World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
47
Citations
7791
World Ranking
15656
National Ranking
39

Alison J. Downard publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Alison J. Downard sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 158 publications — 17th percentile

17% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Alison J. Downard D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Alison J. Downard sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 47 D-Index — 14th percentile

14% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Research.com Recognitions

  • 2014 - Fellow of the Royal Society of New Zealand

Overview

Alison J. Downard is affiliated with the University of Canterbury in New Zealand and has conducted research primarily in the fields of Materials Science and Engineering. Their work intersects several subfields including Materials Chemistry, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Electrochemistry.

Their research topics emphasize areas such as ZnO doping and properties, Ga2O3 and related materials, Molecular Junctions and Nanostructures, Advanced Photocatalysis Techniques, Electrochemical Analysis and Applications, Quantum Dots Synthesis and Properties, and Conducting Polymers and Applications.

Downard has published across multiple scientific venues. Frequent publication outlets include:

  • ACS Applied Electronic Materials
  • Physical review. B./Physical review. B
  • ACS Applied Materials & Interfaces
  • Electrochimica Acta
  • Small

The most recent papers by Alison J. Downard are:

  • "Relationship between the hydroxyl termination and band bending at (201) β−Ga2O3 surfaces", 2020, Physical review. B./Physical review. B
  • "Building Tailored Interfaces through Covalent Coupling Reactions at Layers Grafted from Aryldiazonium Salts", 2021, ACS Applied Materials & Interfaces
  • "Single fibre electrode measurements - A versatile strategy for assessing the non-uniform kinetics at carbon felt electrodes", 2020, Electrochimica Acta
  • "Bidirectional Control of the Band Bending at the (201) and (010) Surfaces of β-Ga2O3 Using Aryldiazonium Ion and Phosphonic Acid Grafting", 2021, ACS Applied Electronic Materials
  • "Looking Outside the Square: The Growth, Structure, and Resilient Two-Dimensional Surface Electron Gas of Square SnO2 Nanotubes", 2023, Small

They have collaborated extensively with a set of frequent co-authors who have contributed to multiple publications alongside them. These co-authors include:

  • Roger J. Reeves
  • Martin Allen
  • Liam R. Carroll
  • Rodrigo M. Gazoni
  • Jonty I. Scott

In recognition of their contributions, Alison J. Downard was awarded the title of Fellow of the Royal Society of New Zealand in 2014.

Best Publications

  • Electrochemically Assisted Covalent Modification of Carbon Electrodes

    Alison J. Downard

  • Electrochemical and atomic force microscopy study of carbon surface modification via diazonium reduction in aqueous and acetonitrile solutions.

    Paula A. Brooksby;Alison J. Downard

  • Covalent modification of carbon electrodes for voltammetric differentiation of dopamine and ascorbic acid

    Alison J. Downard;Alisa D. Roddick;Alan M. Bond

  • Covalent modification of graphitic carbon substrates by non-electrochemical methods

    Frédéric Barrière;Alison J. Downard

  • Atomic force microscopy characterization of the surface wettability of natural fibres

    Alexis Pietak;Sandra Korte;Emelyn Tan;Alison Downard

  • An Electrochemical and XPS Study of Reduction of Nitrophenyl Films Covalently Grafted to Planar Carbon Surfaces

    Samuel S. C. Yu;Emelyn S. Q. Tan;Reuben T. Jane;Alison J. Downard

  • Multilayer nitroazobenzene films covalently attached to carbon. An AFM and electrochemical study.

    Paula A. Brooksby;Alison J. Downard

  • A study of the conditions for the electrodeposition of polythiophen in acetonitrile

    Unknown

  • The influence of water on the electrodeposition of polypyrrole in acetonitrile

    Unknown

  • Electrografting via Diazonium Chemistry: The Key Role of the Aryl Substituent in the Layer Growth Mechanism

    Thibaud Menanteau;Marylène Dias;Eric Levillain;Alison J. Downard

  • Potential-Dependence of Self-Limited Films Formed by Reduction of Aryldiazonium Salts at Glassy Carbon Electrodes

    Alison J. Downard

  • Dinuclear copper(II) and polymeric tetranuclear copper(II) and copper(II)-copper(I) complexes of macrocyclic ligands capable of forming endogenous alkoxide and phenoxide bridges. Structural, magnetic, and electrochemical studies

    Santokh S. Tandon;Laurence K. Thompson;John N. Bridson;Vickie McKee

  • Detection of two distinct substrate-dependent catabolic responses in yeast cells using a mediated electrochemical method.

    K. H. R. Baronian;A. J. Downard;R. K. Lowen;N. Pasco

  • Protein adsorption at glassy carbon electrodes: The effect of covalently bound surface groups

    Alison J. Downard;Alisa D. Roddick

  • Nanoscale Patterning of Flat Carbon Surfaces by Scanning Probe Lithography and Electrochemistry

    Paula A. Brooksby;Alison J. Downard

  • Grafting Aryl Diazonium Cations to Polycrystalline Gold: Insights into Film Structure Using Gold Oxide Reduction, Redox Probe Electrochemistry, and Contact Angle Behavior

    Matthew G. Paulik;Paula A. Brooksby;and Andrew D. Abell;Alison J. Downard

  • Reaction of gold substrates with diazonium salts in acidic solution at open-circuit potential.

    Joshua Lehr;Joshua Lehr;Bryce E. Williamson;Benjamin S. Flavel;Alison J. Downard;Alison J. Downard

  • Development and application of the diffusive gradients in thin films technique for the measurement of total dissolved inorganic arsenic in waters

    Jared G. Panther;Kathryn P. Stillwell;Kipton J. Powell;Alison J. Downard

  • Electrocatalytic reduction of carbon dioxide based on 2,2'-bipyridyl complexes of osmium

    Mitchell R. M. Bruce;Elise Megehee;B. Patrick Sullivan;H. Holden Thorp

  • Electrochemical detection of intracellular and cell membrane redox systems in Saccharomyces cerevisiae

    Frankie J. Rawson;Alison J. Downard;Keith H. Baronian

  • Improved stability of redox enzyme layers on glassy carbon electrodes via covalent grafting

    Marie Pellissier;Frédéric Barrière;Alison J. Downard;Dónal Leech

  • Evidence of monolayer formation via diazonium grafting with a radical scavenger: electrochemical, AFM and XPS monitoring

    T. Menanteau;E. Levillain;A. J. Downard;T. Breton

Frequent Co-Authors

Philippe Hapiot
Philippe Hapiot University of Rennes
Peter J. Steel
Peter J. Steel University of Canterbury
Brian H. Robinson
Brian H. Robinson University of Otago
Vickie McKee
Vickie McKee Dublin City University
Alan M. Bond
Alan M. Bond Monash University
Dónal Leech
Dónal Leech University of Galway
Eric Levillain
Eric Levillain University of Angers
Joseph G. Shapter
Joseph G. Shapter University of Queensland
Thomas Nann
Thomas Nann University of Newcastle Australia
Robert A. W. Dryfe
Robert A. W. Dryfe University of Manchester

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