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ACM

IEEE/ACM International Symposium on Microarchitecture (MICRO)

Location: Chicago , United States

Conference dates: 10/1/2022 - 10/5/2022

Research H-index
39

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 34 46 68 20
Computer Science 41 157 255 39

Call for Papers

We invite original paper submissions related to (but not limited to) the following topics:
Processor, memory, and storage architectures
Multicore and multiprocessor systems
Instruction-, thread-, and data-level parallelism
Cloud and datacenter-scale computing
IoT, mobile, and embedded architecture
Interconnection network, router, and network interface architecture
Accelerator-based, application-specific, and reconfigurable architectures
Architectural support for programming languages or software development
Architectural support for security and privacy
Architectural support for virtualization
Architectures for emerging technologies and applications
Architectural support for non-volatile/persistent memory
Quantum computing
In-/near-memory or in-/near-storage processing
Approximate computing and architectural support for approximation
Dependable processor and system architecture
Effects of circuits and technology on architecture
Architecture modeling and simulation methodologies
Evaluation and measurement of real computing systems

Overview

This ranking provides a comprehensive evaluation of scientific conferences in the field of Electronics and Electrical Engineering, leveraging extensive bibliometric analysis to ensure the highest level of accuracy and objectivity. Compiled by Research.com, a leading website recognized for delivering trusted data on scientific achievements in all major research domains since 2014, this ranking offers authoritative insights for researchers, academics, and professionals.

The positions in this ranking are determined using a unique bibliometric score developed by Research.com. This score incorporates two key factors: the estimated h-index and the number of leading scientists who have contributed to the conference over the previous three years. This dual-criteria approach ensures a nuanced assessment that reflects both the scholarly impact and the caliber of contributors associated with each event.

The ranking features Impact Score values collected as of 2024-11-27, guaranteeing that the data reflect the most current trends and achievements within the domain. The evaluation process included the meticulous examination of more than 2,204 conferences, selected following careful scrutiny and rigorous analysis of over 95,378 scientific documents published in the last three years by 6,160 distinguished and widely respected scientists specializing in Electronics and Electrical Engineering.

For a detailed explanation of the methodology employed to compute the ranking scores, including the data sources, scoring formula, and criteria for inclusion, please visit our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at International Symposium on Microarchitecture (based on the number of publications) are:

  • Yale N. Patt (51 papers) published 2 papers at the last edition, 1 more than at the previous edition,
  • Onur Mutlu (43 papers) published 6 papers at the last edition, 2 more than at the previous edition,
  • Scott Mahlke (37 papers) absent at the last edition,
  • Wen-mei W. Hwu (36 papers) absent at the last edition,
  • Josep Torrellas (32 papers) published 1 paper at the last edition, 3 less than at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at International Symposium on Microarchitecture (based on the number of publications) are:

  • Intel (132 papers) published 10 papers at the last edition, 2 more than at the previous edition,
  • University of Michigan (113 papers) published 8 papers at the last edition, 4 more than at the previous edition,
  • University of Illinois at Urbana–Champaign (108 papers) published 5 papers at the last edition, 4 less than at the previous edition,
  • University of Wisconsin-Madison (80 papers) published 3 papers at the last edition, 2 more than at the previous edition,
  • IBM (65 papers) published 1 paper at the last edition, 2 less than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 5.43% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 24.59% were posted by at least one author from the top 10 institutions publishing at the conference. Another 18.03% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 27.87% of all publications and 29.51% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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