The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where John C. de Mello sits on this spectrum.
This scientist: 132 publications — 9th percentile
9% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where John C. de Mello sits on this spectrum.
This scientist: 55 D-Index — 69th percentile
69% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
John C. de Mello is affiliated with Imperial College London in the United Kingdom. Their research work primarily spans the field of engineering, with specific attention to electrical and electronic engineering, biomedical engineering, materials chemistry, polymers and plastics, as well as electronic, optical, and magnetic materials.
The scientist's published papers cover various advanced topics, including perovskite materials and applications, gold and silver nanoparticles synthesis and applications, conducting polymers and their applications, innovative microfluidic and catalytic techniques innovation, advanced electrical measurement techniques, photoreceptor and optogenetics research, and extraction and separation processes.
Recent publications authored or co-authored by John C. de Mello include:
The scientist frequently publishes in several venues, with the most contributions appearing in Chemistry - Methods, arXiv (Cornell University), Advanced Materials, Small, and Frontiers in Bioengineering and Biotechnology.
Key collaborators in their research work include Andrew J. Harvie, Sihai Luo, Surendra K. Yadav, Stefan A. Maier, and Bruno F. E. Matarèse.
John C. de Mello;H. Felix Wittmann;Richard H. Friend
J. Huang;P. F. Miller;J. S. Wilson;A. J. de Mello
Dong-Seok Leem;Angharad Edwards;Mark Faist;Jenny Nelson
C. G. Shuttle;B. O’Regan;A. M. Ballantyne;J. Nelson
J. C. deMello;N. Tessler;S. C. Graham;R. H. Friend
Joshua B. Edel;Robin Fortt;John C. deMello;Andrew J. deMello
S. Krishnadasan;R. J. C. Brown;A. J. deMello;J. C. deMello
J. Huang;P.F. Miller;J.C. de Mello;A.J. de Mello
Mark A. Faist;Thomas Kirchartz;Wei Gong;Raja Shahid Ashraf
C. G. Shuttle;A. Maurano;R. Hamilton;B. O’Regan
Sungsoo Kim;Jonghyuk Yim;Xuhua Wang;Donal D.C. Bradley
Nicola Gasparini;Michael Salvador;Michael Salvador;Sebastian Strohm;Thomas Heumueller
Hugo Bronstein;Dong Seok Leem;Richard Hamilton;Paul Woebkenberg
Paul Westacott;John R. Tumbleston;Safa Shoaee;Sarah Fearn
Adrian M. Nightingale;Adrian M. Nightingale;Thomas W. Phillips;James H. Bannock;John C. de Mello
John deMello;Andrew deMello
Oliver Hofmann;Xuhua Wang;Alastair Cornwell;Stephen Beecher
Thomas W. Phillips;Ioannis G. Lignos;Richard M. Maceiczyk;Andrew J. deMello
S. Krishnadasan;J. Tovilla;R. Vilar;A. J. deMello
Jong Hyuk Yim;Sung-yoon Joe;Christina Pang;Kyung Moon Lee
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