The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Rupert F. Oulton sits on this spectrum.
This scientist: 198 publications — 29th percentile
29% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Rupert F. Oulton sits on this spectrum.
This scientist: 50 D-Index — 60th percentile
60% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Rupert F. Oulton is affiliated with Imperial College London in the United Kingdom, with research contributions primarily in physics, astronomy, and engineering fields. Their work bridges several subfields including atomic and molecular physics, optics, biomedical engineering, electrical and electronic engineering, materials chemistry, and artificial intelligence.
Their research topics notably cover plasmonic and surface plasmon phenomena, photonic and optical devices, strong light-matter interactions, quantum information and cryptography, synthesis and applications of gold and silver nanoparticles, mechanical and optical resonators, as well as photonic crystals and related applications.
Rupert F. Oulton's publication record includes several recent papers spanning from 2020 to 2024. Noteworthy papers include:
They have collaborated frequently with several coauthors, including:
The scientist's work appears in a range of publication venues, with the most frequent being:
Xiang Zhang;Volker Jendrik Sorger;Rupert Francis Maximillian Oulton;Ren-Min Ma
R. F. Oulton;V. J. Sorger;D. A. Genov;D. F. P. Pile
Viktoryia Shautsova;Viktoryia Shautsova;Themistoklis Sidiropoulos;Xiaofei Xiao;Nicholas A. Güsken
Renmin Ma;Rupert Oulton;Volker Sorger;Guy Bartal
O. Hess;J. B. Pendry;S. A. Maier;R. F. Oulton
Ren-Min Ma;Rupert F Oulton;Volker J Sorger;Xiang Zhang
Martín Caldarola;Pablo Albella;Emiliano Cortés;Mohsen Rahmani
Ren-Min Ma;Rupert F. Oulton
Gustavo Grinblat;Yi Li;Michael P. Nielsen;Rupert F. Oulton
Rupert Oulton;G Bartal;David Pile;Xiang Zhang;Xiang Zhang
Volker J. Sorger;Rupert F. Oulton;Ren-Min Ma;Xiang Zhang
Themistoklis P. H. Sidiropoulos;Robert Röder;Sebastian Geburt;Ortwin Hess
Ren-Min Ma;Rupert F. Oulton;Rupert F. Oulton;Volker J. Sorger;Xiang Zhang;Xiang Zhang
Suo Wang;Xing-Yuan Wang;Bo Li;Hua-Zhou Chen
Shaimaa I. Azzam;Alexander V. Kildishev;Ren Min Ma;Cun Zheng Ning;Cun Zheng Ning
Volker J. Sorger;Ziliang Ye;Rupert F. Oulton;Yuan Wang
Gustavo Grinblat;Yi Li;Michael P. Nielsen;Rupert F. Oulton
Xiaodong Yang;Yongmin Liu;Rupert F. Oulton;Xiaobo Yin
Heykel Aouani;Miguel Navarro-Cia;Miguel Navarro-Cia;Mohsen Rahmani;Mohsen Rahmani;Themistoklis P. H. Sidiropoulos
Thomas Zentgraf;Thomas Zentgraf;Shuang Zhang;Rupert F. Oulton;Xiang Zhang;Xiang Zhang
Themistoklis P. H. Sidiropoulos;Robert Roder;Sebastian Geburt;Ortwin Hess
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