0142-2421
Published by: Wiley
https://analyticalsciencejournals.onlinelibrary.wiley.com/journal/10969918
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 508 | 108 | 126 | 11 |
| Chemistry | 642 | 60 | 99 | 11 |
The journal investigates studies in Analytical chemistry, X-ray photoelectron spectroscopy, Metallurgy, Chemical engineering and Thin film. The Analytical chemistry works featured in the journal incorporate elements from Ion, Oxide, Silicon and Sputtering. The study on Ion presented in it intersects with subjects under the field of Atomic physics.
Surface and Interface Analysis explores topics in X-ray photoelectron spectroscopy which can be helpful for research in disciplines like Inorganic chemistry, Polymer, Spectral line, Metal and Auger electron spectroscopy. The work on Inorganic chemistry tackled in it brings together disciplines like Catalysis and Adsorption. The journal investigates Auger electron spectroscopy research which frequently intersects with Auger.
It focuses on Metallurgy as well as the interrelated topic of Coating. Many of the studies tackled connect Thin film with a similar field of study like Substrate (electronics).
The journal articles are organized to reinforce research efforts on Analytical chemistry, X-ray photoelectron spectroscopy, Inorganic chemistry, Oxide and Chemical engineering. The subject of Polymer, which is connected to the field of Polymer chemistry, serves as the foundation of the Analytical chemistry research featured in the published papers. The most cited articles with studies in X-ray photoelectron spectroscopy featured incorporate elements of Spectral line, Metallurgy, Metal, Oxygen and Binding energy.
Surface and Interface Analysis mainly tackles studies in Chemical engineering, X-ray photoelectron spectroscopy, Composite material, Optoelectronics and Analytical chemistry. The journal tackles studies in Characterization (materials science) and the interrelated subject of Carbon nanotube and Morphology (linguistics) to gain insights into Chemical engineering. Electron spectroscopy is a primary topic of X-ray photoelectron spectroscopy research in it.
The Composite material works featured in the journal incorporate elements from Lithium-ion battery and Electrical resistivity and conductivity. The research on Optoelectronics tackled can also make contributions to studies in the areas of Interface (computing), Sputter deposition and Nanostructure. Surface and Interface Analysis focuses on Analytical chemistry but sometimes tackles the closely related topic of Thin film which is concerned with Titanium dioxide.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Surface and Interface Analysis (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Surface and Interface Analysis (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 4.84% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 11.02% were posted by at least one author from the top 10 institutions publishing in the journal. Another 3.39% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 5.93% of all publications and 79.66% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Leena‐Sisko Johansson;Joseph M. Campbell;Orlando J. Rojas
(2020)Behnam Moeini;Matthew R. Linford;Neal Fairley;Anders Barlow
(2021)Sebastian Siol;Jennifer Mann;John Newman;Takuya Miyayama
(2020)Chong Ding;Yihe Zhang;Na Zhang;Xinke Wang
(2020)Akari Hiji;Takao Hanawa;Takao Hanawa;Masaya Shimabukuro;Peng Chen
(2021)Yingdan Zhu;Yingdan Zhu;Yunyun Ma;Chun Yan;Haibing Xu
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