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Chemistry

D-Index
52
Citations
8587
World Ranking
13627
National Ranking
1004

Overview

Wolfgang E. S. Unger is affiliated with the Federal Institute For Materials Research and Testing in Germany. Their research contributions focus primarily on materials science and engineering, with a strong emphasis on materials chemistry, surfaces, coatings and films, and biomedical engineering. They also explore aspects of electrical and electronic engineering as well as computational mechanics.

The scientist's work spans multiple specialized topics including electron and X-ray spectroscopy techniques, graphene and nanomaterials applications, advancements in photolithography techniques, ion-surface interactions and analysis, X-ray spectroscopy and fluorescence analysis, advanced electron microscopy techniques and applications, and the electronic and structural properties of oxides.

Wolfgang E. S. Unger has published in various scientific venues, with frequent appearances in:

  • Surface and Interface Analysis
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • The Journal of Physical Chemistry C
  • Zenodo (CERN European Organization for Nuclear Research)
  • The Cambridge Structural Database

Co-authorship is a notable part of Unger's scholarly activity. Frequent collaborators include Anja Müller, Ievgen S. Donskyi, Jörg Radnik, Mohsen Adeli, and Marit Kjærvik.

Selected recent publications illustrate the scope and variety of their research:

  • "NanoSolveIT Project: Driving nanoinformatics research to develop innovative and integrated tools for in silico nanosafety assessment," 2020, Computational and Structural Biotechnology Journal
  • "Graphene Oxide-Cyclic R10 Peptide Nuclear Translocation Nanoplatforms for the Surmounting of Multiple-Drug Resistance," 2020, Advanced Functional Materials
  • "Metal-Assisted and Solvent-Mediated Synthesis of Two-Dimensional Triazine Structures on Gram Scale," 2020, Journal of the American Chemical Society
  • "Application of near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) in an in-situ analysis of the stability of the surface-supported metal-organic framework HKUST-1 in water, methanol and pyridine atmospheres," 2021, Journal of Electron Spectroscopy and Related Phenomena
  • "Combining HR-TEM and XPS to elucidate the core-shell structure of ultrabright CdSe/CdS semiconductor quantum dots," 2020, Scientific Reports

Best Publications

  • XPS and NEXAFS studies of aliphatic and aromatic amine species on functionalized surfaces

    Nora Graf;Eda Yegen;Thomas Gross;Andreas Lippitz

  • ESCA, XRD, and IR Characterization of Aluminum Oxide, Hydroxyfluoride, and Fluoride Surfaces in Correlation with Their Catalytic Activity in Heterogeneous Halogen Exchange Reactions

    A. Hess;E. Kemnitz;A. Lippitz;W.E.S. Unger

  • An XPS analysis of different SiO2 modifications employing a C 1s as well as an Au 4f7/2 static charge reference

    Th. Gross;M. Ramm;H. Sonntag;W. Unger

  • Chemical analysis of plasma-polymerized films: The application of X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (NEXAFS) and fourier transform infrared spectroscopy (FTIR)

    I. Retzko;J.F. Friedrich;A. Lippitz;W.E.S. Unger

  • High-resolution imaging with SEM/T-SEM, EDX and SAM as a combined methodical approach for morphological and elemental analyses of single engineered nanoparticles

    Steffi Rades;Vasile-Dan Hodoroaba;Tobias Salge;Thomas Wirth

  • Nitrogen-rich plasma polymers: Comparison of films deposited in atmospheric- and low-pressure plasmas

    Florina Truica-Marasescu;Pierre-Luc Girard-Lauriault;Andreas Lippitz;Wolfgang E.S. Unger

  • Analysis of highly resolved x‐ray photoelectron Cr 2p spectra obtained with a Cr2O3 powder sample prepared with adhesive tape

    E. Ünveren;E. Ünveren;E. Kemnitz;S. Hutton;A. Lippitz

  • C 1s and Au 4f7/2 referenced XPS binding energy data obtained with different aluminium oxides, -hydroxides and -fluorides

    O. Böse;E. Kemnitz;A. Lippitz;W. E. S. Unger

  • Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure

    Pierre-Luc Girard-Lauriault;Patrick Desjardins;Wolfgang E. S. Unger;Andreas Lippitz

  • Comprehensive comparison of various techniques for the analysis of elemental distributions in thin films.

    D. Abou-Ras;R. Caballero;C.-H. Fischer;C.A. Kaufmann

  • Ambient-ageing processes in amine self-assembled monolayers on microarray slides as studied by ToF-SIMS with principal component analysis, XPS, and NEXAFS spectroscopy

    Hyegeun Min;Pierre-Luc Girard-Lauriault;Thomas Gross;Andreas Lippitz

  • Characterization of Nanoparticles: Measurement Processes for Nanoparticles

    Vasile-Dan Hodoroaba;Wolfgang Unger;A. G. Shard

  • Functionalized nanographene sheets with high antiviral activity through synergistic electrostatic and hydrophobic interactions.

    Ievgen S. Donskyi;Ievgen S. Donskyi;Walid Azab;Jose Luis Cuellar-Camacho;Guy Guday

  • Formation of Plasma Polymer Layers with Functional Groups of Different Type and Density at Polymer Surfaces and their Interaction with Al Atoms

    Jörg Friedrich;Gerhard Kühn;Renate Mix;Wolfgang Unger

  • The European nanometrology landscape

    Richard K Leach;Robert Boyd;Theresa Burke;Hans-Ulrich Danzebrink

  • Curve fitting of Cr 2p photoelectron spectra of Cr2O3 and CrF3

    I. Grohmann;E. Kemnitz;A. Lippitz;W. E. S. Unger

  • C K-edge NEXAFS spectra of graphene with physical and chemical defects: a study based on density functional theory

    Christopher Ehlert;Christopher Ehlert;Wolfgang E. S. Unger;Peter Saalfrank

  • Synchrotron-radiation XPS analysis of ultra-thin silane films: Specifying the organic silicon

    Paul M. Dietrich;Stephan Glamsch;Stephan Glamsch;Christopher Ehlert;Christopher Ehlert;Andreas Lippitz

  • SIMS imaging of the nanoworld: applications in science and technology

    Mathias Senoner;Wolfgang E. S. Unger

  • Oxygen plasma induced degradation of the surface of poly(styrene), poly(bisphenol-A-carbonate) and poly(ethylene terephthalate) as observed by soft X-ray absorption spectroscopy (NEXAFS)

    I. Koprinarov;A. Lippitz;J.F. Friedrich;W.E.S. Unger

  • Surface analysis of plasma deposited polymer films, 7 : In situ characterization of plasma deposited allylamine films by ToF-SSIMS, XPS and NEXAFS spectroscopy

    Umut Oran;Sufal Swaraj;Andreas Lippitz;Wolfgang E. S. Unger

Frequent Co-Authors

Mohsen Adeli
Mohsen Adeli Lorestan University
Christoph A. Schalley
Christoph A. Schalley Freie Universität Berlin
Erhard Kemnitz
Erhard Kemnitz Humboldt-Universität zu Berlin
Rainer Haag
Rainer Haag Freie Universität Berlin
Antonella Rossi
Antonella Rossi University of Cagliari
Jörg Radnik
Jörg Radnik Federal Institute For Materials Research and Testing
Michael R. Wertheimer
Michael R. Wertheimer Polytechnique Montréal
Knut Rurack
Knut Rurack Federal Institute For Materials Research and Testing
Christof Wöll
Christof Wöll Karlsruhe Institute of Technology
Jürgen P. Rabe
Jürgen P. Rabe Humboldt-Universität zu Berlin

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