The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Geoffrey F. Strouse sits on this spectrum.
This scientist: 191 publications — 29th percentile
29% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Geoffrey F. Strouse sits on this spectrum.
This scientist: 56 D-Index — 36th percentile
36% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Geoffrey F. Strouse is affiliated with Florida State University in the United States and has contributed extensively to the fields of Materials Science and Engineering. Their research primarily focuses on the intersection of materials chemistry and applied physics, with significant attention to nanomaterials and optoelectronic properties.
Their work covers several key subfields including Materials Chemistry, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Atomic and Molecular Physics, and Optics.
Among the main topics addressed in their studies are:
Some of the notable recent papers include:
Frequent publication venues for Strouse include:
They have collaborated repeatedly with several coauthors, including:
Geoffrey F. Strouse's research contributions span complex materials synthesis and characterization techniques, with applications relevant to energy conversion, photon upconversion, and nanoparticle synthesis. Their work integrates advanced chemical methodologies with physical principles pertinent to modern materials science challenges.
P. Michler;A. Imamoğlu;M. D. Mason;P. J. Carson
Yun Cs;Javier A;Jennings T;Fisher M
Jeffrey A. Gerbec;Donny Magana;and Aaron Washington;Geoffrey F. Strouse
T. L. Jennings;M. P. Singh;G. F. Strouse
Scott L. Cumberland;Khalid M. Hanif;Artjay Javier;Gregory A. Khitrov
B. I. Swanson;J. A. Brozik;S. P. Love;G. F. Strouse
Geoffrey F. Strouse;Jon R. Schoonover;Richard Duesing;Stephen Boyde
Khalid M. Hanif;Robert W. Meulenberg;Geoffrey F. Strouse
Qilin Dai;Megan E. Foley;Christopher J. Breshike;Adrian Lita
Mani Prabha Singh;Geoffrey F. Strouse
Aaron L. Washington;Geoffrey F. Strouse
Donny Magana;Susanthri C Perera;Andrew G Harter;Naresh S Dalal
Yi Cheng;P. Xiong;C. Steven Yun;G. F. Strouse
Peter A. Anderson;Peter A. Anderson;Geoffrey F. Strouse;Geoffrey F. Strouse;Joseph A. Treadway;Joseph A. Treadway;F. Richard Keene;F. Richard Keene
Mia G. Berrettini;Gary Braun;Jerry G. Hu;Geoffrey F. Strouse
S. L. Cumberland and;G. F. Strouse
Orlando E. Raola;Geoffrey F. Strouse
Robert W. Meulenberg;Travis Jennings;Geoffrey F. Strouse
Peter A. Anderson;F. Richard Keene;Thomas J. Meyer;John A. Moss
Jon R. Schoonover;Geoffrey F. Strouse
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