The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Tina M. Nenoff sits on this spectrum.
This scientist: 296 publications — 62nd percentile
62% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Tina M. Nenoff sits on this spectrum.
This scientist: 57 D-Index — 39th percentile
39% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Tina M. Nenoff is a researcher affiliated with Sandia National Laboratories in the United States. Their work spans multiple fields including materials science, chemistry, and engineering, with particular focus on materials chemistry, inorganic chemistry, and electrical and electronic engineering.
Their research interests cover several core topics related to advanced materials and sensor technologies. These include metal-organic frameworks (MOFs) synthesis and applications, gas sensing nanomaterials and sensors, X-ray diffraction in crystallography, covalent organic framework applications, inorganic fluorides and related compounds, crystallization and solubility studies, and analytical chemistry and sensors.
Some of the recent noteworthy publications by Tina M. Nenoff include:
The frequent collaborators in their research include Jessica Rimsza, Susan E. Henkelis, Dayton J. Vogel, Stephen Percival, and David Rademacher.
Tina M. Nenoff has contributed extensively to publication venues such as ACS Applied Materials & Interfaces, The Cambridge Structural Database, Industrial & Engineering Chemistry Research, Journal of Molecular Liquids, and ECS Meeting Abstracts.
In recognition of their scientific contributions, they have been named a Fellow of the American Association for the Advancement of Science (AAAS) in 2019 and a Fellow of the American Chemical Society in 2011.
Nathan W. Ockwig;Tina M. Nenoff
Dorina F. Sava;Mark A. Rodriguez;Karena W. Chapman;Peter J. Chupas
Karena W. Chapman;Peter J. Chupas;Tina M. Nenoff
Unknown
Dorina F. Sava;Karena W. Chapman;Mark A. Rodriguez;Jeffery A. Greathouse
May Nyman;François Bonhomme;Todd M. Alam;Mark A. Rodriguez
Dorina F. Sava;Lauren E. S. Rohwer;Mark A. Rodriguez;Tina M. Nenoff
Liangxiong Li;Junhang Dong;Tina M. Nenoff;Robert Lee
Karena W. Chapman;Dorina F. Sava;Gregory J. Halder;Peter J. Chupas
James T. Hughes;Dorina F. Sava;Tina M. Nenoff;Alexandra Navrotsky
Xuehong Gu;Junhang Dong, ,† and;Tina M. Nenoff
Tina M. Nenoff;Mark A. Rodriguez;Nick R. Soelberg;Karena W. Chapman
Dorina F. Sava;Terry J. Garino;Tina M. Nenoff
Ranko P. Bontchev;Shirley Liu;James L. Krumhansl;James Voigt
Tina M. Nenoff;William T. A. Harrison;Thurman E. Gier;Galen D. Stucky
William T. A. Harrison;Tina M. Nenoff;Thurman E. Gier;Galen D. Stucky
Xuehong Gu;Junhang Dong;Tina M. Nenoff;Dickson E. Ozokwelu
Tina M. Nenoff;Richard J. Spontak;Christopher M. Aberg
Zhong Tang;Junhang Dong;Tina M Nenoff
Leo J. Small;Susan E. Henkelis;David X. Rademacher;Mara E. Schindelholz
Terry J. Garino;Tina M. Nenoff;James L. Krumhansl;David X. Rademacher
Zhenyuan Zhang;Tina M. Nenoff;Jian Yu Huang;Donald T. Berry
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