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Xiaoyu Dai

Xiaoyu Dai

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 47 3284 3147 532 530 175 6834

Xiaoyu Dai publications per year

The chart shows the history of publications by Xiaoyu Dai between 2005 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Xiaoyu Dai published across 21 years, from 2005 to 2025, averaging 12 papers a year. Output peaked at 31 publications in 2018. 23 of the 251 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 2005 to 2025. Vertical axis: number of publications, 0 to 31. Peak 31 publications in 2018. 2005: 2 publications 2006: 6 publications 2007: 19 publications 2008: 3 publications 2009: 4 publications 2010: 6 publications 2011: 8 publications 2012: 4 publications 2013: 7 publications 2014: 5 publications 2015: 12 publications 2016: 12 publications 2017: 13 publications 2018: 31 publications 2019: 26 publications 2020: 20 publications 2021: 10 publications 2022: 21 publications 2023: 19 publications 2024: 9 publications 2025: 14 publications
2005 2025

251 publications in total across all disciplines

View publications per year as a table
Xiaoyu Dai: publications per year, 2005 to 2025
Year Publications
2005 2
2006 6
2007 19
2008 3
2009 4
2010 6
2011 8
2012 4
2013 7
2014 5
2015 12
2016 12
2017 13
2018 31
2019 26
2020 20
2021 10
2022 21
2023 19
2024 9
2025 14
Total 251
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Xiaoyu Dai publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Xiaoyu Dai sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 174–193 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 175 publications — 21st percentile

21% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445 175
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Xiaoyu Dai D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Xiaoyu Dai sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 47 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 47 D-Index — 54th percentile

54% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160 47
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

Xiaoyu Dai is affiliated with Hunan University in China, specializing in the fields of Physics and Astronomy as well as Engineering. Their research spans multiple subfields including Atomic and Molecular Physics, and Optics; Electrical and Electronic Engineering; Biomedical Engineering; Materials Chemistry; and Electronic, Optical and Magnetic Materials.

The scientist's work covers a range of topics within modern physics and applied materials science. Key areas of focus include Topological Materials and Phenomena, Photonic Crystals and Applications, Photonic and Optical Devices, Plasmonic and Surface Plasmon Research, Metamaterials and Metasurfaces Applications, 2D Materials and Applications, and Quantum Mechanics and Non-Hermitian Physics.

Notable recent publications by Xiaoyu Dai include:

  • Two-dimensional semiconducting antimonene in nanophotonic applications - A review (2020), Chemical Engineering Journal
  • Recent Advances in Spatial Self-Phase Modulation with 2D Materials and its Applications (2020), Annalen der Physik
  • MXene V2CTx Nanosheet/Bismuth Quantum Dot-Based Heterostructures for Enhanced Flexible Photodetection and Nonlinear Photonics (2023), ACS Applied Nano Materials
  • Broadband nonlinear optical response in GeSe nanoplates and its applications in all-optical diode (2020), Nanophotonics
  • Topological Slow Light Rainbow Trapping and Releasing Based on Gradient Valley Photonic Crystal (2022), Journal of Lightwave Technology

The scientist frequently publishes in several well-known journals and venues including:

  • Optics Letters
  • Journal of Applied Physics
  • Optics Express
  • Biosensors
  • Results in Physics

Xiaoyu Dai collaborates regularly with fellow researchers, with frequent coauthors including Yuanjiang Xiang, Jipeng Wu, Banxian Ruan, and Leyong Jiang. These collaborations have contributed to numerous jointly authored publications and projects within their fields of study.

Best Publications

  • Sensitivity enhancement by using few-layer black phosphorus-graphene/TMDCs heterostructure in surface plasmon resonance biochemical sensor

    Leiming Wu;Jun Guo;Qingkai Wang;Shunbin Lu

  • Few-layer Ti3C2Tx MXene: A promising surface plasmon resonance biosensing material to enhance the sensitivity

    Leiming Wu;Leiming Wu;Qi You;Youxian Shan;Shuaiwen Gan

  • Black-phosphorus-analogue tin monosulfide: an emerging optoelectronic two-dimensional material for high-performance photodetection with improved stability under ambient/harsh conditions

    Weichun Huang;Zhongjian Xie;Taojian Fan;Jiagen Li

  • Facile fabrication and characterization of two-dimensional bismuth(III) sulfide nanosheets for high-performance photodetector applications under ambient conditions

    Weichun Huang;Chenyang Xing;Yunzheng Wang;Zhongjun Li

  • Sensitivity Improved SPR Biosensor Based on the MoS2/Graphene–Aluminum Hybrid Structure

    Leiming Wu;Yue Jia;Leyong Jiang;Jun Guo

  • Critical coupling with graphene-based hyperbolic metamaterials

    Yuanjiang Xiang;Xiaoyu Dai;Jun Guo;Han Zhang

  • Enhanced Photodetection Properties of Tellurium@Selenium Roll-to-Roll Nanotube Heterojunctions.

    Weichun Huang;Ye Zhang;Qi You;Pu Huang

  • Theoretical models for ultrashort electromagnetic pulse propagation in nonlinear metamaterials

    Shuangchun Wen;Yuanjiang Xiang;Xiaoyu Dai;Zhixiang Tang

  • Tunable and multichannel terahertz perfect absorber due to Tamm surface plasmons with graphene

    Xi Wang;Xing Jiang;Qi You;Jun Guo

  • Tuning and Sensitivity Enhancement of Surface Plasmon Resonance Biosensor With Graphene Covered Au-MoS 2-Au Films

    Zhitao Lin;Leyong Jiang;Leiming Wu;Jun Guo

  • Ultrasensitive biosensors based on long-range surface plasmon polariton and dielectric waveguide modes

    Leiming Wu;Jun Guo;Hailin Xu;Xiaoyu Dai

  • Modulation instability induced by nonlinear dispersion in nonlinear metamaterials

    Yuanjiang Xiang;Shuangchun Wen;Xiaoyu Dai;Zhixiang Tang

  • Controllable Raman soliton self-frequency shift in nonlinear metamaterials

    Yuanjiang Xiang;Xiaoyu Dai;Shuangchun Wen;Jun Guo

  • Enhanced spin Hall effect of reflected light with guided-wave surface plasmon resonance

    Yuanjiang Xiang;Xing Jiang;Qi You;Jun Guo

  • Thermally tunable and omnidirectional terahertz photonic bandgap in the one-dimensional photonic crystals containing semiconductor InSb

    Xiaoyu Dai;Yuanjiang Xiang;Shuangchun Wen;Hongying He

  • Low threshold optical bistability at terahertz frequencies with graphene surface plasmons

    Xiaoyu Dai;Leyong Jiang;Yuanjiang Xiang

  • Long-Range Surface Plasmon With Graphene for Enhancing the Sensitivity and Detection Accuracy of Biosensor

    Leiming Wu;Zhitao Ling;Leyong Jiang;Jun Guo

  • Multi-channel perfect absorber based on a one-dimensional topological photonic crystal heterostructure with graphene.

    Xi Wang;Yanzhao Liang;Leiming Wu;Jun Guo

  • Turnable perfect absorption at infrared frequencies by a Graphene-hBN Hyper Crystal.

    Jipeng Wu;Leyong Jiang;Jun Guo;Xiaoyu Dai

  • Tunable optical bistability at the graphene-covered nonlinear interface

    Yuanjiang Xiang;Xiaoyu Dai;Jun Guo;Shuangchun Wen

  • Engineered surface Bloch waves in graphene-based hyperbolic metamaterials

    Yuanjiang Xiang;Jun Guo;Xiaoyu Dai;Shuangchun Wen

  • Modulation instability in nonlinear oppositely directed coupler with a negative-index metamaterial channel.

    Yuanjiang Xiang;Shuangchun Wen;Xiaoyu Dai;Dianyuan Fan

Frequent Co-Authors

Yuanjiang Xiang
Yuanjiang Xiang Hunan University
Shuangchun Wen
Shuangchun Wen Hunan University
Leiming Wu
Leiming Wu Guangdong University of Technology
Dianyuan Fan
Dianyuan Fan Shenzhen University
Han Zhang
Han Zhang Shenzhen University
Weichun Huang
Weichun Huang Nanjing University
Jianqing Li
Jianqing Li Macau University of Science and Technology
Dingyuan Tang
Dingyuan Tang Nanyang Technological University
Jun Guo
Jun Guo Peking University
Xiuwen Zhang
Xiuwen Zhang University of Colorado Boulder

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