science, with significant contributions focused on Mechanical Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, and Condensed Matter Physics.
The scientist's research topics are centered on GaN-based semiconductor devices and materials, ZnO doping and properties, magnetic properties and applications, microstructure and mechanical properties of steels, Ga2O3 and related materials, acoustic wave resonator technologies, and innovative energy harvesting technologies.
Frequent collaborators in their academic career include Kazumasa Sugiyama, Toru Kawamata, Nobuhiko Sarukura, Shigeru Suzuki, and Tsuyoshi Kumagai.
Tsuguo Fukuda has contributed extensively to publications, predominantly featuring in the Journal of Crystal Growth, with eleven publications. Other venues where their work has appeared include the SSRN Electronic Journal, IEEE Transactions on Magnetics, Applied Physics Express, and Crystals.
Representative recent papers authored by Tsuguo Fukuda include:
S. Tsunekawa;T. Fukuda;A. Kasuya
Eriko Ohshima;Hiraku Ogino;Ikuo Niikura;Katsumi Maeda
Katsumi Maeda;Mitsuru Sato;Ikuo Niikura;Tsuguo Fukuda
Hans J. Scheel;Tsuguo Fukuda
Wen-Jun Li;Er-Wei Shi;Jung-Min Ko;Zhi-zhan Chen
Kiyoshi Shimamura;Hiroaki Takeda;Takuya Kohno;Tsuguo Fukuda
P. Rudolph;T. Fukuda
Y. Tomm;J. M. Ko;Akira Yoshikawa;T. Fukuda
R. Komatsu;T. Sugawara;K. Sassa;N. Sarukura
M. Nikl;H. Ogino;A. Krasnikov;A. Beitlerova
Akira Yoshikawa;Martin Nikl;Georges Boulon;Tsuguo Fukuda
Dae Ho Yoon;Ichiro Yonenaga;Tsuguo Fukuda;Norio Ohnishi
M. Nikl;J. Pejchal;E. Mihokova;J. A. Mares
Dorota A. Pawlak;Masahiko Ito;Masaoki Oku;Kiyoshi Shimamura
Akira Yoshikawa;E. Ohshima;T. Fukuda;H. Tsuji
Dirk Ehrentraut;Hideto Sato;Yuji Kagamitani;Hiroki Sato
H. Ogino;A. Yoshikawa;M. Nikl;K. Kamada
Hiraku Ogino;Akira Yoshikawa;Martin Nikl;Aleksei Krasnikov
Takeshi Nishimatsu;Noriaki Terakubo;Hiroshi Mizuseki;Yoshiyuki Kawazoe
Hiroyuki Shibata;Yoshio Waseda;Hiromichi Ohta;Kazumasa Kiyomi
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