The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where F. Dean Toste sits on this spectrum.
This scientist: 453 publications — 85th percentile
85% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where F. Dean Toste sits on this spectrum.
This scientist: 151 D-Index — 99th percentile
99% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
F. Dean Toste is affiliated with the University of California, Berkeley in the United States. Their research primarily spans the fields of Chemistry and Materials Science, with significant contributions in subfields such as Organic Chemistry, Materials Chemistry, Molecular Biology, Electrical and Electronic Engineering, and Renewable Energy, Sustainability and the Environment.
The scientist's work encompasses a variety of topics including:
Toste's contributions are published extensively in several scientific journals. The most frequent publication venues include:
Selected recent papers by F. Dean Toste feature work published between 2020 and 2021. These include:
Frequent collaborators in F. Dean Toste's research include Kenneth N. Raymond, Robert G. Bergman, Matthew S. Sigman, Christopher J. Chang, and Elad Gross.
F. Dean Toste has been recognized by membership and fellowship in notable scientific organizations. They became a Member of the National Academy of Sciences in 2020 and a Fellow of the American Academy of Arts and Sciences in 2018.
David J. Gorin;Benjamin D. Sherry;F. Dean Toste
David J. Gorin;F. Dean Toste
Xiaoyu Yang;Tao Wu;Robert J. Phipps;F. Dean Toste
Casey J. Brown;F. Dean Toste;Robert G. Bergman;Robert G. Bergman;Kenneth N. Raymond;Kenneth N. Raymond
Gregory L. Hamilton;Eun Joo Kang;Miriam;F. Dean Toste
Andrew J. Neel;Andrew J. Neel;Andrew J. Neel;Margaret J. Hilton;Matthew S. Sigman;F. Dean Toste;F. Dean Toste
Robert J. Phipps;Gregory L. Hamilton;F. Dean Toste
Yi Zhu;Jianlin Han;Jiandong Wang;Norio Shibata
Vivek Rauniyar;Aaron D. Lackner;Gregory L. Hamilton;F. Dean Toste
Weiwei Zi;F. Dean Toste
Magnus J. Johansson;David J. Gorin;Steven T. Staben;F. Dean Toste
David J. Gorin;Nicole R. Davis;F. Dean Toste
Joshua J. Kennedy-Smith;Steven T. Staben;F. Dean Toste
Rebecca L. LaLonde;Benjamin D. Sherry;Eun Joo Kang;F. Dean Toste
Diego Benitez;Nathan D. Shapiro;Ekaterina Tkatchouk;Yiming Wang
Yi-Ming Wang;Aaron D. Lackner;F. Dean Toste
Shixian Lin;Xiaoyu Yang;Xiaoyu Yang;Shang Jia;Amy M. Weeks
Xiaodong Shi;David J. Gorin;F. Dean Toste
David M. Kaphan;David M. Kaphan;Mark D. Levin;Robert G. Bergman;Robert G. Bergman;Kenneth N. Raymond;Kenneth N. Raymond
Sunghee Son;F. Dean Toste
Z. Jane Wang;Kristen N. Clary;Robert G. Bergman;Kenneth N. Raymond
Xing-zhong Shu;Xing-zhong Shu;Miao Zhang;Ying He;Ying He;Ying He;Heinz Frei
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