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Mark A. Hempenius

Mark A. Hempenius

D-Index & Metrics

Chemistry

D-Index
43
Citations
5331
World Ranking
17359
National Ranking
294

Overview

Mark A. Hempenius is affiliated with the University of Twente in the Netherlands. Their research primarily intersects the fields of Materials Science and Engineering, with a focus on polymers and biomaterials.

The main topics covered in their work include:

  • Biodegradable polymer synthesis and properties
  • Polymer surface interaction studies
  • Carbon dioxide utilization in catalysis
  • Force microscopy techniques and applications
  • Adhesion, friction, and surface interactions
  • Membrane separation technologies
  • Synthesis and properties of polymers

Hempenius has contributed extensively to several subfields such as Polymers and Plastics, Biomedical Engineering, Organic Chemistry, Biomaterials, and Surfaces, Coatings and Films.

Their recent publications illustrate a range of studies in polymer science and surface interactions, including:

  • Layer-by-Layer Printing of Photopolymers in 3D: How Weak is the Interface? (2020), ACS Applied Materials & Interfaces
  • Extraction of low molecular weight polyhydroxyalkanoates from mixed microbial cultures using bio-based solvents (2022), Separation and Purification Technology
  • Swelling of Poly(methyl acrylate) Brushes in Acetone Vapor (2020), Langmuir
  • Creating Anti-Biofouling Surfaces by Degradable Main-chain Polyphosphoester Polymer Brushes (2024), Advanced Functional Materials
  • Network Mesh Nanostructures in Cross-Linked Poly(Dimethylsiloxane) Visualized by AFM (2020), Macromolecular Chemistry and Physics

Common publication venues include:

  • Separation and Purification Technology
  • ACS Applied Polymer Materials
  • ACS Applied Materials & Interfaces
  • Advanced Functional Materials
  • Langmuir

Frequent co-authors collaborating with Hempenius are:

  • G. Julius Vancsó
  • Nieck E. Benes
  • Hubert Gojżewski
  • Maria Brió Pérez
  • Sissi de Beer

Best Publications

  • Redox-controlled molecular permeability of composite-wall microcapsules.

    Y. Ma;Wen-Fei Dong;Mark A. Hempenius;Helmuth Möhwald

  • Nanostructured Thin Films of Organic–Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching

    Rob G.H. Lammertink;Mark A. Hempenius;J.E. van den Enk;V.Z.H. Chan

  • Polymers in conventional and alternative lithography for the fabrication of nanostructures

    Canet Acikgoz;Mark A. Hempenius;Jurriaan Huskens;G. Julius Vancso

  • A polystyrene-oligothiophene-polystyrene triblock copolymer

    Mark A. Hempenius;Bea M. W. Langeveld-Voss;John A. E. H. van Haare;Rene A. J. Janssen

  • Organometallic Block Copolymers as Catalyst Precursors for Templated Carbon Nanotube Growth

    Christian Hinderling;Yanki Keles;Thomas Stöckli;Helmut F. Knapp

  • Janus Particles with Controllable Patchiness and Their Chemical Functionalization and Supramolecular Assembly

    Xing Yi Ling;Xing Yi Ling;In Yee Phang;Canet Acikgoz;M. Deniz Yilmaz

  • Redox active gels: synthesis, structures and applications

    Xiaofeng Sui;Xueling Feng;Mark A. Hempenius;G. Julius Vancso

  • Poly(ferrocenyldimethylsilanes) for Reactive Ion Etch Barrier Applications

    Rob G.H. Lammertink;Mark A. Hempenius;V.Z.H. Chan;E.L. Thomas

  • Poly(ferrocenylsilane) Gels and Hydrogels with Redox-Controlled Actuation.

    Mark A. Hempenius;Concetta Cirmi;Fabio Lo Savio;Jing Song

  • Periodic organic-organometallic microdomain structures in poly(styrene-block-ferrocenyldimethylsilane) copolymers and blends with corresponding homopolymers

    Rob G. H. Lammertink;Mark A. Hempenius;Edwin L. Thomas;G. Julius Vancso

  • Probing the Collapse Dynamics of Poly(N‐isopropylacrylamide) Brushes by AFM: Effects of Co‐nonsolvency and Grafting Densities

    Xiaofeng Sui;Qi Chen;Mark A. Hempenius;G. Julius Vancso

  • Redox-Active Cross-Linkable Poly(ionic liquid)s

    Xiaofeng Sui;Mark A. Hempenius;G. Julius Vancso

  • Surface Nano- and Microstructuring with Organometallic Polymers

    Igor Korczagin;Rob G. H. Lammertink;Mark A. Hempenius;Steffi Golze

  • Crystallization and Melting Behavior of Poly(ferrocenyldimethylsilanes) Obtained by Anionic Polymerization

    Rob G.H. Lammertink;Mark A. Hempenius;Ian Manners;G. Julius Vancso

  • Breathing pores on command: redox-responsive spongy membranes from poly(ferrocenylsilane)s.

    Kaihuan Zhang;Xueling Feng;Xiaofeng Sui;Mark A. Hempenius

  • Symmetry Control of Polymer Colloidal Monolayers and Crystals by Electrophoretic Deposition on Patterned Surfaces

    N. Dziomkina;Mark A. Hempenius;Gyula J. Vancso

  • Layer-by-Layer Printing of Photopolymers in 3D: How Weak is the Interface?

    H. Gojzewski;H. Gojzewski;Z. Guo;W. Grzelachowska;W. Grzelachowska;M. G. Ridwan;M. G. Ridwan

  • Observations on the permeation performance of solvent resistant nanofiltration membranes

    Dimitrios Stamatialis;N. Stafie;K. Buadu;Mark A. Hempenius

  • Electrochemistry of surface-grafted stimulus-responsive monolayers of poly(ferrocenyldimethylsilane) on gold

    Mária Peter;Rob G.H. Lammertink;Mark A. Hempenius;G. Julius Vancso

  • Synthesis and Characterization of Anionic and Cationic Poly(ferrocenylsilane) Polyelectrolytes

    Mark A. Hempenius;F.F. Brito;Gyula J. Vancso

  • Arborescent graft polybutadienes

    Mark A. Hempenius;Walter Michelberger;Martin Möller

  • Ultra-thin hybrid polyhedral silsesquioxane-polyamide films with potentially unlimited 2D dimensions

    Mayur Dalwani;Jumeng Zheng;Mark Hempenius;Michiel J. T. Raaijmakers

  • Synthesis of Poly(ferrocenylsilane) Polyelectrolyte Hydrogels with Redox Controlled Swelling

    Mark A. Hempenius;Concetta Cirmi;Jing Song;G. Julius Vancso

  • Poly(N-isopropylacrylamide)–poly(ferrocenylsilane) dual-responsive hydrogels: synthesis, characterization and antimicrobial applications

    Xiaofeng Sui;Xueling Feng;Andrea Di Luca;Clemens A. van Blitterswijk

  • Self-assembly of poly(ferrocenyldimethylsilane-b-methyl methacrylate) block copolymers in a selective solvent

    Igor Korczagin;Mark A. Hempenius;Remco G. Fokkink;Martien A. Cohen Stuart

Frequent Co-Authors

G. Julius Vancso
G. Julius Vancso University of Twente
Xiaofeng Sui
Xiaofeng Sui Donghua University
Rob G.H. Lammertink
Rob G.H. Lammertink University of Twente
Wen-Fei Dong
Wen-Fei Dong Chinese Academy of Sciences
Jurriaan Huskens
Jurriaan Huskens University of Twente
Albert van den Berg
Albert van den Berg University of Twente
Helmuth Möhwald
Helmuth Möhwald Max Planck Institute of Colloids and Interfaces
Holger Schönherr
Holger Schönherr University of Siegen
Edmondo M. Benetti
Edmondo M. Benetti Swiss Federal Laboratories for Materials Science and Technology
Xing Yi Ling
Xing Yi Ling Nanyang Technological University

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