World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
32
Citations
3958
World Ranking
6358
National Ranking
2095

Best Publications

  • Radiation Effects in MOS Capacitors with Very Thin Oxides at 80°K

    Unknown

  • Interface trap profile near the band edges at the 4H-SiC/SiO2 interface

    N. S. Saks;S. S. Mani;A. K. Agarwal

  • Lateral distribution of hot-carrier-induced interface traps in MOSFETs

    M.G. Ancona;N.S. Saks;D. McCarthy

  • Interface trap formation via the two-stage H/sup +/ process

    Unknown

  • Hall mobility and free electron density at the SiC/SiO2 interface in 4H–SiC

    Unknown

  • Determination of interface trap capture cross sections using three-level charge pumping

    N.S. Saks;M.G. Ancona

  • Time dependence of radiation-induced interface trap formation in metal-oxide-semiconductor devices as a function of oxide thickness and applied field

    Unknown

  • Formation of interface traps in MOSFETs during annealing following low temperature irradiation

    N.S. Saks;R.B. Klein;D.L. Griscom

  • Time dependence of interface trap formation in MOSFETs following pulsed irradiation

    Unknown

  • Evaluation of hot carrier degradation of N-channel MOSFET's with the charge pumping technique

    P. Heremans;H.E. Maes;N. Saks

  • Observation of hot-hole injection in NMOS transistors using a modified floating-gate technique

    N.S. Saks;P.L. Heremans;L. van den Hove;H.E. Maes

  • Observation of H/sup +/ motion during interface trap formation

    Unknown

  • Investigation of Lateral RESURF, 6H-SiC MOSFETs

    Anant K. Agarwal;N.S. Saks;S.S. Mani;V.S. Hegde

  • 10 A, 2.4 kV Power DiMOSFETs in 4H-SiC

    Sei-Hyung Ryu;A. Agarwal;J. Richmond;J. Palmour

  • Using the Hall effect to measure interface trap densities in silicon carbide and silicon metal-oxide-semiconductor devices

    N. S. Saks;M. G. Ancona;R. W. Rendell

  • Low-dose aluminum and boron implants in 4H and 6H silicon carbide

    N. S. Saks;A. K. Agarwal;S. H. Ryu;J. W. Palmour

  • Generation of Interface States by Ionizing Radiation at 80K Measured by Charge Pumping and Subthreshold Slope Techniques

    Unknown

  • Characterization of individual interface traps with charge pumping

    N. S. Saks;G. Groeseneken;I. DeWolf

  • Theory and measurement of quantization effects on SiSiO2 interface trap modeling

    R.R. Siergiej;M.H. White;N.S. Saks

  • Nature of Radiation-Induced Point Defects in Amorphous SiO2 and their Role in SiO2-ON-Si Structures

    Unknown

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