The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where David A. Schiraldi sits on this spectrum.
This scientist: 254 publications — 48th percentile
48% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where David A. Schiraldi sits on this spectrum.
This scientist: 65 D-Index — 57th percentile
57% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
David A. Schiraldi is affiliated with Case Western Reserve University in the United States. Their research primarily falls within the fields of Materials Science and Chemistry, with a particular focus on Polymers and Plastics, Biomaterials, Spectroscopy, Surfaces, Coatings and Films, and Safety, Risk, Reliability and Quality.
Their work covers several main topics, including:
David A. Schiraldi has contributed to research published in several venues, with frequent publications in:
Recent papers associated with or related to their work include:
Frequent co-authors who have collaborated with David A. Schiraldi include Molin Guo, Mingze Sun, Yu-Tao Wang, Hua Sun, and Yu-Zhong Wang. These collaborations have contributed to various research outputs within the domains of flame retardant materials, aerogels, and biodegradable polymers.
In recognition of contributions to the chemical sciences, David A. Schiraldi was named a Fellow of the American Chemical Society in 2013.
Satish Kumar;Harit Doshi;Mohan Srinivasarao;Jung O Park
Cher H. Davis;Lon J. Mathias;Jeffrey W. Gilman;David A. Schiraldi
Yiqiang Zhao;David A. Schiraldi
Jijun Zeng;Bethany Saltysiak;W.S. Johnson;David A. Schiraldi
Hongming Ma;Jijun Zeng;Mary Lynn Realff;Satish Kumar
Abhishek Guha;Weijie Lu;Thomas A. Zawodzinski;David A. Schiraldi
Hong-Bing Chen;Peng Shen;Ming-Jun Chen;Hai-Bo Zhao
D. J. Sekelik;E. V. Stepanov;S. Nazarenko;D. Schiraldi
Ke Shang;Wang Liao;Juan Wang;Yu-Tao Wang
Matthew D. Gawryla;Otto van den Berg;Christoph Weder;David A. Schiraldi
Chun Zhou;Miguel A. Guerra;‡ Zai-Ming Qiu;and Thomas A. Zawodzinski
Hong-Bing Chen;Yu-Zhong Wang;David A. Schiraldi
Hong-Bing Chen;Hong-Bing Chen;Bor-Sen Chiou;Yu-Zhong Wang;David A. Schiraldi
S. R. Hostler;Alexis R Abramson;M. D. Gawryla;S. A. Bandi
Jeffrey R. Jones;Charles L. Liotta;David M. Collard;David A. Schiraldi
Hong-Bing Chen;Hong-Bing Chen;Yu-Zhong Wang;Miguel Sánchez-Soto;David A. Schiraldi
Suneel Bandi;David A. Schiraldi
David A. Schiraldi
Y.S. Hu;V. Prattipati;S. Mehta;D.A. Schiraldi
Suneel Bandi;Margaret Bell;David A. Schiraldi
Richard G. Finke;David A. Schiraldi;Barbara J. Mayer
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