| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 264 | 52 | 55 | 14 |
| Materials Science | 440 | 85 | 97 | 14 |
The primary areas of discussion in Microelectronic Engineering are Optoelectronics, Nanotechnology, Optics, Analytical chemistry and Lithography. Some problems in Optoelectronics that were presented in the journal overlapped with concepts under Layer (electronics) and Transistor. Microelectronic Engineering holds forums on Nanotechnology that merges themes from other disciplines such as Nanolithography, Composite material and Nanoimprint lithography.
The journal emphasizes research on Optics, which includes concerns such as Laser. The research on Analytical chemistry tackled can also make contributions to studies in the areas of Thin film, Oxide, Annealing (metallurgy) and Reactive-ion etching. The studies in Lithography featured incorporate elements of Resist, X-ray lithography, Next-generation lithography and Photolithography.
Electron-beam lithography is a primary topic of Resist research in Microelectronic Engineering. The work on Dielectric presented in it focuses on High-κ dielectric in particular. The work on Silicon addressed in it expands to the thematically related Substrate (electronics).
The most cited articles are mainly concerned with subjects like Nanotechnology, Optoelectronics, Optics, Analytical chemistry and Composite material. The journal articles focus on Nanotechnology but sometimes tackle the closely related topic of Lithography which is concerned with X-ray lithography. Etching (microfabrication) and Layer (electronics) are some topics wherein Optoelectronics research discussed in the journal publications has an impact.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Microelectronic Engineering (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Microelectronic Engineering (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2022 edition, 100.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, nan% were posted by at least one author from the top 10 institutions publishing in the journal. Another nan% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included nan% of all publications and nan% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Md. Abdul Kaium Khan;Mohammad Abdul Alim;Christophe Gaquiere
(2021)Ahmed AL-Osta;Ahmed AL-Osta;Bushra Saleh Samer;Bushra Saleh Samer;Umesh T. Nakate;Umesh T. Nakate;Vijaykumar V. Jadhav
(2020)Gongdi Long;Yuanjun Guo;Wei Li;Qingbo Tang
(2020)Rui Li;Zhenyu Yuan;Fanli Meng;Tianyu Jiao
(2021)Thomas Mortelmans;Thomas Mortelmans;Dimitrios Kazazis;Vitaliy A. Guzenko;Celestino Padeste
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