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Japanese Journal of Applied Physics
H-index 24

Japanese Journal of Applied Physics

0021-4922

Published by: IOP Publishing

https://iopscience.iop.org/journal/1347-4065

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Physics 189 26 53 9

Additional Metrics

Number of Best Scientists*: 731
Documents by Best Scientists*: 1414
Top 100 Ranked Scientists*: 21
SCIMAGO H-index: 183
SCIMAGO SJR: 0.29
Impact Factor: 1.8

Overview

Top Research Topics at Japanese Journal of Applied Physics?

Japanese Journal of Applied Physics was organized to reinforce research efforts on Optoelectronics, Analytical chemistry, Optics, Condensed matter physics and Thin film. It explores topics in Optoelectronics which can be helpful for research in disciplines like Layer (electronics), Epitaxy and Field-effect transistor, Transistor. While work presented in the journal provided substantial information on Analytical chemistry, it also covered topics in Chemical vapor deposition, Silicon, Annealing (metallurgy), Mineralogy and Substrate (electronics).

Laser, Wavelength and Liquid crystal are among the concentrations of Optics that garnered much attention in it. The main emphasis of the journal is the research on Condensed matter physics, emphasizing the topic of Superconductivity. The study on Thin film presented in the journal intersects with the topics under Composite material.

  • Optoelectronics (24.24%)
  • Analytical chemistry (23.64%)
  • Optics (19.02%)

What are the most cited papers published in the journal?

  • A New High-TcOxide Superconductor without a Rare Earth Element (2602 citations)
  • TiO2 Photocatalysis: A Historical Overview and Future Prospects (2471 citations)
  • InGaN-Based Multi-Quantum-Well-Structure Laser Diodes. (1901 citations)

Research areas of the most cited articles at Japanese Journal of Applied Physics:

The main points discussed in the published papers deal with Analytical chemistry, Optoelectronics, Optics, Thin film and Condensed matter physics. The published articles facilitate discussions on Analytical chemistry that incorporate concepts from other fields like Chemical vapor deposition, Silicon, Mineralogy, Electrical resistivity and conductivity and Dielectric. The journal publications address concerns in the field of Optoelectronics by exploring it in line with topics in Epitaxy which intersect with Crystallography subjects.

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing in Japanese Journal of Applied Physics (based on the number of publications) are:

  • Katsumi Yoshino (375 papers) absent at the last edition,
  • Hiroshi Funakubo (221 papers) published 6 papers at the last edition, 2 less than at the previous edition,
  • Hideo Takezoe (210 papers) absent at the last edition,
  • Fumio Koyama (198 papers) absent at the last edition,
  • Susumu Namba (185 papers) absent at the last edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing in Japanese Journal of Applied Physics (based on the number of publications) are:

  • University of Tokyo (2225 papers) published 18 papers at the last edition, 31 less than at the previous edition,
  • Tohoku University (2014 papers) published 19 papers at the last edition, 48 less than at the previous edition,
  • Osaka University (1991 papers) published 14 papers at the last edition, 38 less than at the previous edition,
  • Tokyo Institute of Technology (1717 papers) published 22 papers at the last edition, 20 less than at the previous edition,
  • National Institute of Advanced Industrial Science and Technology (1476 papers) published 27 papers at the last edition, 46 less than at the previous edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 55.63% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 46.11% were posted by at least one author from the top 10 institutions publishing in the journal. Another 9.80% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 15.27% of all publications and 28.82% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Top Publications

  • Recent Progress in Ferromagnetic Semiconductors and Spintronics Devices

    Masaaki Tanaka

    (2021)
    34 Citations
  • Design and characterization of a low-optical-loss UV-C laser diode

    Ziyi Zhang;Ziyi Zhang;Maki Kushimoto;Tadayoshi Sakai;Naoharu Sugiyama

    (2020)
    33 Citations
  • Etching-induced damage in heavily Mg-doped p-type GaN and its suppression by low-bias-power inductively coupled plasma-reactive ion etching

    Takeru Kumabe;Yuto Ando;Hirotaka Watanabe;Manato Deki

    (2021)
    17 Citations
  • Reservoir computing with two-bit input task using dipole-coupled nanomagnet array

    Hikaru Nomura;Kazuki Tsujimoto;Minori Goto;Naoki Samura

    (2020)
    14 Citations
  • Plasmonics—high-speed photonics for co-integration with electronics

    Ueli Koch;Christopher Uhl;Horst Hettrich;Yuriy Fedoryshyn

    (2021)
    14 Citations
  • GaN-based vertical cavity surface emitting lasers with lateral optical confinements and conducting distributed Bragg reflectors

    Ryosuke Iida;Yusuke Ueshima;Wataru Muranaga;Sho Iwayama

    (2020)
    12 Citations
  • Recent progress and future of electron multi-beam mask writer

    (2023)
    11 Citations
  • Analysis of carrier injection efficiency of AlGaN UV-B laser diodes based on the relationship between threshold current density and cavity length

    Kosuke Sato;Tomoya Omori;Kazuki Yamada;Shunya Tanaka

    (2021)
    11 Citations
  • Novel energy-efficient designs of vertical-cavity surface emitting lasers for the next generations of photonic systems

    (2022)
    10 Citations
  • Uniformity improvement of Josephson-junction resistance by considering sidewall deposition during shadow evaporation for large-scale integration of qubits

    (2022)
    10 Citations

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