World's Best Scientists 2026 revealed!
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Wolfgang E. S. Unger

D-Index & Metrics

Chemistry

D-Index
52
Citations
8587
World Ranking
13625
National Ranking
1005

Wolfgang E. S. Unger publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Wolfgang E. S. Unger sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 281 publications — 58th percentile

58% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Wolfgang E. S. Unger D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Wolfgang E. S. Unger sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 52 D-Index — 26th percentile

26% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Wolfgang E. S. Unger is affiliated with the Federal Institute For Materials Research and Testing in Germany. Their research contributions focus primarily on materials science and engineering, with a strong emphasis on materials chemistry, surfaces, coatings and films, and biomedical engineering. They also explore aspects of electrical and electronic engineering as well as computational mechanics.

The scientist's work spans multiple specialized topics including electron and X-ray spectroscopy techniques, graphene and nanomaterials applications, advancements in photolithography techniques, ion-surface interactions and analysis, X-ray spectroscopy and fluorescence analysis, advanced electron microscopy techniques and applications, and the electronic and structural properties of oxides.

Wolfgang E. S. Unger has published in various scientific venues, with frequent appearances in:

  • Surface and Interface Analysis
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • The Journal of Physical Chemistry C
  • Zenodo (CERN European Organization for Nuclear Research)
  • The Cambridge Structural Database

Co-authorship is a notable part of Unger's scholarly activity. Frequent collaborators include Anja Müller, Ievgen S. Donskyi, Jörg Radnik, Mohsen Adeli, and Marit Kjærvik.

Selected recent publications illustrate the scope and variety of their research:

  • "NanoSolveIT Project: Driving nanoinformatics research to develop innovative and integrated tools for in silico nanosafety assessment," 2020, Computational and Structural Biotechnology Journal
  • "Graphene Oxide-Cyclic R10 Peptide Nuclear Translocation Nanoplatforms for the Surmounting of Multiple-Drug Resistance," 2020, Advanced Functional Materials
  • "Metal-Assisted and Solvent-Mediated Synthesis of Two-Dimensional Triazine Structures on Gram Scale," 2020, Journal of the American Chemical Society
  • "Application of near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) in an in-situ analysis of the stability of the surface-supported metal-organic framework HKUST-1 in water, methanol and pyridine atmospheres," 2021, Journal of Electron Spectroscopy and Related Phenomena
  • "Combining HR-TEM and XPS to elucidate the core-shell structure of ultrabright CdSe/CdS semiconductor quantum dots," 2020, Scientific Reports

Best Publications

  • XPS and NEXAFS studies of aliphatic and aromatic amine species on functionalized surfaces

    Nora Graf;Eda Yegen;Thomas Gross;Andreas Lippitz

  • ESCA, XRD, and IR Characterization of Aluminum Oxide, Hydroxyfluoride, and Fluoride Surfaces in Correlation with Their Catalytic Activity in Heterogeneous Halogen Exchange Reactions

    A. Hess;E. Kemnitz;A. Lippitz;W.E.S. Unger

  • An XPS analysis of different SiO2 modifications employing a C 1s as well as an Au 4f7/2 static charge reference

    Th. Gross;M. Ramm;H. Sonntag;W. Unger

  • Chemical analysis of plasma-polymerized films: The application of X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (NEXAFS) and fourier transform infrared spectroscopy (FTIR)

    I. Retzko;J.F. Friedrich;A. Lippitz;W.E.S. Unger

  • High-resolution imaging with SEM/T-SEM, EDX and SAM as a combined methodical approach for morphological and elemental analyses of single engineered nanoparticles

    Steffi Rades;Vasile-Dan Hodoroaba;Tobias Salge;Thomas Wirth

  • Nitrogen-rich plasma polymers: Comparison of films deposited in atmospheric- and low-pressure plasmas

    Florina Truica-Marasescu;Pierre-Luc Girard-Lauriault;Andreas Lippitz;Wolfgang E.S. Unger

  • Analysis of highly resolved x‐ray photoelectron Cr 2p spectra obtained with a Cr2O3 powder sample prepared with adhesive tape

    E. Ünveren;E. Ünveren;E. Kemnitz;S. Hutton;A. Lippitz

  • C 1s and Au 4f7/2 referenced XPS binding energy data obtained with different aluminium oxides, -hydroxides and -fluorides

    O. Böse;E. Kemnitz;A. Lippitz;W. E. S. Unger

  • Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure

    Pierre-Luc Girard-Lauriault;Patrick Desjardins;Wolfgang E. S. Unger;Andreas Lippitz

  • Comprehensive comparison of various techniques for the analysis of elemental distributions in thin films.

    D. Abou-Ras;R. Caballero;C.-H. Fischer;C.A. Kaufmann

  • Ambient-ageing processes in amine self-assembled monolayers on microarray slides as studied by ToF-SIMS with principal component analysis, XPS, and NEXAFS spectroscopy

    Hyegeun Min;Pierre-Luc Girard-Lauriault;Thomas Gross;Andreas Lippitz

  • Characterization of Nanoparticles: Measurement Processes for Nanoparticles

    Vasile-Dan Hodoroaba;Wolfgang Unger;A. G. Shard

  • Functionalized nanographene sheets with high antiviral activity through synergistic electrostatic and hydrophobic interactions.

    Ievgen S. Donskyi;Ievgen S. Donskyi;Walid Azab;Jose Luis Cuellar-Camacho;Guy Guday

  • Formation of Plasma Polymer Layers with Functional Groups of Different Type and Density at Polymer Surfaces and their Interaction with Al Atoms

    Jörg Friedrich;Gerhard Kühn;Renate Mix;Wolfgang Unger

  • The European nanometrology landscape

    Richard K Leach;Robert Boyd;Theresa Burke;Hans-Ulrich Danzebrink

  • Curve fitting of Cr 2p photoelectron spectra of Cr2O3 and CrF3

    I. Grohmann;E. Kemnitz;A. Lippitz;W. E. S. Unger

  • C K-edge NEXAFS spectra of graphene with physical and chemical defects: a study based on density functional theory

    Christopher Ehlert;Christopher Ehlert;Wolfgang E. S. Unger;Peter Saalfrank

  • Synchrotron-radiation XPS analysis of ultra-thin silane films: Specifying the organic silicon

    Paul M. Dietrich;Stephan Glamsch;Stephan Glamsch;Christopher Ehlert;Christopher Ehlert;Andreas Lippitz

  • SIMS imaging of the nanoworld: applications in science and technology

    Mathias Senoner;Wolfgang E. S. Unger

  • Oxygen plasma induced degradation of the surface of poly(styrene), poly(bisphenol-A-carbonate) and poly(ethylene terephthalate) as observed by soft X-ray absorption spectroscopy (NEXAFS)

    I. Koprinarov;A. Lippitz;J.F. Friedrich;W.E.S. Unger

  • Surface analysis of plasma deposited polymer films, 7 : In situ characterization of plasma deposited allylamine films by ToF-SSIMS, XPS and NEXAFS spectroscopy

    Umut Oran;Sufal Swaraj;Andreas Lippitz;Wolfgang E. S. Unger

Frequent Co-Authors

Mohsen Adeli
Mohsen Adeli Lorestan University
Christoph A. Schalley
Christoph A. Schalley Freie Universität Berlin
Erhard Kemnitz
Erhard Kemnitz Humboldt-Universität zu Berlin
Rainer Haag
Rainer Haag Freie Universität Berlin
Antonella Rossi
Antonella Rossi University of Cagliari
Jörg Radnik
Jörg Radnik Federal Institute For Materials Research and Testing
Michael R. Wertheimer
Michael R. Wertheimer Polytechnique Montréal
Knut Rurack
Knut Rurack Federal Institute For Materials Research and Testing
Christof Wöll
Christof Wöll Karlsruhe Institute of Technology
Jürgen P. Rabe
Jürgen P. Rabe Humboldt-Universität zu Berlin

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Best Scientists Citing Wolfgang E. S. Unger

Erhard Kemnitz

Erhard Kemnitz

Humboldt-Universität zu Berlin

Publications: 49

Rainer Haag

Rainer Haag

Freie Universität Berlin

Publications: 31

Michael R. Wertheimer

Michael R. Wertheimer

Polytechnique Montréal

Publications: 29

Mohsen Adeli

Mohsen Adeli

Lorestan University

Publications: 26

Michael Zharnikov

Michael Zharnikov

Heidelberg University

Publications: 20

Rino Morent

Rino Morent

Ghent University

Publications: 20

Rony Snyders

Rony Snyders

University of Mons

Publications: 19

Dirk Hegemann

Dirk Hegemann

Swiss Federal Laboratories for Materials Science and Technology

Publications: 15

François Reniers

François Reniers

Université Libre de Bruxelles

Publications: 15

Nathalie De Geyter

Nathalie De Geyter

Ghent University

Publications: 15

Daniel A. Fischer

Daniel A. Fischer

National Institute of Standards and Technology

Publications: 15

Robert D. Short

Robert D. Short

Lancaster University

Publications: 15

Yi Luo

Yi Luo

University of Science and Technology of China

Publications: 14

Nicholas M. Harrison

Nicholas M. Harrison

Imperial College London

Publications: 14

Jörg Radnik

Jörg Radnik

Federal Institute For Materials Research and Testing

Publications: 13

Janina Kneipp

Janina Kneipp

Humboldt-Universität zu Berlin

Publications: 10

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