IEEE Nanotechnology Magazine

Top Research Topics at IEEE Nanotechnology Magazine?

The discussions in the journal mainly cover the fields of Nanotechnology, Desk, Optoelectronics, Library science and Carbon nanotube. The study on Nanotechnology presented in it intersects with the topics under Electronics.

• Nanotechnology (50.39%)
• Desk (16.97%)
• Optoelectronics (8.09%)

What are the most cited papers published in the journal?

• U-Health Smart Home (62 citations)
• Heterogeneously Integrated InP/Silicon Photonics: Fabricating Fully Functional Transceivers (61 citations)
• Resistive Memory-Based Analog Synapse: The Pursuit for Linear and Symmetric Weight Update (46 citations)

Research areas of the most cited articles at IEEE Nanotechnology Magazine:

The most cited publications focus largely on the fields of Nanotechnology, Molecular biophysics, Graphene, Optoelectronics and Nanoscopic scale. In addition to Nanotechnology research, the most cited articles aim to explore topics under Molecule, Initial momentum, Imaging quality, Terahertz radiation and Biological imaging. The studies on Nanoscopic scale discussed at the most cited publications can also contribute to research in the domains of Frame rate, Raster scan, Carbon nanotube and Video rate.

What topics the last edition of the journal is best known for?

• Quantum mechanics
• Electrical engineering
• Semiconductor

The previous edition focused in particular on these issues:

IEEE Nanotechnology Magazine primarily tackles Nanotechnology, Optoelectronics, Desk, Nanoscopic scale and Library science. The journal explores topics in Nanotechnology which can be helpful for research in disciplines like Nanometrology, Efficient energy use and Quantum devices. While the primary focus in it is Optoelectronics, it also dissects topics surrounding Spontaneous emission and Quantum efficiency, Nitride, Etching (microfabrication), Atomic layer deposition and Current density as a whole.

Concepts in Renewable energy, as well as related topics in Engineering physics and Quantum dot laser, are covered in the Desk research presented in IEEE Nanotechnology Magazine. The research on Nanoscopic scale featured in IEEE Nanotechnology Magazine combines topics in other fields like Semiconductor device, Surface charge and Microwave applications. Editorial board research are fields of study within Library science but they also intertwine with concepts in Join (sigma algebra).

The most cited articles from the last journal are:

• 1.5-mm Indium Phosphide-Based Quantum Dot Lasers and Optical Amplifiers: The Impact of Atom-Like Optical Gain Material for Optoelectronics Devices (3 citations)
• When Chemodynamic Therapy Meets Photodynamic Therapy: A Synergistic Combination of Cancer Treatments (1 citations)
• The Application of Organic Nanomaterials for Bioimaging, Drug Delivery, and Therapy: Spanning Various Domains (1 citations)

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

Top authors and change over time

The top authors publishing in IEEE Nanotechnology Magazine (based on the number of publications) are:

• John T.W. Yeow (31 papers) published 1 paper at the last edition the same number as at the previous edition,
• Xiaoning Jiang (15 papers) published 6 papers at the last edition, 1 less than at the previous edition,
• Bing Sheu (15 papers) published 9 papers at the last edition, 3 more than at the previous edition,
• Ning Xi (6 papers) absent at the last edition,
• Michel Frechette (5 papers) absent at the last edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Top affiliations and change over time

Only papers with recognized affiliations are considered

The top affiliations publishing in IEEE Nanotechnology Magazine (based on the number of publications) are:

• Georgia Institute of Technology (9 papers) absent at the last edition,
• University of Pittsburgh (7 papers) published 4 papers at the last edition,
• University of Waterloo (7 papers) published 1 paper at the last edition,
• University of Illinois at Urbana–Champaign (6 papers) absent at the last edition,
• Michigan State University (6 papers) absent at the last edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 57.14% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 33.33% were posted by at least one author from the top 10 institutions publishing in the journal. Another 20.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 20.00% of all publications and 26.67% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

• Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
• Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
• Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
• Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
• Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.